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公开(公告)号：US20110065044A1
公开(公告)日：2011-03-17
申请号：US12992423
申请日：2009-06-01
申请人： Arimichi Okumura , Keizo Inoue , Kazuki Okamoto
发明人： Arimichi Okumura , Keizo Inoue , Kazuki Okamoto
CPC分类号： G03F7/0397 , C08F216/125 , C08F220/06 , C08F220/18 , C08F220/28
摘要： A polymer for lithographic purposes has at least a repeating structural unit represented by following General Formula (I). In Formula (I), R1, R3, R4, and R6 each independently represent hydrogen atom, a halogen atom, cyano group, an alkyl group, or a haloalkyl group; R2 and R5 each independently represent hydrogen atom, cyano group, etc.; X1 and X2 each independently represent single bond, or a substituted or unsubstituted bivalent alkylene, alkenylene, or cycloalkylene group, etc.; X3 and X4 each independently represent single bond or —CO—; R7, R8, R9, and R10 each independently represent hydrogen atom, an alkyl group, or a cycloalkyl group. The polymer for lithographic purposes shows good balance between line edge roughness (LER) and etching resistance and allows very fine and uniform patterning.
摘要翻译： 用于光刻目的的聚合物至少具有由以下通式（I）表示的重复结构单元。 在式（I）中，R 1，R 3，R 4和R 6各自独立地表示氢原子，卤素原子，氰基，烷基或卤代烷基; R2和R5各自独立地表示氢原子，氰基等; X1和X2各自独立地表示单键，或取代或未取代的二价亚烷基，亚烯基或亚环烷基等; X 3和X 4各自独立地表示单键或-CO-; R 7，R 8，R 9和R 10各自独立地表示氢原子，烷基或环烷基。 用于光刻目的的聚合物在线边缘粗糙度（LER）和耐蚀刻性之间具有良好的平衡，并且允许非常精细和均匀的图案化。
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公开(公告)号：US08470510B2
公开(公告)日：2013-06-25
申请号：US12992423
申请日：2009-06-01
申请人： Arimichi Okumura , Keizo Inoue , Kazuki Okamoto
发明人： Arimichi Okumura , Keizo Inoue , Kazuki Okamoto
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , C08F265/02 , C08F265/06
CPC分类号： G03F7/0397 , C08F216/125 , C08F220/06 , C08F220/18 , C08F220/28
摘要： A polymer for lithographic purposes has at least a repeating structural unit represented by following General Formula (I). In Formula (I), R1, R3, R4, and R6 each independently represent hydrogen atom, a halogen atom, cyano group, an alkyl group, or a haloalkyl group; R2 and R5 each independently represent hydrogen atom, cyano group, etc.; X1 and X2 each independently represent single bond, or a substituted or unsubstituted bivalent alkylene, alkenylene, or cycloalkylene group, etc.; X3 and X4 each independently represent single bond or —CO—; R7, R8, R9, and R10 each independently represent hydrogen atom, an alkyl group, or a cycloalkyl group. The polymer for lithographic purposes shows good balance between line edge roughness (LER) and etching resistance and allows very fine and uniform patterning.
摘要翻译： 用于光刻目的的聚合物至少具有由以下通式（I）表示的重复结构单元。 在式（I）中，R 1，R 3，R 4和R 6各自独立地表示氢原子，卤素原子，氰基，烷基或卤代烷基; R2和R5各自独立地表示氢原子，氰基等; X1和X2各自独立地表示单键，或取代或未取代的二价亚烷基，亚烯基或亚环烷基等; X 3和X 4各自独立地表示单键或-CO-; R 7，R 8，R 9和R 10各自独立地表示氢原子，烷基或环烷基。 用于光刻目的的聚合物在线边缘粗糙度（LER）和耐蚀刻性之间具有良好的平衡，并且允许非常精细和均匀的图案化。
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公开(公告)号：US20080199500A1
公开(公告)日：2008-08-21
申请号：US11667069
申请日：2005-09-13
申请人： Arimichi Okumura
发明人： Arimichi Okumura
IPC分类号： A61K8/02
CPC分类号： A61Q19/00 , A61K8/88 , C08J3/16 , C08J2377/00
摘要： Resin particles are produced by adding a liquid material having a boiling point of 100° C. or higher to an aqueous dispersion of resin particles to yield a mixture, recovering a wet cake from the mixture by filtration, and drying the wet cake. A water-soluble material is preferably used as the liquid material. The liquid material may also be at least one compound selected from compounds listed in The Japanese Standards of Cosmetic Ingredients, The Japanese Cosmetic Ingredients Codex, The Pharmacopoeia of Japan, and The Japan's Specifications and Standards for Food Additives. According to this method, there are provided resin particles which are resistant to coagulation upon drying and are satisfactorily dispersible in other materials.
摘要翻译： 通过向树脂颗粒的水性分散体中加入沸点为100℃以上的液体材料制成树脂颗粒，得到混合物，通过过滤从混合物中回收湿滤饼，并干燥湿滤饼。 优选使用水溶性物质作为液体材料。 液体材料还可以是选自日本化妆品成分标准，日本化妆品成分法典，日本药典和日本的食品添加剂规格和标准中列举的至少一种化合物。 根据该方法，提供了在干燥时耐凝结的树脂颗粒，并且令人满意地分散在其它材料中。
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公开(公告)号：US20110027725A1
公开(公告)日：2011-02-03
申请号：US12935537
申请日：2009-04-02
CPC分类号： C09D165/00 , C08G61/02 , C08G2261/342 , C08G2261/45 , C08L65/00 , G03F7/0392
摘要： A polyol compound for photoresists has at least one aliphatic group and at least one aromatic group bound to each other alternately, in which the aromatic group has at least one aromatic ring and two or more hydroxyl groups bound to the aromatic ring. The polyol compound for photoresists can be prepared through an acid-catalyzed reaction, such as a Friedel-Crafts reaction, between an aliphatic polyol and an aromatic polyol. The aliphatic polyol is preferably an alicyclic polyol. The aromatic polyol is preferably hydroquinone.By protecting phenolic hydroxyl group(s) thereof with a protecting group capable of leaving with an acid, the polyol compound for photoresists gives a compound for photoresists. A photoresist composition containing this compound can form a resist pattern which shows less line edge roughness (LER), excels in resolution and etching resistance, and is fine and sharp.
摘要翻译： 用于光致抗蚀剂的多元醇化合物具有至少一个脂族基团和至少一个彼此结合的芳族基团，其中芳族基团具有至少一个芳族环和两个或更多个与芳环结合的羟基。 用于光致抗蚀剂的多元醇化合物可以通过在脂族多元醇和芳族多元醇之间的酸催化反应如Friedel-Crafts反应来制备。 脂族多元醇优选为脂环族多元醇。 芳族多元醇优选为氢醌。 通过用可与酸离去的保护基保护酚羟基，用于光致抗蚀剂的多元醇化合物得到光致抗蚀剂的化合物。 包含该化合物的光致抗蚀剂组合物可以形成显示较少线边缘粗糙度（LER）的抗蚀剂图案，分辨率和耐蚀刻性优异，并且细腻。
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公开(公告)号：US20130249145A1
公开(公告)日：2013-09-26
申请号：US13990927
申请日：2011-12-08
申请人： Arimichi Okumura , Yoshihiro Asami
发明人： Arimichi Okumura , Yoshihiro Asami
IPC分类号： B29C45/16
CPC分类号： B29C45/16 , B23K26/0006 , B23K26/3584 , B23K26/359 , B23K2103/50 , B29C45/14311 , B29C45/14778 , B29C2045/14868 , B29K2707/00
摘要： A method of manufacturing a composite molded article including a metal molded article and a resin molded article, the method including steps of: performing laser scanning on a joint surface of the metal molded article so as to form markings including straight lines and/or curved lines in a certain direction or in the different direction, and performing laser scanning so that the markings including the respective straight lines and/or the respective curved lines do not intersect with each other; and positioning, in a die, a portion including the joint surface of the metal molded article in which the marking is formed, to thereby perform insert-molding of a resin serving as the resin molded article.
摘要翻译： 一种制造包括金属模制品和树脂模制品的复合模塑制品的方法，所述方法包括以下步骤：在金属模制品的接合表面上进行激光扫描，以形成包括直线和/或曲线的标记 在一定方向或不同方向上进行激光扫描，使得包括各直线和/或各曲线的标记不相交; 并且在模具中定位包括形成标记的金属模制品的接合表面的部分，从而进行用作树脂模塑制品的树脂的嵌入成型。
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公开(公告)号：US20110027726A1
公开(公告)日：2011-02-03
申请号：US12935848
申请日：2009-04-02
CPC分类号： C09D165/00 , C08G61/02 , C08G2261/342 , C08G2261/45 , G03F7/0392
摘要： A polymer compound for photoresists contains alkali-soluble groups being protected by protecting groups capable of leaving with an acid, and is thereby insoluble or sparingly soluble in an alkaline developer, in which part or all of the protecting groups are multifunctional protecting groups each protecting two or more alkali-soluble groups. The alkali-soluble groups may be phenolic hydroxyl groups. The polymer compound may correspond to a polyol compound having an aliphatic group and an aromatic group bound to each other alternately, the aromatic group having an aromatic ring and two or more hydroxyl groups bound to the aromatic ring, except with phenolic hydroxyl groups of the polyol compound being protected by protecting groups capable of leaving with an acid.The polymer compound for photoresists can give a resist film with less line edge roughness (LER), while exhibiting excellent workability and resolution.
摘要翻译： 用于光致抗蚀剂的高分子化合物包含碱溶性基团，其被保护的基团保护，所述基团能够与酸一起离开，从而不溶或微溶于碱性显影剂，其中部分或全部保护基是多官能保护基，每个保护基保护两个 或更多的碱溶性基团。 碱溶性基团可以是酚羟基。 高分子化合物可以相应于具有脂族基团和芳族基团的多元醇化合物，交替地彼此结合，芳族基团与芳香环结合的两个或更多个羟基的芳族基团除外，多元醇的酚羟基除外 化合物被能够与酸离去的保护基保护。 用于光致抗蚀剂的聚合物化合物可以得到具有较少线边缘粗糙度（LER）的抗蚀剂膜，同时表现出优异的可加工性和分辨率。
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公开(公告)号：US07947369B2
公开(公告)日：2011-05-24
申请号：US11439985
申请日：2006-05-25
申请人： Arimichi Okumura
发明人： Arimichi Okumura
IPC分类号： B32B5/66
CPC分类号： C08J3/12 , C08J3/005 , C08J2377/00 , Y10T428/2982 , Y10T428/2991 , Y10T428/2998
摘要： Fine spherical thermoplastic resin particles are produced by preparing a resin composition including a matrix of a water-soluble material, and fine particles of a water-insoluble thermoplastic resin dispersed in the matrix, the fine particles and the matrix each being melted or softened in the resin composition; cooling and solidifying the resin composition under such conditions that the resin composition does not undergo deformation due to stress; and removing the water-soluble material by washing with water to thereby yield fine spherical particles containing the water-insoluble thermoplastic resin. This method has wide applicability, applies less loads on the environment, does not require special devices, can be easily conducted, and can efficiently produce such particles. The resulting particles are highly spherical.
摘要翻译： 通过制备包含水溶性材料的基体的树脂组合物和分散在基质中的水不溶性热塑性树脂的细颗粒，每个在其中熔融或软化的微粒和基体，制备细球形热塑性树脂颗粒。 树脂组成; 在树脂组合物由于应力而不发生变形的条件下冷却和固化树脂组合物; 用水洗涤除去水溶性物质，得到含有水不溶性热塑性树脂的细小球形粒子。 该方法具有广泛的适用性，在环境中施加较少的载荷，不需要特殊装置，可以容易地进行，并且可以有效地产生这种颗粒。 所得颗粒高度球形。
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公开(公告)号：US20060269749A1
公开(公告)日：2006-11-30
申请号：US11439985
申请日：2006-05-25
申请人： Arimichi Okumura
发明人： Arimichi Okumura
IPC分类号： B32B5/16
CPC分类号： C08J3/12 , C08J3/005 , C08J2377/00 , Y10T428/2982 , Y10T428/2991 , Y10T428/2998
摘要： Fine spherical thermoplastic resin particles are produced by preparing a resin composition including a matrix of a water-soluble material, and fine particles of a water-insoluble thermoplastic resin dispersed in the matrix, the fine particles and the matrix each being melted or softened in the resin composition; cooling and solidifying the resin composition under such conditions that the resin composition does not undergo deformation due to stress; and removing the water-soluble material by washing with water to thereby yield fine spherical particles containing the water-insoluble thermoplastic resin. This method has wide applicability, applies less loads on the environment, does not require special devices, can be easily conducted, and can efficiently produce such particles. The resulting particles are highly spherical.
摘要翻译： 通过制备包含水溶性材料的基体的树脂组合物和分散在基质中的水不溶性热塑性树脂的细颗粒，每个在其中熔融或软化的微粒和基体，制备细球形热塑性树脂颗粒。 树脂组成; 在树脂组合物由于应力而不发生变形的条件下冷却和固化树脂组合物; 用水洗涤除去水溶性物质，得到含有水不溶性热塑性树脂的细小球形粒子。 该方法具有广泛的适用性，在环境中施加较少的载荷，不需要特殊装置，可以容易地进行，并且可以有效地产生这种颗粒。 所得颗粒高度球形。
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公开(公告)号：US08148357B2
公开(公告)日：2012-04-03
申请号：US11667069
申请日：2005-09-13
申请人： Arimichi Okumura
发明人： Arimichi Okumura
IPC分类号： A01N43/00
CPC分类号： A61Q19/00 , A61K8/88 , C08J3/16 , C08J2377/00
摘要： Resin particles are produced by adding a liquid material having a boiling point of 100° C. or higher to an aqueous dispersion of resin particles to yield a mixture, recovering a wet cake from the mixture by filtration, and drying the wet cake. A water-soluble material is preferably used as the liquid material. The liquid material may also be at least one compound selected from compounds listed in The Japanese Standards of Cosmetic Ingredients, The Japanese Cosmetic Ingredients Codex, The Pharmacopoeia of Japan, and The Japan's Specifications and Standards for Food Additives. According to this method, there are provided resin particles which are resistant to coagulation upon drying and are satisfactorily dispersible in other materials.
摘要翻译： 通过向树脂颗粒的水性分散体中加入沸点为100℃以上的液体材料制成树脂颗粒，得到混合物，通过过滤从混合物中回收湿滤饼，并干燥湿滤饼。 优选使用水溶性物质作为液体材料。 液体材料还可以是选自日本化妆品成分标准，日本化妆品成分法典，日本药典和日本的食品添加剂规格和标准中列举的至少一种化合物。 根据该方法，提供了在干燥时耐凝结的树脂颗粒，并且令人满意地分散在其它材料中。
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公开(公告)号：US20110040056A1
公开(公告)日：2011-02-17
申请号：US12933038
申请日：2009-03-13
申请人： Arimichi Okumura
发明人： Arimichi Okumura
IPC分类号： C08F124/00
CPC分类号： C08F6/003 , C08F6/12 , G03F7/091 , G03F7/11 , G03F7/2041
摘要： Disclosed is a process for the production of a polymer by polymerizing a monomer or monomers in a solvent to give a polymer solution; and bringing the polymer solution into contact with a poor solvent to precipitate the polymer and to remove impurities therefrom, in which the polymer solution is diluted with a solvent before being brought into contact with the poor solvent to precipitate the polymer. The polymerization solvent preferably has a coefficient of viscosity at 20° C. of 1 mPa·s or more. The dilution solvent preferably has a coefficient of viscosity at 20° C. of less than 1 mPa·s. The process enables efficient production of a polymer with good reproducibility in quality, which polymer contains less amounts of residual monomers and is useful as resist polymers, polymers for undercoat films of multilayer resists, polymers for anti-reflection coatings, and polymers for immersion topcoats.
摘要翻译： 公开了通过在溶剂中聚合单体或聚合物以产生聚合物溶液来生产聚合物的方法; 并使聚合物溶液与不良溶剂接触以沉淀聚合物并除去其中的杂质，其中聚合物溶液在与不良溶剂接触之前用溶剂稀释以沉淀聚合物。 聚合溶剂优选在20℃下的粘度系数为1mPa·s以上。 稀释溶剂优选在20℃下的粘度系数小于1mPa·s。 该方法能够有效地生产具有良好的质量再现性的聚合物，该聚合物含有较少量的残余单体，并且可用作抗蚀剂聚合物，用于多层抗蚀剂的底涂层的聚合物，用于防反射涂层的聚合物和用于浸渍面漆的聚合物。
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