公开(公告)号：US3757114A

公开(公告)日：1973-09-04

申请号：US3757114D

申请日：1972-03-08

Applicant: BELL TELEPHONE LABOR INC

Inventor： SIMMS D ,  TOLK N ,  WHITE C

IPC: G01T1/29 ,  G01T1/20

CPC classification number: G01T1/29

Abstract: The intensity of a beam of neutral particles traveling at velocities of up to 3.4 X 107 cm/sec may be monitored by inserting a precalibrated target in the path of the beam, and measuring the intensity of photon emissions which result from collision of the particles with the target. The intensity of the beam is related to the intensity of the photon emissions by the calibration factor of the target material. The invention may be used, for example, in conjunction with neutral particle implantation techniques.

公开(公告)号：US3767925A

公开(公告)日：1973-10-23

申请号：US3767925D

申请日：1972-03-08

Applicant: BELL TELEPHONE LABOR INC

Inventor： FOLEY E ,  MAC RAE A ,  WHITE C ,  SIMMS D ,  TOLK N

IPC: G01N23/207 ,  G01Q30/08 ,  G01Q60/44 ,  H01J37/252 ,  H01J37/26

CPC classification number: G01N23/2073 ,  H01J37/252

Abstract: The spatial distribution of constituents and contaminants in a solid is determined either by (1) scanning the surface of the solid with a focused ion or neutral particle beam to sputter excited particles from the surface, resulting in photon emissions characteristic of the sputtered particles, and detecting the photon emissions over the scan period, or by (2) flooding the surface with a diffuse beam, and photographically recording the distribution of photon emissions. Continued sputtering results in removal of surface material and detection of the photon count rate or a sequence of photographs taken during each successive scan period indicates the distribution of constituents and contaminants in the bulk of the solid as a function of distance from the surface.

Abstract translation: 固体中成分和污染物的空间分布由（1）用聚焦离子或中性粒子束扫描固体的表面以从表面溅射激发的粒子来确定溅射粒子的光子发射特性， 在扫描周期内检测光子发射，或者（2）用漫射光束淹没该表面，并照相记录光子发射的分布。 继续溅射导致去除表面材料并且检测光子计数速率或在每个连续扫描周期期间拍摄的照片序列表示作为与表面的距离的函数的固体的大部分中的成分和污染物的分布。

公开(公告)号：US3790411A

公开(公告)日：1974-02-05

申请号：US3790411D

申请日：1972-03-08

Applicant: BELL TELEPHONE LABOR INC

Inventor： SIMMS D ,  TOLK N ,  WHITE C

IPC: H01L21/00 ,  H05H5/04 ,  H01L7/54

CPC classification number: H05H5/04 ,  H01L21/00

Abstract: Doping of semiconductor bodies is achieved by bombarding the surface of the semiconductor with a beam of neutral particles to implant particles therein.

Abstract translation: 通过用中性粒子束轰击半导体的表面以在其中注入颗粒来实现半导体体的掺杂。

公开(公告)号：US3757119A

公开(公告)日：1973-09-04

申请号：US3757119D

申请日：1972-03-08

Applicant: BELL TELEPHONE LABOR INC

Inventor： MC CAUGHAN D ,  SIMMS L ,  TOLK N ,  WHITE C

IPC: C23C14/54 ,  G01Q60/00 ,  H01J37/305 ,  H01J37/00

CPC classification number: H01J37/3053 ,  C23C14/54 ,  H01J37/305

Abstract: Efficiencies of sputtering of a material by bombardment with a particle beam are determined by: observing the time required for photon emissions characteristic of the particle sputtered from a film of known thickness of the material to disappear; or observing the time required for photon emissions characteristic of the substrate material to appear.