公开(公告)号：US11880131B2

公开(公告)日：2024-01-23

申请号：US16955402

申请日：2018-12-19

Applicant: Arkema France

Inventor： Christophe Navarro ,  Celia Nicolet ,  Xavier Chevalier ,  Florian Delachat ,  Hubert Teyssedre

IPC: G03F7/00 ,  B29C33/62 ,  B29C33/42 ,  C08F112/08 ,  C08F212/08 ,  C08F120/26 ,  C08F220/28 ,  C08F230/02 ,  C08F130/02

CPC classification number: G03F7/0002 ,  B29C33/424 ,  B29C33/62 ,  C08F112/08 ,  C08F120/26 ,  C08F130/02 ,  C08F212/08 ,  C08F220/281 ,  C08F230/02 ,  C08F2438/02

Abstract: A process for transfer imprinting using a novel family of anti-sticking layers, such as for nanoimprint lithography processes, is described.

公开(公告)号：US20240103361A1

公开(公告)日：2024-03-28

申请号：US18389360

申请日：2023-11-14

Applicant: Arkema France

Inventor： Christophe Navarro ,  Celia Nicolet ,  Xavier Chevalier ,  Florian Delachat ,  Hubert Teyssedre

IPC: G03F7/00 ,  B29C33/42 ,  B29C33/62 ,  C08F112/08 ,  C08F120/26 ,  C08F130/02 ,  C08F212/08 ,  C08F220/28 ,  C08F230/02

CPC classification number: G03F7/0002 ,  B29C33/424 ,  B29C33/62 ,  C08F112/08 ,  C08F120/26 ,  C08F130/02 ,  C08F212/08 ,  C08F220/281 ,  C08F230/02 ,  C08F2438/02

Abstract: A process for transfer imprinting using a novel family of anti-sticking layers, such as for nanoimprint lithography processes, is described.

公开(公告)号：US20210072639A1

公开(公告)日：2021-03-11

申请号：US16955402

申请日：2018-12-19

Applicant: Arkema France

Inventor： Christophe Navarro ,  Celia Nicolet ,  Xavier Chevalier ,  Florian Delachat ,  Hubert Teyssedre

IPC: G03F7/00 ,  B29C33/62 ,  B29C33/42 ,  C08F112/08 ,  C08F212/08 ,  C08F120/26 ,  C08F220/28 ,  C08F230/02 ,  C08F130/02

Abstract: A process for transfer imprinting using a novel family of anti-sticking layers, such as for nanoimprint lithography processes, is described.