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公开(公告)号:US09824852B2
公开(公告)日:2017-11-21
申请号:US14985847
申请日:2015-12-31
Applicant: Applied Materials Israel Ltd.
Inventor: Roman Kris , Yakov Weinberg , Yan Ivanchenko , Ishai Schwarzband , Dan Lange , Arbel Englander , Efrat Noifeld , Ran Goldman , Ori Shoval
IPC: H01J37/22 , H01J37/28 , G01N23/225 , G01B15/04
CPC classification number: H01J37/222 , G01N23/2251 , G01N2223/401 , G01N2223/418 , G01N2223/6116 , G01N2223/646 , H01J37/28 , H01J2237/24592 , H01J2237/2813 , H01L22/12
Abstract: A Critical Dimensions Scanning Electron Microscope (CD-SEM) is described that comprises a unit for performing CD-SEM measurements of a semiconductor wafer, a BSE imaging unit for obtaining a Grey Level image (GL) of the wafer, and a unit for GL analysis and for processing the GL analysis results with reference to results of the CD-measurements.
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公开(公告)号:US09715724B2
公开(公告)日:2017-07-25
申请号:US14446295
申请日:2014-07-29
Applicant: Applied Materials Israel Ltd.
Inventor: Ishai Schwarzband , Yan Ivanchenko , Daniel Ravid , Orly Zvitia , Idan Kaizerman
CPC classification number: G06T7/001 , G06K9/4604 , G06K9/6211 , G06K2209/19 , G06K2209/403 , G06T2207/10028 , G06T2207/10061 , G06T2207/30148
Abstract: A method for image processing includes providing a microscopic image of a structure fabricated on a substrate and computer-aided design (CAD) data used in fabricating the structure. The microscopic image is processed by a computer so as to generate a first directionality map, which includes, for a matrix of points in the microscopic image, respective directionality vectors corresponding to magnitudes and directions of edges at the points irrespective of a sign of the magnitudes. The CAD data are processed by the computer so as to produce a simulated image based on the CAD data and to generate a second directionality map based on the simulated image. The first and second directionality maps are compared by the computer so as to register the microscopic image with the CAD data.
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