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公开(公告)号:US20100261352A1
公开(公告)日:2010-10-14
申请号:US12756086
申请日:2010-04-07
申请人: Bing Ji , Kenji Takeshita , Andrew D. Bailey, III , Eric A. Hudson , Maryam Moravej , Stephen M. Sirard , Jungmin Ko , Daniel Le , Robert C. Hefty , Yu Cheng , Gerardo A. Delgadino , Bi-Ming Yen
发明人: Bing Ji , Kenji Takeshita , Andrew D. Bailey, III , Eric A. Hudson , Maryam Moravej , Stephen M. Sirard , Jungmin Ko , Daniel Le , Robert C. Hefty , Yu Cheng , Gerardo A. Delgadino , Bi-Ming Yen
IPC分类号: H01L21/467
CPC分类号: H01L21/31116 , H01L21/02063 , H01L21/31138
摘要: A method for etching features in a low-k dielectric layer disposed below an organic mask is provided by an embodiment of the invention. Features are etched into the low-k dielectric layer through the organic mask. A fluorocarbon layer is deposited on the low-k dielectric layer. The fluorocarbon layer is cured. The organic mask is stripped.
摘要翻译: 通过本发明的实施例提供了一种用于蚀刻位于有机掩模下方的低k电介质层中的特征的方法。 通过有机掩模将特征蚀刻到低k电介质层中。 在低k电介质层上沉积氟碳层。 氟碳层被固化。 剥去有机面膜。
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公开(公告)号:US08236188B2
公开(公告)日:2012-08-07
申请号:US12756086
申请日:2010-04-07
申请人: Bing Ji , Kenji Takeshita , Andrew D. Bailey, III , Eric A. Hudson , Maryam Moravej , Stephen M. Sirard , Jungmin Ko , Daniel Le , Robert C. Hefty , Yu Cheng , Gerardo A. Delgadino , Bi-Ming Yen
发明人: Bing Ji , Kenji Takeshita , Andrew D. Bailey, III , Eric A. Hudson , Maryam Moravej , Stephen M. Sirard , Jungmin Ko , Daniel Le , Robert C. Hefty , Yu Cheng , Gerardo A. Delgadino , Bi-Ming Yen
CPC分类号: H01L21/31116 , H01L21/02063 , H01L21/31138
摘要: A method for etching features in a low-k dielectric layer disposed below an organic mask is provided by an embodiment of the invention. Features are etched into the low-k dielectric layer through the organic mask. A fluorocarbon layer is deposited on the low-k dielectric layer. The fluorocarbon layer is cured. The organic mask is stripped.
摘要翻译: 通过本发明的实施例提供了一种用于蚀刻位于有机掩模下方的低k电介质层中的特征的方法。 通过有机掩模将特征蚀刻到低k电介质层中。 在低k电介质层上沉积氟碳层。 氟碳层被固化。 剥去有机面膜。
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公开(公告)号:US20090068767A1
公开(公告)日:2009-03-12
申请号:US11854038
申请日:2007-09-12
IPC分类号: H01L21/00
CPC分类号: H01L21/76804 , H01L21/76807 , H01L22/12 , H01L22/20
摘要: A method for designing an etch recipe is provided. An etch is performed, comprising providing an etch gas with a set halogen to carbon ratio, forming a plasma from the etch gas, and etching trenches over via. Via faceting is measured. The halogen to carbon ratio is reset according to the measured via faceting, where the halogen to carbon ratio is increased if too much faceting is measured and the halogen to carbon ratio is decreased if too little faceting is measured. The previous steps are repeated until a desired amount of faceting is obtained.
摘要翻译: 提供了一种设计蚀刻配方的方法。 执行蚀刻,包括提供具有设定的卤素与碳的比例的蚀刻气体,从蚀刻气体形成等离子体,以及蚀刻通过过孔的沟槽。 测量通过面。 卤素与碳的比例根据测量的通孔面重置,其中如果测量太多的小面积,则卤素与碳的比例将增加,并且如果测量的面积太小,则卤素与碳的比率降低。 重复前面的步骤,直到获得所需的刻面数量。
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公开(公告)号:US20060287721A1
公开(公告)日:2006-12-21
申请号:US11409218
申请日:2006-04-20
申请人: David Myung , Christopher Ta , Nabeel Farooqui , Curtis Frank , Won-Gun Koh , Jungmin Ko , Jaan Noolandi , Michael Carrasco
发明人: David Myung , Christopher Ta , Nabeel Farooqui , Curtis Frank , Won-Gun Koh , Jungmin Ko , Jaan Noolandi , Michael Carrasco
IPC分类号: A61F2/14
摘要: The present invention provides an artificial corneal implant having an optically clear central core and a porous, hydrophilic, biocompatible skirt peripheral to the central core. In one embodiment, the central core is made of an interpenetrating double network hydrogel and the skirt is made of poly(2-hydroxyethyl acrylate) (PHEA). In another embodiment, both the central core and the skirt are made of interpenetrating double network hydrogels. The artificial corneal implant may also have an interdiffusion zone in which the skirt component is interpenetrated with the core component, or vice versa. In a preferred embodiment, biomolecules are linked to the skirt, central core or both. These biomolecules may be any type of biomolecule, but are preferably biomolecules that support epithelial and/or fibroblast cell survival and growth. Preferably, the biomolecules are linked in a spatially selective manner. The present invention also provides a method of making an artificial corneal implant using photolithography.
摘要翻译: 本发明提供了一种人造角膜植入物,其具有光学透明的中心纤芯和围绕中心纤芯的多孔,亲水的,生物相容的裙部。 在一个实施方案中,中心芯由互穿双网络水凝胶制成,裙部由聚(丙烯酸2-羟乙酯)(PHEA)制成。 在另一个实施例中,中心芯和裙部均由互穿双网络水凝胶制成。 人造角膜植入物也可以具有相互扩散区域,其中裙部组件与芯部件互穿,反之亦然。 在优选的实施方案中,生物分子连接到裙部,中心芯或两者。 这些生物分子可以是任何类型的生物分子,但优选支持上皮和/或成纤维细胞存活和生长的生物分子。 优选地,生物分子以空间选择性方式连接。 本发明还提供了使用光刻法制造人造角膜植入物的方法。
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