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公开(公告)号：US20130135595A1
公开(公告)日：2013-05-30
申请号：US13685410
申请日：2012-11-26
申请人： Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS
发明人： Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70866 , G03F9/7026 , G03F9/7034
摘要： In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.
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公开(公告)号：US20110116061A1
公开(公告)日：2011-05-19
申请号：US13012303
申请日：2011-01-24
申请人： Aleksey Yurievich KOLESNYCHENKO , Johannes Jacobus Matheus BASELMANS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Hans JANSEN , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Felix Godfried Peter PEETERS , Bob STREEFKERK , Franciscus Johannes Herman Maria TEUNISSEN , Helmar VAN SANTEN
发明人： Aleksey Yurievich KOLESNYCHENKO , Johannes Jacobus Matheus BASELMANS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Hans JANSEN , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Felix Godfried Peter PEETERS , Bob STREEFKERK , Franciscus Johannes Herman Maria TEUNISSEN , Helmar VAN SANTEN
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
摘要： A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
摘要翻译： 公开了一种浸没式光刻设备的衬底台，其包括构造成收集液体的阻挡层。 屏障围绕基板并与衬底间隔开。 以这种方式，可以收集从液体供应系统溢出的任何液体，以减少光刻投影设备的精细部件污染的风险。
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公开(公告)号：US20110273677A1
公开(公告)日：2011-11-10
申请号：US13186991
申请日：2011-07-20
申请人： Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Richard Joseph BRULS , Marcel Mathijs Theodore Marie DIERICHS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Hans JANSEN , Erick Roelof LOOPSTRA , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Ronald Walther Jeanne SEVERIJNS , Sergei SHULEPOV , Herman BOOM , Timotheus Franciscus SENGERS
发明人： Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Richard Joseph BRULS , Marcel Mathijs Theodore Marie DIERICHS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Hans JANSEN , Erick Roelof LOOPSTRA , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Ronald Walther Jeanne SEVERIJNS , Sergei SHULEPOV , Herman BOOM , Timotheus Franciscus SENGERS
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70908 , G03F7/70958
摘要： An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
摘要翻译： 公开了一种浸没式光刻投影装置，其中液体设置在装置的投影系统和基板之间。 为了防止在液体中形成气泡，有助于减少与液体接触后的元件上的残留物，就可以在设备的各种元件上使用液体和液体两层。
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公开(公告)号：US20110001944A1
公开(公告)日：2011-01-06
申请号：US12882886
申请日：2010-09-15
申请人： Johannes Jacobus Matheus BASELMANS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Bob STREEFKERK
发明人： Johannes Jacobus Matheus BASELMANS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Bob STREEFKERK
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus is disclosed which includes a liquid supply system having an inlet configured to supply a liquid to a space between a projection system of the lithographic apparatus and a substrate and an outlet configured to remove at least part of the liquid, the liquid supply system configured to rotate the inlet, the outlet, or both, about an axis substantially perpendicular to an exposure plane of the substrate.
摘要翻译： 公开了一种浸没式光刻设备，其包括液体供应系统，该液体供应系统具有被配置为将液体供应到光刻设备的投影系统与基板之间的空间的入口以及被构造成去除至少部分液体的出口，液体供应 系统构造成围绕基本上垂直于衬底的曝光平面的轴旋转入口，出口或两者。
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公开(公告)号：US20130250270A1
公开(公告)日：2013-09-26
申请号：US13615190
申请日：2012-09-13
申请人： Joeri LOF , Erik Theodorus Maria BIJLAART , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Erik Roelof LOOPSTRA , Hendricus Johannes Maria MEIJER , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Roelof Aeilko Siebrand RITSEMA , Timotheus Franciscus SENGERS , Klaus SIMON , Joannes Theodoor DE SMIT , Alexander STRAAIJER , Bob STREEFKERK , Antonius Theodorus Anna Maria DERKSEN
发明人： Joeri LOF , Erik Theodorus Maria BIJLAART , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Erik Roelof LOOPSTRA , Hendricus Johannes Maria MEIJER , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Roelof Aeilko Siebrand RITSEMA , Timotheus Franciscus SENGERS , Klaus SIMON , Joannes Theodoor DE SMIT , Alexander STRAAIJER , Bob STREEFKERK , Antonius Theodorus Anna Maria DERKSEN
IPC分类号： G03F7/20
CPC分类号： G03F7/70858 , G03F7/70341 , G03F7/70716 , G03F7/70775 , G03F7/7085
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
摘要翻译： 公开了一种光刻投影装置，其中投影系统和基板之间的空间填充有液体。 边缘密封构件至少部分地围绕衬底台面上的衬底或其它物体，以防止衬底或其他物体的边缘部分例如成像或照亮时的液体损失。 光刻投影装置包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统，被配置为向所述投影系统和所述基板之间的空间提供液体; 以及快门，被配置为隔离所述基板的空间或被基板占据的空间。
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公开(公告)号：US20120086928A1
公开(公告)日：2012-04-12
申请号：US13331865
申请日：2011-12-20
申请人： Johannes Jacobus Matheus BASELMANS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Jeroen Johannes Sophia MERTENS , Johannes Catharinus Hubertus MULKENS , Bob STREEFKERK
发明人： Johannes Jacobus Matheus BASELMANS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Jeroen Johannes Sophia MERTENS , Johannes Catharinus Hubertus MULKENS , Bob STREEFKERK
IPC分类号： G03B27/52
CPC分类号： G03F9/7023 , G03F7/70341 , G03F7/70883
摘要： A lithographic apparatus, includes a support structure configured to hold a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate table; a sensor configured to measure an exposure parameter using a measuring beam projected through the liquid; and a correction system configured to determine an offset based on a change of a physical property impacting a measurement made using the measuring beam to at least partly correct the measured exposure parameter.
摘要翻译： 光刻设备包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置成在其横截面中赋予图案的辐射束; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统，被配置为向所述投影系统和所述基板台之间的空间提供液体; 传感器，被配置为使用通过所述液体投影的测量光束来测量曝光参数; 以及校正系统，其被配置为基于影响使用所述测量光束进行的测量的物理属性的变化来确定偏移，以至少部分地校正所测量的曝光参数。
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公开(公告)号：US20090214986A1
公开(公告)日：2009-08-27
申请号：US12463242
申请日：2009-05-08
申请人： Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Paul GRAUPNER , Jan HAISMA , Nicodemus HATTU , Christiaan Alexander HOOGENDAM , Erik Roelof LOOPSTRA , Johannes Catharinus Hubertus MULKENS , Bernard GELLRICH
发明人： Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Paul GRAUPNER , Jan HAISMA , Nicodemus HATTU , Christiaan Alexander HOOGENDAM , Erik Roelof LOOPSTRA , Johannes Catharinus Hubertus MULKENS , Bernard GELLRICH
CPC分类号： G03F7/70341 , G03F7/7095
摘要： The joint between the projection system element and its support comprises an inorganic layer or a direct bond and is thus liquid tight, which can prevent deformation by an immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation of this joint. In an embodiment, the elements and its support are made of quartz.
摘要翻译： 投影系统元件及其支撑体之间的接合部包括无机层或直接接合，因此液密，能够防止浸渍液体发生变形。 关节可以做温暖还是冷。 焊料，胶水和胶水保护都可用于形成这种接头。 在一个实施例中，元件及其支撑件由石英制成。
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公开(公告)号：US20100221660A1
公开(公告)日：2010-09-02
申请号：US12781341
申请日：2010-05-17
CPC分类号： G03F7/70958 , G03F7/70341
摘要： A substrate is provided with a coating of material which is substantially transparent to the wavelength of the projection beam. The coating may be thicker than the wavelength of the projection beam and have a refractive index of the coating such that the wavelength of the projection beam is shortened as it passes through it. This allows the imaging of smaller features on the substrate. Alternatively, the coating may be used with a liquid supply system and act to keep bubbles away from a radiation sensitive layer of the substrate.
摘要翻译： 基板设置有对投影光束的波长基本透明的材料涂层。 涂层可以比投影光束的波长厚，并且具有涂层的折射率，使得投影光束的波长在其通过时被缩短。 这允许在衬底上成像较小的特征。 或者，涂层可以与液体供应系统一起使用，并且用于保持气泡远离基底的辐射敏感层。
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公开(公告)号：US20110025993A1
公开(公告)日：2011-02-03
申请号：US12901163
申请日：2010-10-08
IPC分类号： G03B27/52
CPC分类号： G03F7/70925 , G03F7/70341 , G03F7/70858 , G03F7/70916
摘要： A system to recycle immersion fluid in an immersion fluid lithographic apparatus is described. A recycling path comprising a plurality of parallel paths, each of which has its own parallel liquid treatment unit optimized to treat fluid which is directed through it, is disclosed.
摘要翻译： 描述了在浸没流体光刻设备中回收浸没流体的系统。 公开了一种循环路径，其包括多个平行路径，每个路径具有其自己的平行液体处理单元，其被优化以处理被引导通过其的流体。
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10.发明申请LITHOGRAPHIC APPARATUS, FLUID COMBINING UNIT AND DEVICE MANUFACTURING METHOD 有权液晶显示装置，流体组合装置及装置制造方法公开(公告)号：US20120013866A1
公开(公告)日：2012-01-19
申请号：US13238941
申请日：2011-09-21
IPC分类号： G03B27/52
CPC分类号： H01L21/0274 , G03F7/70341
摘要： A system for tuning the refractive index of immersion liquid in an immersion lithographic apparatus is disclosed. Two or more immersion liquids of different refractive index are mixed together in order to achieve a desired refractive index. Further, the fluids may be conditioned and treated to maintain optical characteristics.
摘要翻译： 公开了一种用于调节浸没式光刻设备中浸没液的折射率的系统。 将两种或更多种不同折射率的浸液混合在一起以达到所需的折射率。 此外，流体可以被调节和处理以保持光学特性。
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