Technique for measuring overlay between layers of a multilayer structure
    3.
    发明授权
    Technique for measuring overlay between layers of a multilayer structure 有权
    用于测量多层结构层之间覆盖层的技术

    公开(公告)号:US09530199B1

    公开(公告)日:2016-12-27

    申请号:US14798283

    申请日:2015-07-13

    Abstract: A method for determining overlay between layers of a multilayer structure may include obtaining a given image representing the multilayer structure, obtaining expected images for layers of the multilayer structure, providing a combined expected image of the multilayer structure as a combination of the expected images of said layers, performing registration of the given image against the combined expected image, and providing segmentation of the given image, thereby producing a segmented image, and maps of the layers of said multilayered structure. The method may further include determining overlay between any two selected layers of the multilayer structure by processing the maps of the two selected layers together with the expected images of said two selected layers.

    Abstract translation: 用于确定多层结构的层之间的重叠的方法可以包括获得表示多层结构的给定图像,获得多层结构层的预期图像,提供多层结构的组合预期图像作为所述多层结构的预期图像的组合 执行给定图像对组合预期图像的注册,以及提供给定图像的分割,从而产生分割图像,以及所述多层结构层的映射。 该方法还可以包括通过将所选择的两个层的图与所述两个所选择的层的预期图像一起处理来确定多层结构的任何两个所选择的层之间的覆盖。

    Three-dimensional mapping using scanning electron microscope images
    4.
    发明授权
    Three-dimensional mapping using scanning electron microscope images 有权
    扫描电子显微镜图像三维贴图

    公开(公告)号:US08946627B2

    公开(公告)日:2015-02-03

    申请号:US14081981

    申请日:2013-11-15

    Abstract: A method includes irradiating a surface of a sample, which is made-up of multiple types of materials, with a beam of primary electrons. Emitted electrons emitted from the irradiated sample are detected using multiple detectors that are positioned at respective different positions relative to the sample, so as to produce respective detector outputs. Calibration factors are computed to compensate for variations in emitted electron yield among the types of the materials, by identifying, for each material type, one or more horizontal regions on the surface that are made-up of the material type, and computing a calibration factor for the material type based on at least one of the detector outputs at the identified horizontal regions. The calibration factors are applied to the detector outputs. A three-dimensional topographical model of the surface is calculated based on the detector outputs to which the calibration factors are applied.

    Abstract translation: 一种方法包括用一次电子束照射由多种类型的材料制成的样品的表面。 使用位于相对于样品的各个不同位置的多个检测器来检测从照射样品发射的发射电子,以便产生相应的检测器输出。 计算校正因子以补偿材料类型中发射的电子产量的变化,通过针对每种材料类型识别由材料类型组成的表面上的一个或多个水平区域,以及计算校准因子 基于所识别的水平区域中的至少一个检测器输出的材料类型。 校准因子应用于检测器输出。 基于应用校准因子的检测器输出计算表面的三维地形模型。

    THREE-DIMENSIONAL MAPPING USING SCANNING ELECTRON MICROSCOPE IMAGES
    8.
    发明申请
    THREE-DIMENSIONAL MAPPING USING SCANNING ELECTRON MICROSCOPE IMAGES 审中-公开
    使用扫描电子显微镜图像的三维图像

    公开(公告)号:US20150136960A1

    公开(公告)日:2015-05-21

    申请号:US14609768

    申请日:2015-01-30

    Abstract: A method includes irradiating a surface of a sample, which is made-up of multiple types of materials, with a beam of primary electrons. Emitted electrons emitted from the irradiated sample are detected using multiple detectors that are positioned at respective different positions relative to the sample, so as to produce respective detector outputs. Calibration factors are computed to compensate for variations in emitted electron yield among the types of the materials, by identifying, for each material type, one or more horizontal regions on the surface that are made-up of the material type, and computing a calibration factor for the material type based on at least one of the detector outputs at the identified horizontal regions. The calibration factors are applied to the detector outputs. A three-dimensional topographical model of the surface is calculated based on the detector outputs to which the calibration factors are applied.

    Abstract translation: 一种方法包括用一次电子束照射由多种类型的材料制成的样品的表面。 使用位于相对于样品的各个不同位置的多个检测器来检测从照射样品发射的发射电子,以便产生相应的检测器输出。 计算校正因子以补偿材料类型中发射的电子产量的变化,通过针对每种材料类型识别由材料类型组成的表面上的一个或多个水平区域,以及计算校准因子 基于所识别的水平区域中的至少一个检测器输出的材料类型。 校准因子应用于检测器输出。 基于应用校准因子的检测器输出计算表面的三维地形模型。

    THREE-DIMENSIONAL MAPPING USING SCANNING ELECTRON MICROSCOPE IMAGES
    9.
    发明申请
    THREE-DIMENSIONAL MAPPING USING SCANNING ELECTRON MICROSCOPE IMAGES 有权
    使用扫描电子显微镜图像的三维图像

    公开(公告)号:US20140074419A1

    公开(公告)日:2014-03-13

    申请号:US14081981

    申请日:2013-11-15

    Abstract: A method includes irradiating a surface of a sample, which is made-up of multiple types of materials, with a beam of primary electrons. Emitted electrons emitted from the irradiated sample are detected using multiple detectors that are positioned at respective different positions relative to the sample, so as to produce respective detector outputs. Calibration factors are computed to compensate for variations in emitted electron yield among the types of the materials, by identifying, for each material type, one or more horizontal regions on the surface that are made-up of the material type, and computing a calibration factor for the material type based on at least one of the detector outputs at the identified horizontal regions. The calibration factors are applied to the detector outputs. A three-dimensional topographical model of the surface is calculated based on the detector outputs to which the calibration factors are applied.

    Abstract translation: 一种方法包括用一次电子束照射由多种类型的材料制成的样品的表面。 使用位于相对于样品的各个不同位置的多个检测器来检测从照射样品发射的发射电子,以便产生相应的检测器输出。 计算校正因子以补偿材料类型中发射的电子产量的变化,通过针对每种材料类型识别由材料类型组成的表面上的一个或多个水平区域,以及计算校准因子 基于所识别的水平区域中的至少一个检测器输出的材料类型。 校准因子应用于检测器输出。 基于应用校准因子的检测器输出计算表面的三维地形模型。

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