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1.发明公开公开(公告)号：US20240145644A1
公开(公告)日：2024-05-02
申请号：US18264481
申请日：2022-11-02
发明人： Zhongyuan Sun , Jinxiang Xue , Wei Li , Che An , Fengjie Zhang , Zhiqiang Jiao
CPC分类号： H01L33/54 , H01L25/167 , H01L33/505 , H01L2933/0041 , H01L2933/005
摘要： A display substrate is provided. The display substrate includes a respective encapsulated unit and a separation structure substantially surrounding the respective encapsulated unit. The respective encapsulated unit includes a color conversion layer comprising one or more color conversion blocks; and a respective encapsulating block in an encapsulating layer encapsulating the one or more color conversion blocks. The encapsulating layer is at least partially absent in a peripheral region around the respective encapsulated unit.
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公开(公告)号：US11203808B2
公开(公告)日：2021-12-21
申请号：US16629580
申请日：2018-11-14
发明人： Haibin Zhu , Weijie Wang , Fengjie Zhang , Bo Jiang
摘要： A mask plate includes a plurality of first supporting and shielding strips, and a plurality of second supporting and shielding strips. The second supporting and shielding strips and the first supporting and shielding strips perpendicularly intersect. The first supporting and shielding strips and the second supporting and shielding strips are provided with at least one objective supporting and shielding strip, and an edge of a predetermined surface of the objective supporting and shielding strip parallel to an extending direction of the objective supporting and shielding strip is provided with a thinned area; the thinned area extends in the extending direction of the objective supporting and shielding strip, and has a thickness smaller than a thickness of other areas except the thinned area; and the predetermined surface is a surface of the objective supporting and shielding strip facing a deposition material when a mask evaporation is performed through the mask plate.
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公开(公告)号：US20210222281A1
公开(公告)日：2021-07-22
申请号：US16765330
申请日：2019-12-20
发明人： Haibin Zhu , Xue Dong , Guangcai Yuan , Weijie Wang , Fengjie Zhang
摘要： Embodiments of the present disclosure provide a method of manufacturing a mask, a mask and an evaporation method with a mask. The method comprises: providing a frame and a mask body; and fixing the mask body to the frame to form the mask in a case where at least one of the mask body and the frame is at a predetermined temperature, such that the mask body is elastically deformed by a predetermined amount by tensioning the mask body by the frame by a thermal deformation at a usage temperature different from the predetermined temperature.
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4.发明申请公开(公告)号：US20180080756A1
公开(公告)日：2018-03-22
申请号：US15520406
申请日：2016-08-02
发明人： Fengjie Zhang , Shupeng Guo , Xiaoyun Liu
CPC分类号： G01B11/0683 , C23C14/542 , C23C14/545 , G01B21/08
摘要： The present disclosure relates to a measurement tool, for measuring the thickness of an evaporated film at a particular position on a large-sized substrate. The measurement tool includes: a measurement part, having at least one measurement surface onto which at least one sampling substrate sheet is positional and fixable; and a support part connected with the support part and configured to be supportable on an edge frame of a mask so as to place the measurement part in an inside of the edge frame of the mask through the support part. The present disclosure also relates to a method of measuring a thickness of an evaporated film of a large-sized substrate by using the above measurement tool.
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