摘要:
A circuit includes a gate node, and a bias circuit coupled to the gate node. The bias circuit is configured to, in response to a change in a gate voltage on the gate node, provide a positive feedback to the gate voltage. A power circuit is coupled to the gate node, wherein the power circuit includes a power Metal-Oxide-Semiconductor (MOS) transistor. The power circuit is configured to, in response to a change in the gate voltage, provide a negative feedback to the gate voltage. An output node is coupled to the power circuit.
摘要:
A circuit includes a gate node, and a bias circuit coupled to the gate node. The bias circuit is configured to, in response to a change in a gate voltage on the gate node, provide a positive feedback to the gate voltage. A power circuit is coupled to the gate node, wherein the power circuit includes a power Metal-Oxide-Semiconductor (MOS) transistor. The power circuit is configured to, in response to a change in the gate voltage, provide a negative feedback to the gate voltage. An output node is coupled to the power circuit.
摘要:
A device includes a dielectric layer, and a heavily doped semiconductor layer over the dielectric layer. The heavily doped semiconductor layer is of a first conductivity type. A semiconductor region is over the heavily doped semiconductor layer, wherein the semiconductor region is of a second conductivity type opposite the first conductivity type. A Lateral Insulated Gate Bipolar Transistor (LIGBT) is disposed at a surface of the semiconductor region.
摘要:
A device includes a dielectric layer, and a heavily doped semiconductor layer over the dielectric layer. The heavily doped semiconductor layer is of a first conductivity type. A semiconductor region is over the heavily doped semiconductor layer, wherein the semiconductor region is of a second conductivity type opposite the first conductivity type. A Lateral Insulated Gate Bipolar Transistor (LIGBT) is disposed at a surface of the semiconductor region.
摘要:
The invention is directed to an image sensor with enhanced blue response and limited cross-talk. The image sensor is made of a photodiode layer. Disposed on one side of the photodiode layer is a substrate layer made out of an oppositely charged semiconductor material. The substrate layer is further defined by two different sub-layers, where the doping densities of the sub-layers differ. This difference in doping creates a deep electric field that inhibits carriers from moving to another sensor. Additionally, the potential of the deep electric field directs these carriers back to the N-P junction formed by the substrate layer and the photodiode layer. Working in conjunction with this, a shallow implant layer is disposed on the opposite side of the photodiode layer. The shallow implant layer creates an electric field between the photodiode layer and the shallow implant layer, directing carriers to the photodiode layer. As such, carriers generated in the shallow areas of the image sensor are discouraged from surface recombination effects.
摘要:
A method and structure are described for a monolithic roofshooter ink jet printhead which has nozzles and ink channels formed in a polyimide layer overlying a silicon substrate. Resistor heaters, addressing logic circuitry, and ink inlets are formed in a silicon substrate. A fabrication process, simple and monolithic, is performed at low temperatures resulting in a structure which has nozzle diameters of 30 .mu. separated by distances of 10 .mu. or less. This structure results in a printhead which has a printing resolution of 630 dpi.
摘要:
An adjustable lens system comprises a housing, an adjustable lens assembly, comprising a lens element, mounted to the housing and placeable in optical states, and a MEMS based micro-motor. The MEMS based micro-motor is mounted to the housing and is operably coupled to the lens assembly for movement of at least a portion of the lens assembly to change the optical state of the lens assembly.
摘要:
A drive transistor for a high resolution ink jet printhead having a pocket implant in the gate region of the device. The pocket implant enables a reduced source to drain spacing without loss of breakdown voltage. Accordingly, the size of the transistor may be reduced. Alternatively, this device is suitable for addressing 1200 spi resolution printheads. In one embodiment, the pocket implant extends about 1 .mu.m beyond the gate region towards the drain region. Both embodiments produce a graded drift region.