公开(公告)号：US09646843B2

公开(公告)日：2017-05-09

申请号：US14829662

申请日：2015-08-19

Applicant: Applied Materials, Inc.

Inventor： Andrew Nguyen ,  Tza-Jing Gung ,  Haitao Wang ,  Maxim Mikhailovich Noginov ,  Reza Sadjadi ,  Chunlei Zhang ,  Xue Yang

IPC: H01J37/32 ,  H01L21/3065 ,  C23C16/50 ,  C23C16/455 ,  C23C14/22 ,  H01L21/02

CPC classification number: H01L21/3065 ,  C23C14/22 ,  C23C16/45565 ,  C23C16/46 ,  C23C16/50 ,  C23C16/505 ,  H01J37/32082 ,  H01J37/32669 ,  H01L21/02274

Abstract: Implementations described herein provide a magnetic ring which enables both lateral and azimuthal tuning of the plasma in a processing chamber. In one embodiment, the magnetic ring has a body. The body has a top surface and a bottom surface, and a plurality of magnets are disposed on the bottom surface of the body.