公开(公告)号：US07489141B1

公开(公告)日：2009-02-10

申请号：US11205636

申请日：2005-08-16

申请人： Bert M. Vermeire ,  Farhang F. Shadman

发明人： Bert M. Vermeire ,  Farhang F. Shadman

IPC分类号： G01R27/00 ,  G01R27/04 ,  G01R27/32 ,  G01R27/08

CPC分类号： G01D5/24

摘要： The present invention provides a micro sensor for monitoring the cleaning and drying processes of surfaces of dielectric films, micro features in porous dielectric films and biologic or other cells common in microelectronics fabrication, MEMS fabrication or microbiology test system fabrication. By embedding electrodes in the surface of a supporting dielectric, the sensor can probe the surface and pores of a covering dielectric or a cell on the covering dielectric. The addition of a guard reduces the effects of any parasitic capacitance, which extends the measurement bandwidth of the sensor and allows it to be manufactured at the scale of a single cell, a feature that is particularly important for applications in microbiology.

摘要翻译： 本发明提供了一种微型传感器，用于监测介电膜表面的清洁和干燥过程，多孔介电膜中的微观特征以及微电子制造，MEMS制造或微生物学测试系统制造中常见的生物或其它细胞。 通过将电极嵌入支撑电介质的表面，传感器可以探测覆盖电介质或覆盖电介质上的电池的表面和孔。 防护器的添加减少了任何寄生电容的影响，这扩大了传感器的测量带宽，并允许其以单个电池的规模制造，这是对微生物学应用特别重要的特征。

公开(公告)号：US07332902B1

公开(公告)日：2008-02-19

申请号：US11205582

申请日：2005-08-16

申请人： Bert M. Vermeire ,  Farhang F. Shadman

发明人： Bert M. Vermeire ,  Farhang F. Shadman

IPC分类号： G01N27/00 ,  G01N27/26 ,  G01R27/28

CPC分类号： G01N27/07 ,  B01L3/5027 ,  B01L3/502707 ,  B01L2300/0645 ,  B01L2300/0816 ,  B01L2300/0887

摘要： The present invention provides a micro sensor for monitoring the cleaning and drying processes for very high aspect ratio micro channels in dielectric films oriented parallel to the fluid-solid interface during the manufacture of ICs, MEMS and other micro-devices. The micro sensor can be used to monitor “vertical” micro features common in microelectronics fabrication or “horizontal” micro features found in MEMS or microfluidic fabrication. By forming the micro channels parallel to the interface, the channels can be made with much higher and well controlled aspect ratios. In addition, multiple sensors can sense the impedance at various points along the micro features. The addition of a guard reduces the effects of any parasitic capacitance, which extends the measurement bandwidth of the sensor.

摘要翻译： 本发明提供了一种微型传感器，用于在制造IC，MEMS和其它微器件期间，监测在平行于流体 - 固体界面定向的介电膜中的非常高的纵横比微通道的清洁和干燥过程。 微型传感器可用于监测微电子制造中常见的“垂直”微特征或在MEMS或微流体制造中发现的“水平”微特征。 通过与界面平行地形成微通道，可以制造具有更高和更好控制的纵横比的通道。 此外，多个传感器可以感测沿着微特征的各个点处的阻抗。 防护装置的增加可以减少任何寄生电容的影响，从而延长了传感器的测量带宽。

公开(公告)号：US08253422B2

公开(公告)日：2012-08-28

申请号：US13048703

申请日：2011-03-15

申请人： Bert M. Vermeire ,  Farhang F. Shadman

发明人： Bert M. Vermeire ,  Farhang F. Shadman

IPC分类号： G01R31/08

CPC分类号： H01L21/67288 ,  G01N27/02 ,  H01L21/67028 ,  H01L21/67057

摘要： A method of improving the clean, rinse and dry processes during the manufacture of ICs, MEMS and other micro-devices to conserve solution and energy while completing the process within a specified time. An electro-chemical residue sensor (ECRS) provides in-situ and real-time measurement of residual contamination on a surface or inside void micro features within the sensor representative of conditions on production wafers. The in-situ measurements are used to design and optimize a production process. The wafers are manufactured in accordance with the production process without the ECRS.

摘要翻译： 一种在制造IC，MEMS和其他微型装置的过程中改进清洁，冲洗和干燥工艺的方法，以在规定时间内完成工艺过程中节省溶液和能量。 电化学残留物传感器（ECRS）提供了现场和实时测量表面上的残留污染物或传感器内的空隙微特征，代表生产晶片上的条件。 原位测量用于设计和优化生产过程。 晶圆根据不含ECRS的生产工艺制造。

公开(公告)号：US08120368B2

公开(公告)日：2012-02-21

申请号：US13047509

申请日：2011-03-14

申请人： Bert M. Vermeire ,  Farhang F. Shadman

发明人： Bert M. Vermeire ,  Farhang F. Shadman

IPC分类号： G01R31/08 ,  G01R27/08

CPC分类号： H01L21/67288 ,  G01N27/02 ,  H01L21/67028 ,  H01L21/67057

摘要： A method of improving the clean, rinse and dry processes during the manufacture of ICs, MEMS and other micro-devices to conserve solution and energy while completing the process within a specified time. An electro-chemical residue sensor (ECRS) provides in-situ and real-time measurement of residual contamination on a surface or inside void micro features within the sensor representative of conditions on production wafers. The measured impedance can be used to determine what process variables and specifically how process conditions affect the rate of change of the measured impedance. The in-situ measurements are used to design and optimize a production process and/or to monitor the production run in real-time to control the process conditions and transfer of a patterned wafer through the processes.

摘要翻译： 一种在制造IC，MEMS和其他微型装置的过程中改进清洁，冲洗和干燥工艺的方法，以在规定时间内完成工艺过程中节省溶液和能量。 电化学残留物传感器（ECRS）提供了现场和实时测量表面上的残留污染物或传感器内的空隙微特征，代表生产晶片上的条件。 测量的阻抗可用于确定哪些过程变量，具体如何影响测量阻抗的变化率。 原位测量用于设计和优化生产过程和/或实时监控生产运行，以通过该过程控制图案化晶片的工艺条件和转移。

公开(公告)号：US07932726B1

公开(公告)日：2011-04-26

申请号：US11968726

申请日：2008-01-03

申请人： Bert M. Vermeire ,  Farhang F. Shadman

发明人： Bert M. Vermeire ,  Farhang F. Shadman

IPC分类号： G01R31/08 ,  G01N27/00

CPC分类号： H01L21/67288 ,  G01N27/02 ,  H01L21/67028 ,  H01L21/67057

摘要： A method of improving the clean, rinse and dry processes during the manufacture of ICs, MEMS and other micro-devices to conserve solution and energy while completing the process within a specified time. An electro-chemical residue sensor (ECRS) provides in-situ and real-time measurement of residual contamination on a surface or inside void micro features within the sensor representative of conditions on production wafers. The measured impedance can be used to determine what process variables and specifically how process conditions affect the rate of change of the measured impedance. The in-situ measurements are used to design and optimize a production process and/or to monitor the production run in real-time to control the process conditions and transfer of a patterned wafer through the processes.

摘要翻译： 一种在制造IC，MEMS和其他微型装置的过程中改进清洁，冲洗和干燥工艺的方法，以在规定时间内完成工艺过程中节省溶液和能量。 电化学残留物传感器（ECRS）提供了现场和实时测量表面上的残留污染物或传感器内的空隙微特征，代表生产晶片上的条件。 测量的阻抗可用于确定哪些过程变量，具体如何影响测量阻抗的变化率。 原位测量用于设计和优化生产过程和/或实时监控生产运行，以通过该过程控制图案化晶片的工艺条件和转移。

公开(公告)号：US20110180106A1

公开(公告)日：2011-07-28

申请号：US13048703

申请日：2011-03-15

申请人： Bert M. Vermeire ,  Farhang F. Shadman

发明人： Bert M. Vermeire ,  Farhang F. Shadman

IPC分类号： B08B3/08 ,  B08B7/00

CPC分类号： H01L21/67288 ,  G01N27/02 ,  H01L21/67028 ,  H01L21/67057

摘要： A method of improving the clean, rinse and dry processes during the manufacture of ICs, MEMS and other micro-devices to conserve solution and energy while completing the process within a specified time. An electro-chemical residue sensor (ECRS) provides in-situ and real-time measurement of residual contamination on a surface or inside void micro features within the sensor representative of conditions on production wafers. The measured impedance can be used to determine what process variables and specifically how process conditions affect the rate of change of the measured impedance. The in-situ measurements are used to design and optimize a production process and/or to monitor the production run in real-time to control the process conditions and transfer of a patterned wafer through the processes.

摘要翻译： 一种在制造IC，MEMS和其他微型装置的过程中改进清洁，冲洗和干燥工艺的方法，以在规定时间内完成工艺过程中节省溶液和能量。 电化学残留物传感器（ECRS）提供了现场和实时测量表面上的残留污染物或传感器内的空隙微特征，代表生产晶片上的条件。 测量的阻抗可用于确定哪些过程变量，具体如何影响测量阻抗的变化率。 原位测量用于设计和优化生产过程和/或实时监控生产运行，以通过该过程控制图案化晶片的工艺条件和转移。

公开(公告)号：US20110166691A1

公开(公告)日：2011-07-07

申请号：US13047509

申请日：2011-03-14

申请人： Bert M. Vermeire ,  Farhang F. Shadman

发明人： Bert M. Vermeire ,  Farhang F. Shadman

IPC分类号： G06F19/00 ,  G01R27/28

CPC分类号： H01L21/67288 ,  G01N27/02 ,  H01L21/67028 ,  H01L21/67057

摘要： A method of improving the clean, rinse and dry processes during the manufacture of ICs, MEMS and other micro-devices to conserve solution and energy while completing the process within a specified time. An electro-chemical residue sensor (ECRS) provides in-situ and real-time measurement of residual contamination on a surface or inside void micro features within the sensor representative of conditions on production wafers. The measured impedance can be used to determine what process variables and specifically how process conditions affect the rate of change of the measured impedance. The in-situ measurements are used to design and optimize a production process and/or to monitor the production run in real-time to control the process conditions and transfer of a patterned wafer through the processes.

摘要翻译： 一种在制造IC，MEMS和其他微型装置的过程中改进清洁，冲洗和干燥工艺的方法，以在规定时间内完成工艺过程中节省溶液和能量。 电化学残留物传感器（ECRS）提供了现场和实时测量表面上的残留污染物或传感器内的空隙微特征，代表生产晶片上的条件。 测量的阻抗可用于确定哪些过程变量，具体如何影响测量阻抗的变化率。 原位测量用于设计和优化生产过程和/或实时监控生产运行，以通过该过程控制图案化晶片的工艺条件和转移。

公开(公告)号：US07317317B1

公开(公告)日：2008-01-08

申请号：US11205635

申请日：2005-08-16

申请人： Bert M. Vermeire ,  Farhang F. Shadman

发明人： Bert M. Vermeire ,  Farhang F. Shadman

IPC分类号： G01R27/28 ,  G01R27/04

CPC分类号： G01N27/02 ,  G01D5/24 ,  G01D5/2405

摘要： The micro sensor is fabricated with a guard that shields the electrodes from the surrounding environment, thereby reducing loss of measurement signal through the parasitic capacitances to the substrate and fluid. The guards are low impedance points in the circuit that are biased to track as closely as possible the ac voltages of the respective electrodes. Each guard is suitably connected to the output of a guard buffer that supplies the current required to ensure that the guard is at all times at nearly the same voltage as the electrode it is guarding. The micro sensor has an improved signal to noise ratio (SNR) over an extended measurement frequency range (bandwidth) for monitoring in-situ the cleaning and drying processes for high aspect ratio micro features in dielectric films oriented perpendicular to the fluid-solid interface during the manufacture of ICs, MEMS and other micro-devices.

摘要翻译： 微型传感器制造有一个保护屏蔽电极与周围的环境，从而减少测量信号通过寄生电容到基板和流体的损失。 保护器是电路中的低阻抗点，其被偏置以尽可能接近地跟踪各个电极的交流电压。 每个保护器适当地连接到保护缓冲器的输出端，保护缓冲器的输出提供所需的电流，以确保防护装置始终处于与其保护的电极几乎相同的电压。 微传感器在扩展的测量频率范围（带宽）上具有改进的信噪比（SNR），用于在原位监测用于垂直于流体 - 固体界面定向的介电膜中的高纵横比微观特征的清洁和干燥过程 制造IC，MEMS等微器件。

公开(公告)号：US07239163B1

公开(公告)日：2007-07-03

申请号：US11156022

申请日：2005-06-17

申请人： Jeremy John Ralston-Good ,  Philipp S. Spuhler ,  Bert M. Vermeire ,  Douglas Leonard Goodman

发明人： Jeremy John Ralston-Good ,  Philipp S. Spuhler ,  Bert M. Vermeire ,  Douglas Leonard Goodman

IPC分类号： G01R31/02

CPC分类号： G01R31/2884

摘要： A die-level process monitor (DLPM) provides a means for independently determining whether an IC malfunction is a result of the design or the manufacturing processing and further for gathering data on specific process parameters. The DLPM senses parameter variations that result from manufacturing process drift and outputs a measure of the process parameter. The DLPM will typically sense the mismatch of process parameters between two or more test devices as a measure of process variation between a like pair of production devices. The DLPM may be used as a diagnostic tool to determine why an IC failed to perform within specification or to gather statistics on measured process parameters for a given foundry or process.

摘要翻译： 裸片级过程监视器（DLPM）提供了一种用于独立地确定IC故障是由设计或制造处理的结果以及进一步收集关于特定工艺参数的数据的手段。 DLPM感测由制造过程漂移产生的参数变化，并输出过程参数的度量。 DLPM通常将感测两个或多个测试设备之间的过程参数的不匹配，作为类似的一对生产设备之间的过程变化的量度。 DLPM可用作诊断工具，以确定IC在规格范围内无法执行的原因，或者收集关于给定代工厂或过程的测量过程参数的统计信息。

公开(公告)号：US07271608B1

公开(公告)日：2007-09-18

申请号：US10716686

申请日：2003-11-19

申请人： Bert M. Vermeire ,  Harold G. Parks ,  Douglas L. Goodman

发明人： Bert M. Vermeire ,  Harold G. Parks ,  Douglas L. Goodman

IPC分类号： G01R31/02

CPC分类号： G01R31/2856 ,  G01R31/2879

摘要： A prognostic cell is used to predict impending failure of a useful circuit or circuits in a host IC. Increasing the stress on the prognostic cell relative to the useful circuit shifts the failure distribution of the cell along the time axis. The relative amount of time between the useful circuit failure and prognostic cell trigger point is the “prognostic distance”. The prognostic distance is controlled by designing in the excess stress applied in test device(s), by setting the threshold for triggering in the comparison circuit or by both. Prediction accuracy is enhanced by using multiple test devices to oversample the underlying failure distribution and triggering the failure indicator when a certain fraction fail.

摘要翻译： 预测细胞用于预测主机IC中有用电路或电路的即将发生的故障。 相对于有用的电路增加对预后细胞的压力将沿着时间轴移动细胞的失效分布。 有用的电路故障和预后单元触发点之间的相对时间量是“预后距离”。 通过设计在测试装置中施加的过度应力，通过设置比较电路中的触发阈值或两者来控制预测距离。 通过使用多个测试设备来过滤基础故障分布并在某个分数失败时触发故障指示器来提高预测精度。