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    Method of polishing work
    2.
    发明授权
    Method of polishing work 失效
    抛光方法

    公开(公告)号：US08025554B2

    公开(公告)日：2011-09-27

    申请号：US11633506

    申请日：2006-12-05

    申请人： Norihiko Moriya

    发明人： Norihiko Moriya

    IPC分类号： B24B49/00

    CPC分类号： B24B37/042 ,  B24B37/08 ,  B24B49/16

    摘要： In the method of precisely polishing a work, torque of a sun gear and an internal gear are kept constant and a load applied to a carrier is reduced and maintained. The method comprises the steps of: changing a rotational speed of at least one of the sun gear, the internal gear, an upper polishing plate and a lower polishing plate; measuring rotation torque of a driving motor of at least one of the sun gear and the internal gear; detecting the minimum rotation torque measured in the measuring step; and adjusting the rotational speed of at least one of the sun gear, the internal gear, the upper polishing plate and the lower polishing plate so as to make the rotation torque thereof equal to the minimum rotation torque or running rotation torque, the running rotation torque being greater by a prescribed value than the minimum rotation torque.

    摘要翻译： 在精密抛光工件的方法中，恒星齿轮和内齿轮的扭矩保持恒定，并且减小并维持施加在载体上的载荷。 该方法包括以下步骤：改变太阳齿轮，内齿轮，上抛光板和下抛光板中的至少一个的旋转速度; 测量太阳齿轮和内齿轮中的至少一个的驱动电机的旋转扭矩; 检测在测量步骤中测量的最小旋转扭矩; 并且调节太阳齿轮，内齿轮，上抛光板和下抛光板中的至少一个的旋转速度，以使其转动转矩等于最小旋转转矩或行驶旋转转矩，运行旋转转矩 大于最小旋转转矩的规定值。

    Method of cleaning abrasive plates of abrasive machine and cleaning device
    4.
    发明授权
    Method of cleaning abrasive plates of abrasive machine and cleaning device 失效
    清洗研磨机研磨板和清洗装置的方法

    公开(公告)号：US06807701B2

    公开(公告)日：2004-10-26

    申请号：US09992191

    申请日：2001-11-06

    申请人： Yasuhide Denda ,  Yoshio Nakamura ,  Yoshinobu Nishimoto ,  Makoto Nakajima ,  Tsuyoshi Hasegawa ,  Norihiko Moriya

    发明人： Yasuhide Denda ,  Yoshio Nakamura ,  Yoshinobu Nishimoto ,  Makoto Nakajima ,  Tsuyoshi Hasegawa ,  Norihiko Moriya

    IPC分类号： B08B1100

    CPC分类号： B24B37/08 ,  B08B3/024 ,  B08B15/04 ,  B08B2203/0229 ,  B24B53/017 ,  Y10S134/902

    摘要： The method of the present invention cleans abrasive faces of an upper abrasive plate and a lower abrasive plate of an abrasive machine. The method is executed by a cleaning device including: a nozzle for jetting water; a brush for preventing the jetted water from scattering in the air, the brush enclosing the nozzle; and another brush for closing a gap between the preventing brush and an outer edge of the upper abrasive plate, the method is characterized by the steps of: jetting water from the nozzle toward the abrasive face of the upper abrasive plate; moving the nozzle toward the outer edge of the upper abrasive plate; and closing the gap by the closing brush when the gap is formed between the preventing brush and the outer edge of the upper abrasive plate.

    摘要翻译： 本发明的方法清洗研磨机的上磨料板和下研磨板的磨料面。 该方法由清洁装置执行，该清洁装置包括：用于喷射水的喷嘴; 用于防止喷射水在空气中飞散的刷子，刷子包围喷嘴; 以及用于封闭防磨刷和上磨料板的外边缘之间的间隙的另一刷子，其特征在于以下步骤：从喷嘴向上磨料板的研磨面喷射水; 将喷嘴移向上磨料板的外边缘; 并且当在防磨刷和上磨料板的外边缘之间形成间隙时，通过闭合刷闭合间隙。

    Method and device for cleaning abrasive plates on an abrasive machine
    5.
    发明授权
    Method and device for cleaning abrasive plates on an abrasive machine 失效
    用于在研磨机上清洁研磨板的方法和装置

    公开(公告)号：US06982009B2

    公开(公告)日：2006-01-03

    申请号：US10937830

    申请日：2004-09-09

    申请人： Yasuhide Denda ,  Yoshio Nakamura ,  Yoshinobu Nishimoto ,  Makoto Nakajima ,  Tsuyoshi Hasegawa ,  Norihiko Moriya

    发明人： Yasuhide Denda ,  Yoshio Nakamura ,  Yoshinobu Nishimoto ,  Makoto Nakajima ,  Tsuyoshi Hasegawa ,  Norihiko Moriya

    IPC分类号： B08B3/00

    CPC分类号： B24B37/08 ,  B08B3/024 ,  B08B15/04 ,  B08B2203/0229 ,  B24B53/017 ,  Y10S134/902

    摘要： The method of the present invention cleans abrasive faces of an upper abrasive plate and a lower abrasive plate of an abrasive machine. The method is executed by a cleaning device including: a nozzle for jetting water; a brush for preventing the jetted water from scattering in the air, the brush enclosing the nozzle; and another brush for closing a gap between the preventing brush and an outer edge of the upper abrasive plate, the method is characterized by the steps of: jetting water from the nozzle toward the abrasive face of the upper abrasive plate; moving the nozzle toward the outer edge of the upper abrasive plate; and closing the gap by the closing brush when the gap is formed between the preventing brush and the outer edge of the upper abrasive plate.

    摘要翻译： 本发明的方法清洗研磨机的上磨料板和下研磨板的磨料面。 该方法由清洁装置执行，该清洁装置包括：用于喷射水的喷嘴; 用于防止喷射水在空气中飞散的刷子，刷子包围喷嘴; 以及用于封闭防磨刷和上磨料板的外边缘之间的间隙的另一刷子，其特征在于以下步骤：从喷嘴向上磨料板的研磨面喷射水; 将喷嘴移向上磨料板的外边缘; 并且当在防磨刷和上磨料板的外边缘之间形成间隙时，通过闭合刷闭合间隙。

    Sulfonamide derivatives, their production and use
    6.
    发明授权
    Sulfonamide derivatives, their production and use 失效
    磺酰胺衍生物，其生产和使用

    公开(公告)号：US06359134B1

    公开(公告)日：2002-03-19

    申请号：US09424892

    申请日：1999-11-30

    申请人： Hiroyuki Tawada ,  Fumio Ito ,  Norihiko Moriya ,  Zen-ichi Terashita

    发明人： Hiroyuki Tawada ,  Fumio Ito ,  Norihiko Moriya ,  Zen-ichi Terashita

    IPC分类号： C07D29518

    CPC分类号： C07D213/30 ,  C07D211/34 ,  C07D213/56 ,  C07D213/82 ,  C07D231/12 ,  C07D233/56 ,  C07D233/88 ,  C07D239/26 ,  C07D239/42 ,  C07D249/08 ,  C07D277/56 ,  C07D295/26 ,  C07D307/82 ,  C07D311/58 ,  C07D401/04 ,  C07D405/04 ,  C07D409/04 ,  C07D417/04 ,  C07D417/14

    摘要： The present invention provides compounds which specifically inhibit FXa, which are effective when orally administered and which are useful as a safe medicine for the prevention or treatment of diseases caused by thrombus or infarction. Compounds of this invention are piperazinones of the formula: wherein R1 is an optionally substituted hydrocarbon group or an optionally substituted heterocyclic group; the ring A is an optionally substituted divalent nitrogen-containing heterocyclic group, in addition to being substituted by the group of the formula: and the group of the formula: Y is an optionally substituted divalent hydrocarbon group or an optionally substituted divalent heterocyclic group; X is a direct bond or an optionally substituted alkylene chain; Z is (1) an amino group substituted with an optionally substituted hydrocarbon group, (2) an optionally substituted imino group or (3) an optionally substituted nitrogen-containing heterocyclic group; provided that when X is a direct bond and Z is an optionally substituted 6-membered nitrogen-containing aromatic heterocyclic group, Y is an optionally substituted divalent hydrocarbon group or an optionally substituted divalent unsaturated heterocyclic group; or a salt thereof.

    摘要翻译： 本发明提供特异性抑制FXa的化合物，其在口服给药时是有效的，并且其可用作预防或治疗由血栓或梗塞引起的疾病的安全药物。本发明的化合物是下式的哌嗪酮：其中R1是 任选取代的烃基或任选取代的杂环基; 环A是任选取代的二价含氮杂环基，除了被下式所示的基团取代：下式基团：Y是任选取代的二价烃基或任选取代的二价杂环基; X是直接键或任选取代的亚烷基链; Z是（1）被任选取代的烃基取代的氨基，（2）任选取代的亚氨基或（3）任选取代的含氮杂环基; 条件是当X是直接键，Z是任选取代的6元含氮芳族杂环基时，Y是任选取代的二价烃基或任选取代的二价不饱和杂环基; 或其盐。

    Polishing machine
    8.
    发明授权
    Polishing machine 失效
    抛光机

    公开(公告)号：US06830505B2

    公开(公告)日：2004-12-14

    申请号：US10648680

    申请日：2003-08-25

    申请人： Norihiko Moriya ,  Satoki Kanda ,  Takumi Kobayashi ,  Atsushi Kajikura

    发明人： Norihiko Moriya ,  Satoki Kanda ,  Takumi Kobayashi ,  Atsushi Kajikura

    IPC分类号： B24B700

    CPC分类号： B24B37/08

    摘要： The polishing machine is capable of evenly applying a pressing force from an upper polishing plate to work pieces accommodated in through-holes of carriers. The polishing machine comprises: a plurality of the carriers provided around a center of gravity of an upper polishing plate and sandwiched between the polishing plates. Circular motion of the carriers, without revolving, are performed independently. Centers of gravity of the work pieces, which are held by the carriers, are simultaneously moved close to a center of gravity of the upper polishing plate and simultaneously moved away therefrom, and moving distances of the centers of gravity of the work pieces are equal.

    摘要翻译： 抛光机能够均匀地将来自上抛光板的压力施加到容纳在载体的通孔中的工件上。 抛光机包括：多个载体，围绕上抛光板的重心设置并夹在该抛光板之间。 载体的圆周运动，无旋转，独立执行。 由载体保持的工件的重心同时移动靠近上抛光板的重心并同时从其移开，并且工件的重心移动距离相等。

    Method of abrading both faces of work piece
    9.
    发明授权
    Method of abrading both faces of work piece 失效
    研磨工件两面的方法

    公开(公告)号：US06648735B2

    公开(公告)日：2003-11-18

    申请号：US10037742

    申请日：2001-11-09

    申请人： Tadakazu Miyashita ,  Tsuyoshi Hasegawa ,  Atsushi Kajikura ,  Norihiko Moriya

    发明人： Tadakazu Miyashita ,  Tsuyoshi Hasegawa ,  Atsushi Kajikura ,  Norihiko Moriya

    IPC分类号： B24B700

    CPC分类号： B24B37/08 ,  B24B37/042 ,  B24B49/16 ,  B24B51/00

    摘要： Method for abrading a work piece with a fixed load including a first abrading process in which pressure of a cylinder chamber of a cylinder unit suspending an upper abrasive plate is adjusted in order to apply first pressure to the work piece via the upper abrasive plate without applying the full weight of the upper abrasive plate and a second abrading process in which the pressure of the cylinder chamber is readjusted in order to to apply second pressure which is higher than the first pressure to the work piece via the upper abrasive plate without applying the full weight of the upper abrasive plate.

    摘要翻译： 一种用固定载荷研磨工件的方法，该工件包括第一研磨工艺，其中调节悬挂上磨料板的气缸单元的气缸室的压力，以便经由上磨料板向工件施加第一压力，而不施加 上部研磨板的全部重量和第二研磨过程，其中重新调节气缸室的压力，以便经由上部研磨板将高于第一压力的第二压力施加到工件，而不施加全部 上部研磨板的重量。

    Polishing head capable of continuously varying pressure distribution between pressure regions for uniform polishing
    10.
    发明授权
    Polishing head capable of continuously varying pressure distribution between pressure regions for uniform polishing 有权
    抛光头能够连续地改变压力区域之间的压力分布，以进行均匀抛光

    公开(公告)号：US08888563B2

    公开(公告)日：2014-11-18

    申请号：US13195220

    申请日：2011-08-01

    申请人： Norihiko Moriya

    发明人： Norihiko Moriya

    IPC分类号： B24B29/00 ,  B24B37/30

    CPC分类号： B24B37/30

    摘要： A polishing apparatus which includes a polishing head for holding a work, and a polishing plate on which a polishing pad is adhered. The polishing head includes a holding plate, an elastic sheet member fixed to an edge of the holding plate, a ring-shaped template fixed to an outer edge of a lower face of the elastic sheet member, a pressure chamber formed between a lower face of the holding plate and an upper face of the elastic sheet member, a seal ring having a main body part which is fitted to a supporting plate, a seal lip, which slidelingly contacts the elastic sheet member and divides the inside of the pressure chamber into an inner divided chamber and an outer divided chamber; and a fluid supply section for individually supplying a fluid to the divided chambers.

    摘要翻译： 一种抛光装置，其包括用于保持工件的抛光头和其上附着有抛光垫的抛光板。 抛光头包括保持板，固定到保持板的边缘的弹性片构件，固定到弹性片构件的下表面的外边缘的环形模板，形成在弹性片构件的下表面之间的压力室 所述保持板和所述弹性片构件的上表面，密封环，其具有装配到支撑板的主体部，密封唇，其与所述弹性片构件滑动接触并将所述压力室的内部分隔成为 内分隔室和外分隔室; 以及用于将流体单独地供应到分隔室的流体供应部。