公开(公告)号：US20110273677A1

公开(公告)日：2011-11-10

申请号：US13186991

申请日：2011-07-20

申请人： Bob STREEFKERK ,  Johannes Jacobus Matheus BASELMANS ,  Richard Joseph BRULS ,  Marcel Mathijs Theodore Marie DIERICHS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Hans JANSEN ,  Erick Roelof LOOPSTRA ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertus MULKENS ,  Ronald Walther Jeanne SEVERIJNS ,  Sergei SHULEPOV ,  Herman BOOM ,  Timotheus Franciscus SENGERS

发明人： Bob STREEFKERK ,  Johannes Jacobus Matheus BASELMANS ,  Richard Joseph BRULS ,  Marcel Mathijs Theodore Marie DIERICHS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Hans JANSEN ,  Erick Roelof LOOPSTRA ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertus MULKENS ,  Ronald Walther Jeanne SEVERIJNS ,  Sergei SHULEPOV ,  Herman BOOM ,  Timotheus Franciscus SENGERS

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

摘要： An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.

摘要翻译： 公开了一种浸没式光刻投影装置，其中液体设置在装置的投影系统和基板之间。 为了防止在液体中形成气泡，有助于减少与液体接触后的元件上的残留物，就可以在设备的各种元件上使用液体和液体两层。

公开(公告)号：US20110116061A1

公开(公告)日：2011-05-19

申请号：US13012303

申请日：2011-01-24

申请人： Aleksey Yurievich KOLESNYCHENKO ,  Johannes Jacobus Matheus BASELMANS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Hans JANSEN ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertus MULKENS ,  Felix Godfried Peter PEETERS ,  Bob STREEFKERK ,  Franciscus Johannes Herman Maria TEUNISSEN ,  Helmar VAN SANTEN

发明人： Aleksey Yurievich KOLESNYCHENKO ,  Johannes Jacobus Matheus BASELMANS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Hans JANSEN ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertus MULKENS ,  Felix Godfried Peter PEETERS ,  Bob STREEFKERK ,  Franciscus Johannes Herman Maria TEUNISSEN ,  Helmar VAN SANTEN

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70733 ,  G03F7/70866 ,  G03F7/70908

摘要： A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

摘要翻译： 公开了一种浸没式光刻设备的衬底台，其包括构造成收集液体的阻挡层。 屏障围绕基板并与衬底间隔开。 以这种方式，可以收集从液体供应系统溢出的任何液体，以减少光刻投影设备的精细部件污染的风险。

公开(公告)号：US20120008119A1

公开(公告)日：2012-01-12

申请号：US13242401

申请日：2011-09-23

申请人： Hans JANSEN ,  Johannes Jacobus Matheus BASELMANS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Jeroen Johannes Sophia Maria MERTENS ,  Jahannes Catharinus Hubertus MULKENS ,  Marco Koert STAVENGA ,  Bob STREEFKERK ,  Jan Cornelis VAN DER HOEVEN ,  Cedric Desire GROUWSTRA

发明人： Hans JANSEN ,  Johannes Jacobus Matheus BASELMANS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Jeroen Johannes Sophia Maria MERTENS ,  Jahannes Catharinus Hubertus MULKENS ,  Marco Koert STAVENGA ,  Bob STREEFKERK ,  Jan Cornelis VAN DER HOEVEN ,  Cedric Desire GROUWSTRA

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70925

摘要： A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.

摘要翻译： 公开了一种清洗浸没式光刻设备内部的方法和装置。 特别地，可以使用光刻设备的液体供应系统将清洁流体引入到投影系统和光刻设备的基板台之间的空间中。 另外或替代地，可以在衬底台上设置清洁装置，并且可以设置超声发射器以产生超声波清洗液体。

公开(公告)号：US20120013870A1

公开(公告)日：2012-01-19

申请号：US13240867

申请日：2011-09-22

申请人： Marcel Mathijs Theodore Marie DIERICHS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Johannes Henricus Wilhelmus JACOBS ,  Hans JANSEN ,  Erik Roelof LOOPSTRA ,  Jeroen Johannes Sophia Maria MERTENS ,  Marco Koert STAVENGA ,  Bob STREEFKERK ,  Martinus Cornelis Maria VERHAGEN ,  Lejla SEUNTIENS-GRUDA

发明人： Marcel Mathijs Theodore Marie DIERICHS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Johannes Henricus Wilhelmus JACOBS ,  Hans JANSEN ,  Erik Roelof LOOPSTRA ,  Jeroen Johannes Sophia Maria MERTENS ,  Marco Koert STAVENGA ,  Bob STREEFKERK ,  Martinus Cornelis Maria VERHAGEN ,  Lejla SEUNTIENS-GRUDA

IPC分类号： G03B27/52

CPC分类号： G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

摘要： In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.

公开(公告)号：US20130070219A1

公开(公告)日：2013-03-21

申请号：US13589841

申请日：2012-08-20

申请人： Bob STREEFKERK ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Hans JANSEN ,  Martinus Hendrikus Antonius LEENDERS ,  Paulus Martinus Maria LIEBREGTS ,  Jeroen Johannes Sophia Maria MERTENS ,  Jan-Gerard Cornelis VAN DER TOORN ,  Michel RIEPEN

发明人： Bob STREEFKERK ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Hans JANSEN ,  Martinus Hendrikus Antonius LEENDERS ,  Paulus Martinus Maria LIEBREGTS ,  Jeroen Johannes Sophia Maria MERTENS ,  Jan-Gerard Cornelis VAN DER TOORN ,  Michel RIEPEN

IPC分类号： G03B27/52 ,  G03B27/58

CPC分类号： G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

摘要： An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.

摘要翻译： 浸没式光刻设备设置有液体限制结构，其限定至少部分地被配置为在投影系统和衬底之间容纳液体的空间。 为了减少正在成像的衬底的边缘（其可能导致在浸没液体中包含气泡）的交叉，使得平行于衬底的平面中的空间的横截面积小至 可能。 最小的理论尺寸是由投影系统成像的目标部分的尺寸。 在一个实施例中，投影系统的最终元件的形状也被改变为在平行于基底的截面与目标部分的横截面上具有相似的尺寸和/或形状。

公开(公告)号：US20110183257A1

公开(公告)日：2011-07-28

申请号：US13083327

申请日：2011-04-08

申请人： Hans JANSEN ,  Sebastiaan Maria Johannes CORNELISSEN ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Hernes JACOBS ,  Martinus Hendrikus Antonius LEENDERS ,  Jeroen Johannes Sophia Maria MERTENS ,  Bob STREEFKERK ,  Jan-Gerard Cornelis VAN DER TOORN ,  Peter SMITS ,  Franciscus Johannes Joseph JANSSEN ,  Michel RIEPEN

发明人： Hans JANSEN ,  Sebastiaan Maria Johannes CORNELISSEN ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Hernes JACOBS ,  Martinus Hendrikus Antonius LEENDERS ,  Jeroen Johannes Sophia Maria MERTENS ,  Bob STREEFKERK ,  Jan-Gerard Cornelis VAN DER TOORN ,  Peter SMITS ,  Franciscus Johannes Joseph JANSSEN ,  Michel RIEPEN

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/707

摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.

摘要翻译： 在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。

公开(公告)号：US20110090474A1

公开(公告)日：2011-04-21

申请号：US12980406

申请日：2010-12-29

申请人： Hans JANSEN ,  Sebastiaan Maria Johannes Cornelissen ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Hernes Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Bob Streefkerk ,  Jan-Gerard Cornelis Van Der Toorn ,  Peter Smits ,  Franciscus Johannes Joseph Janssen ,  Michel Riepen

发明人： Hans JANSEN ,  Sebastiaan Maria Johannes Cornelissen ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Hernes Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Bob Streefkerk ,  Jan-Gerard Cornelis Van Der Toorn ,  Peter Smits ,  Franciscus Johannes Joseph Janssen ,  Michel Riepen

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/707

摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.

公开(公告)号：US20100044593A1

公开(公告)日：2010-02-25

申请号：US12613846

申请日：2009-11-06

申请人： Hans JANSEN ,  Sebastian Maria Johannes Cornelissen ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Hernes Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Jan-Gerard Cornelius Van Der Toorn ,  Peter Smits ,  Franciscus Johannes Joseph Janssen ,  Michel Riepen ,  Bob Streefkerk

发明人： Hans JANSEN ,  Sebastian Maria Johannes Cornelissen ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Hernes Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Jan-Gerard Cornelius Van Der Toorn ,  Peter Smits ,  Franciscus Johannes Joseph Janssen ,  Michel Riepen ,  Bob Streefkerk

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/707

摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.

摘要翻译： 在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。

公开(公告)号：US20100066987A1

公开(公告)日：2010-03-18

申请号：US12559664

申请日：2009-09-15

申请人： Jeroen Peter Johannes BRUIJSTENS ,  Richard Joseph BRULS ,  Hans JANSEN ,  Siebe LANDHEER ,  Laurentius Catrinus JORRITSMA ,  Arnout Johannes MEESTER ,  Bauke JANSEN ,  Ivo Adam Johannes Thomas ,  Marcio Alexandre Cano MIRANDA ,  Maurice Martinus Johannes VAN DER LEE ,  Gheorghe TANASA ,  Lambertus Dominicus NOORDAM

发明人： Jeroen Peter Johannes BRUIJSTENS ,  Richard Joseph BRULS ,  Hans JANSEN ,  Siebe LANDHEER ,  Laurentius Catrinus JORRITSMA ,  Arnout Johannes MEESTER ,  Bauke JANSEN ,  Ivo Adam Johannes Thomas ,  Marcio Alexandre Cano MIRANDA ,  Maurice Martinus Johannes VAN DER LEE ,  Gheorghe TANASA ,  Lambertus Dominicus NOORDAM

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03B27/52

摘要： A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.

摘要翻译： 公开了一种光刻设备，其包括投影系统和液体限制结构，其被配置为至少部分地将浸没液体限制在由投影系统，液体限制结构和基板和/或基板台所限定的浸没空间中。 例如，在光刻设备中采取措施来减少液滴对投影系统的最终元件的影响或基本避免这种液滴的形成。

公开(公告)号：US20090296052A1

公开(公告)日：2009-12-03

申请号：US12398403

申请日：2009-03-05

申请人： Koen KIVITS ,  Hans JANSEN ,  Vasco Miguel MATIAS SERRAO

发明人： Koen KIVITS ,  Hans JANSEN ,  Vasco Miguel MATIAS SERRAO

IPC分类号： G03B27/52

CPC分类号： G03F7/7085 ,  G03F7/70341 ,  G03F7/70925

摘要： A system for cleaning a limited area of a top surface of a substrate table or an object positioned on a top surface of a substrate table is disclosed. The optical system used during normal imaging is adjusted to limit the cross-sectional area of a radiation beam to form a cleaning radiation beam which impinges on the limited area.

摘要翻译： 公开了一种用于清洁衬底台或位于衬底台顶表面上的物体的顶表面的有限区域的系统。 调整在正常成像期间使用的光学系统以限制辐射束的横截面积以形成撞击有限区域的清洁辐射束。