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    Method and system for maskless lithography real-time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representation
    1.
    发明授权
    Method and system for maskless lithography real-time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representation 有权
    无掩模光刻的方法和系统实时图案光栅化和使用计算耦合镜实现最佳特征表征

    公开(公告)号：US07773287B2

    公开(公告)日：2010-08-10

    申请号：US11790222

    申请日：2007-04-24

    申请人： Azat M. Latypov ,  Kars Zegar Troost ,  Johannes Jacobus Matheus Baselmans

    发明人： Azat M. Latypov ,  Kars Zegar Troost ,  Johannes Jacobus Matheus Baselmans

    IPC分类号： G02B26/00

    CPC分类号： G03F7/70291

    摘要： A method and system for determining specific pixel modulation states of a spatial light modulator (SLM) to print a desired pattern on a substrate are disclosed. The method includes selecting at least one super-pixel in an object plane of the desired pattern, the super-pixel being formed of at least two pixels. At least one edge of the desired pattern crosses a boundary within the super-pixel, the at least one edge being defined by specific slope and position parameters relative to the super-pixel. The method also includes (i) forming an interpolation table to tabulate pre-calculated pixel modulation states and (ii) determining the specific pixel modulation states for each of the pixels in accordance with the interpolation table. Disclosed also are a method and system for providing a spatial light modulator (SLM). The SLM includes a plurality of mirrors structured to form groups of super-pixels. Each super-pixel (i) includes two or more mirrors from the plurality of mirrors and (ii) is configured to switch only one pixel of light. Each of the two or more mirrors can be separately actuated.

    摘要翻译： 公开了一种用于确定空间光调制器（SLM）的特定像素调制状态以在衬底上打印所需图案的方法和系统。 所述方法包括：在所述期望图案的物平面中选择至少一个超像素，所述超像素由至少两个像素形成。 所需图案的至少一个边缘穿过超像素内的边界，所述至少一个边缘由相对于超像素的特定斜率和位置参数限定。 该方法还包括（i）形成内插表以列出预先计算的像素调制状态，以及（ii）根据内插表确定每个像素的特定像素调制状态。 还公开了一种用于提供空间光调制器（SLM）的方法和系统。 SLM包括被构造成形成超像素组的多个反射镜。 每个超像素（i）包括来自多个反射镜的两个或更多个反射镜，并且（ii）被配置为仅切换一个像素的光。 两个或更多个反射镜中的每一个可以被单独地致动。

    Method and system for maskless lithography real-time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representation
    2.
    发明授权
    Method and system for maskless lithography real-time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representation 有权

    公开(公告)号：US07209275B2

    公开(公告)日：2007-04-24

    申请号：US11170065

    申请日：2005-06-30

    申请人： Azat M. Latypov ,  Kars Z. Troost ,  Johannes Jacobus Matheus Baselmans

    发明人： Azat M. Latypov ,  Kars Z. Troost ,  Johannes Jacobus Matheus Baselmans

    IPC分类号： G02B26/00

    CPC分类号： G03F7/70291

    摘要： A method and system for determining specific pixel modulation states of a spatial light modulator (SLM) to print a desired pattern on a substrate are disclosed. The method includes selecting at least one super-pixel in an object plane of the desired pattern, the super-pixel being formed of at least two pixels. At least one edge of the desired pattern crosses a boundary within the super-pixel, the at least one edge being defined by specific slope and position parameters relative to the super-pixel. The method also includes (i) forming an interpolation table to tabulate pre-calculated pixel modulation states and (ii) determining the specific pixel modulation states for each of the pixels in accordance with the interpolation table. Disclosed also are a method and system for providing a spatial light modulator (SLM). The SLM includes a plurality of mirrors structured to form groups of super-pixels. Each super-pixel (i) includes two or more mirrors from the plurality of mirrors and (ii) is configured to switch only one pixel of light. Each of the two or more mirrors can be separately actuated.

    Lithographic apparatus and method
    10.
    发明授权
    Lithographic apparatus and method 有权
    平版印刷设备和方法

    公开(公告)号：US07834980B2

    公开(公告)日：2010-11-16

    申请号：US11642982

    申请日：2006-12-21

    申请人： Johannes Jacobus Matheus Baselmans ,  Andrey S. Tychkov

    发明人： Johannes Jacobus Matheus Baselmans ,  Andrey S. Tychkov

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70358 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70583

    摘要： A method of lithography is disclosed that includes conditioning a radiation beam using an illumination system of a lithographic apparatus, imparting the radiation beam with a pattern in its cross-section, and projecting the patterned beam of radiation as an exposure field onto a substrate, wherein a periodic interference pattern is present in the exposure field, and relative motion is established between the substrate and a component in the illumination system, such that the periodic interference pattern is displaced in a direction which is not parallel to a direction of repetition of the periodic interference pattern.

    摘要翻译： 公开了一种光刻方法，其包括使用光刻设备的照明系统来调节辐射束，使辐射束在其横截面上具有图案，并将图案化的辐射束作为曝光场投射到衬底上，其中 在曝光场中存在周期性干涉图案，并且在基板和照明系统中的部件之间建立相对运动，使得周期性干涉图案在不平行于周期性重复方向的方向上移位 干扰模式。