公开(公告)号：US20100233385A1

公开(公告)日：2010-09-16

申请号：US12377658

申请日：2007-08-29

申请人： Birte Dresler ,  Volkmar Hopfe ,  Ines Dani

发明人： Birte Dresler ,  Volkmar Hopfe ,  Ines Dani

IPC分类号： C23C16/48 ,  C23C16/00

CPC分类号： C23C16/452 ,  C23C16/45519 ,  C23C16/45595 ,  C23C16/48 ,  C23C16/545

摘要： The invention relates to an apparatus and to a method of forming thin films on substrate surfaces. It is the object of the invention to provide possibilities with which thin layers can be manufactured on substrate surfaces which have a specific layer material formation with desired properties. The apparatus in accordance with the invention is made such that a feed is present for at least one gaseous precursor, which contributes to the layer formation, at a reaction chamber region above a substrate surface to be coated. A source which is a plasma source and which emits electromagnetic radiation is moreover arranged such that a photolytic activation of atoms and/or molecules of the precursor(s) takes place with the emitted electromagnetic radiation. In this respect, the plasma source should be arranged and should also be operated such that no direct influence of the plasma on the substrate surface and on the precursors resulting in the layer formation takes place.

摘要翻译： 本发明涉及在衬底表面上形成薄膜的装置和方法。 本发明的目的是提供可以在具有所需性质的特定层材料形成的衬底表面上制造薄层的可能性。 根据本发明的装置被制成使得在待涂覆的基底表面上方的反应室区域处存在用于至少一种有助于层形成的气态前体的进料。 作为等离子体源并且发射电磁辐射的源被布置成使得发射的电磁辐射发生前体的原子和/或分子的光解活化。 在这方面，应该布置等离子体源，并且还应该进行操作，使得不会发生等离子体对衬底表面和前体的直接影响，导致形成层。