公开(公告)号：US20150370159A1

公开(公告)日：2015-12-24

申请号：US14839147

申请日：2015-08-28

申请人： Board of Regents The University of Texas System

发明人： Carlton Grant Willson ,  Christopher John Ellison ,  Takehiro Sleshimo ,  Julia Cushen ,  Christopher M. Bates ,  Leon Dean ,  Logan J. Santos ,  Erica L. Rausch

IPC分类号： G03F1/50 ,  C09D167/00

CPC分类号： G03F1/50 ,  B05D1/005 ,  B05D5/00 ,  B05D7/52 ,  B05D7/56 ,  B05D2252/02 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y40/00 ,  C09D137/00 ,  C09D167/00 ,  G03F7/0002 ,  Y10T428/24802 ,  Y10T428/31663 ,  Y10T428/31855

摘要： The present invention involves the use of random copolymer top coats that can be spin coated onto block copolymer thin films and used to control the interfacial energy of the top coat-block copolymer interface. The top coats are soluble in aqueous weak base and can change surface energy once they are deposited onto the block copolymer thin film. The use of self-assembled block copolymers to produce advanced lithographic patterns relies on their orientation control in thin films. Top coats potentially allow for the facile orientation control of block copolymers which would otherwise be quite challenging.

摘要翻译： 本发明涉及使用可以旋涂在嵌段共聚物薄膜上并用于控制顶部涂层 - 嵌段共聚物界面的界面能的无规共聚物顶涂层。 顶涂层可溶于弱碱水溶液，一旦沉积在嵌段共聚物薄膜上就可以改变表面能。 使用自组装嵌段共聚物来生产先进的平版印刷图案依赖于它们在薄膜中的取向控制。 顶涂层可能允许嵌段共聚物的容易取向控制，否则这将是相当具有挑战性的。

公开(公告)号：US10139724B2

公开(公告)日：2018-11-27

申请号：US14839147

申请日：2015-08-28

申请人： Board of Regents The University of Texas System

发明人： C. Grant Willson ,  Christopher John Ellison ,  Takehiro Sleshimo ,  Julia Cushen ,  Christopher M. Bates ,  Leon Dean ,  Logan J. Santos ,  Erica L. Rausch

IPC分类号： G03F1/50 ,  B05D1/00 ,  B05D5/00 ,  B05D7/00 ,  B81C1/00 ,  G03F7/00 ,  C09D137/00 ,  B82Y10/00 ,  B82Y40/00 ,  C09D167/00

摘要： The concepts described herein involve the use of random copolymer top coats that can be spin coated onto block copolymer thin films and used to control the interfacial energy of the top coat-block copolymer interface. The top coats are soluble in aqueous weak base and can change surface energy once they are deposited onto the block copolymer thin film. The use of self-assembled block copolymers to produce advanced lithographic patterns relies on their orientation control in thin films. Top coats potentially allow for the facile orientation control of block copolymers which would otherwise be quite challenging.