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公开(公告)号：US20120273005A1
公开(公告)日：2012-11-01
申请号：US13440564
申请日：2012-04-05
CPC分类号： B08B9/46 , B08B3/08 , B08B3/10 , C23C16/4405 , C23C16/52 , G01N21/94 , G01N2021/8416 , H01L21/67253
摘要： Methods and apparatus for determining an endpoint of a process chamber cleaning process are provided. In some embodiments, a processing system having an endpoint detection system may include a process chamber having internal surfaces requiring periodic cleaning due to processes performed in the process chamber; and an endpoint detection system that includes a light detector positioned to detect light reflected off of a first internal surface of the process chamber; and a controller coupled to the light detector and configured to determine an endpoint of a cleaning process based upon the detected reflected light.
摘要翻译： 提供了用于确定处理室清洁过程的端点的方法和装置。 在一些实施例中，具有端点检测系统的处理系统可以包括处理室，其具有由于处理室中执行的处理而需要定期清洁的内表面; 以及端点检测系统，其包括被定位成检测从所述处理室的第一内表面反射的光的光检测器; 以及耦合到光检测器并被配置为基于检测到的反射光来确定清洁处理的端点的控制器。
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公开(公告)号：US20130178072A1
公开(公告)日：2013-07-11
申请号：US13674737
申请日：2012-11-12
申请人： BALASUBRAMANIAN RAMACHANDRAN , Tae Jung Kim , Jung Hoon Sun , Joung Woo Lee , Hwa Joong Lim , Sang Phil Lee , Joseph M. Ranish
发明人： BALASUBRAMANIAN RAMACHANDRAN , Tae Jung Kim , Jung Hoon Sun , Joung Woo Lee , Hwa Joong Lim , Sang Phil Lee , Joseph M. Ranish
IPC分类号： B08B5/00 , H01L21/324
CPC分类号： B08B5/00 , B08B7/00 , B08B7/0071 , H01L21/324
摘要： A method of cleaning a chamber used for annealing doped wafer substrates. In one embodiment the method provides removing dopants deposited in an annealing chamber after an annealing process of a doped substrate by flowing one or more volatilizing gases into the annealing chamber, applying heat to volatilize the deposited dopants in the annealing chamber, and exhausting the chamber to remove volatilized dopants from the annealing chamber.
摘要翻译： 一种清洗用于退火掺杂晶圆基板的室的方法。 在一个实施方案中，该方法提供了在通过使一种或多种挥发气体进入退火室中的掺杂衬底的退火处理之后去除在退火室中沉积的掺杂剂，施加热量以挥发退火室中沉积的掺杂剂，并将该室排出 从退火室中除去挥发的掺杂剂。
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公开(公告)号：US20110174212A1
公开(公告)日：2011-07-21
申请号：US12887647
申请日：2010-09-22
申请人： BALASUBRAMANIAN RAMACHANDRAN , ERROL ANTONIO C. SANCHEZ , NYI O. MYO , KEVIN JOSEPH BAUTISTA , HARPREET SINGH JUNEJA , ZUOMING ZHU
发明人： BALASUBRAMANIAN RAMACHANDRAN , ERROL ANTONIO C. SANCHEZ , NYI O. MYO , KEVIN JOSEPH BAUTISTA , HARPREET SINGH JUNEJA , ZUOMING ZHU
IPC分类号： C30B25/02 , C23C16/455 , C23C16/458 , C23C16/52 , C30B25/16
CPC分类号： C23C16/455 , C23C16/45523 , C30B25/14 , H01L21/02532 , H01L21/02573 , H01L21/0262
摘要： Methods and apparatus for processing a substrate are provided herein. In some embodiments, an apparatus for processing a substrate includes a process chamber having a substrate support disposed therein to support a processing surface of a substrate at a desired position within the process chamber; a first inlet port to provide a first process gas over the processing surface of the substrate in a first direction; a second inlet port to provide a second process gas over the processing surface of the substrate in a second direction different from the first direction, wherein an azimuthal angle measured between the first direction and the second direction with respect to a central axis of the substrate support is up to about 145 degrees; and an exhaust port disposed opposite the first inlet port to exhaust the first and second process gases from the process chamber.
摘要翻译： 本文提供了用于处理衬底的方法和设备。 在一些实施例中，用于处理衬底的设备包括处理室，其具有设置在其中的衬底支撑件，以在处理室内的期望位置处支撑衬底的处理表面; 第一入口端口，用于在第一方向上在衬底的处理表面上提供第一工艺气体; 第二入口端口，用于在不同于第一方向的第二方向上在衬底的处理表面上提供第二工艺气体，其中在第一方向和第二方向之间相对于衬底支撑件的中心轴线测量的方位角 高达约145度; 以及与第一入口相对设置的排气口，以从处理室排出第一和第二处理气体。
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公开(公告)号：US20130025538A1
公开(公告)日：2013-01-31
申请号：US13536575
申请日：2012-06-28
CPC分类号： H01L21/68792 , C30B25/12 , H01L21/67115 , H01L21/68735 , H01L21/68742 , H01L21/6875 , H01L21/68785
摘要： Methods and apparatus for processing a substrate are provided herein. In some embodiments, the apparatus may include a ring to support a substrate in a position for processing, wherein the substrate is supported by a top side of the ring proximate a peripheral edge of the substrate such that a backside of the substrate, when present, is disposed over a central opening of the ring, a substantially planar member disposed below the ring, wherein substantially planar member includes plurality of slots, and a plurality of support arms which support the ring and the substantially planar member, wherein each support arm includes a terminal portion that supports the substantially planar member and extends through a respective one of the plurality of slots to support the ring
摘要翻译： 本文提供了用于处理衬底的方法和设备。 在一些实施例中，该装置可以包括用于将衬底支撑在用于处理的位置的环，其中衬底由邻近衬底的周边边缘的环的顶侧支撑，使得衬底的背面（当存在时） 设置在所述环的中心开口上方，设置在所述环下方的基本上平面的构件，其中基本平坦的构件包括多个狭槽，以及支撑所述环和所述基本平坦构件的多个支撑臂，其中每个支撑臂包括 端子部分，其支撑基本平坦的构件并且延伸穿过多个槽中的相应一个以支撑环
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公开(公告)号：US20100308729A1
公开(公告)日：2010-12-09
申请号：US12753532
申请日：2010-04-02
CPC分类号： H01K1/66
摘要： Embodiments of a lamp having an internal fuse system are provided herein. In some embodiments, a lamp may include a transparent housing; a filament disposed in the housing, the filament having a main body disposed between a first end and a second end of the filament; a first conductor coupled to the filament at the first end of the filament; a first interceptor bar disposed in the housing and beneath the main body of the filament, wherein the first interceptor bar is coupled to the second end of the filament; a second conductor disposed proximate the first end of the filament and conductively coupled to the second end of the filament via the first interceptor bar, wherein the first interceptor bar is positioned such that an electrical short forms between the first and second conductors when the main body of the filament contacts the first interceptor bar.
摘要翻译： 本文提供具有内部熔丝系统的灯的实施例。 在一些实施例中，灯可以包括透明外壳; 设置在所述壳体中的细丝，所述细丝具有设置在所述细丝的第一端和第二端之间的主体; 在灯丝的第一端处耦合到灯丝的第一导体; 设置在所述壳体中并在所述灯丝主体下方的第一拦截棒，其中所述第一拦截杆连接到所述灯丝的第二端; 第二导体，其设置在灯丝的第一端附近并且经由第一拦截棒与导电丝的第二端导电连接，其中第一拦截棒被定位成使得当主体 的灯丝接触第一拦截棒。
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