公开(公告)号：US5726805A

公开(公告)日：1998-03-10

申请号：US670115

申请日：1996-06-25

申请人： Sumanth Kaushik ,  Brian R. Stallard

发明人： Sumanth Kaushik ,  Brian R. Stallard

IPC分类号： G02B5/18 ,  G02B5/28 ,  G02B5/26 ,  G02B5/30

CPC分类号： G02B5/288 ,  G01J3/02 ,  G01J3/0256 ,  G01J3/51 ,  G01J3/513 ,  G02B5/1809 ,  G01J2003/1213

摘要： An optical filter includes a dielectric layer formed within a resonant optical cavity, with the dielectric layer having formed therein a sub-wavelength periodic structure to define, at least in part, a wavelength for transmission of light through the resonant optical cavity. The sub-wavelength periodic structure can be formed either by removing material from the dielectric layer (e.g. by etching through an electron-beam defined mask), or by altering the composition of the layer (e.g. by ion implantation). Different portions of the dielectric layer can be patterned to form one or more optical interference filter elements having different light transmission wavelengths so that the optical filter can filter incident light according to wavelength and/or polarization. For some embodiments, the optical filter can include a detector element in optical alignment with each optical interference filter element to quantify or measure the filtered light for analysis thereof. The optical filter has applications to spectrometry, colorimetry, and chemical sensing.

摘要翻译： 光学滤波器包括形成在谐振光学腔内的电介质层，其中介电层在其中形成有亚波长周期性结构，以至少部分地限定用于透过谐振光学腔的光的波长。 亚波长周期结构可以通过从电介质层去除材料（例如通过蚀刻通过电子束限定的掩模）或通过改变层的组成（例如通过离子注入）来形成。 可以对电介质层的不同部分进行图案化以形成具有不同透光波长的一个或多个光学干涉滤光器元件，使得滤光器可以根据波长和/或偏振来滤光入射光。 对于一些实施例，光学滤波器可以包括与每个光学干涉滤光器元件光学对准的检测器元件，以量化或测量用于分析的滤光光。 光学滤波器适用于光谱测定，比色法和化学感测。

公开(公告)号：US5905573A

公开(公告)日：1999-05-18

申请号：US955997

申请日：1997-10-22

申请人： Brian R. Stallard ,  Sumanth Kaushik

发明人： Brian R. Stallard ,  Sumanth Kaushik

IPC分类号： G01B9/02 ,  G01Q60/18 ,  G11B9/00 ,  G11B11/00

CPC分类号： G01Q60/22 ,  B82Y20/00 ,  B82Y35/00 ,  G11B11/00 ,  G11B9/00 ,  Y10S977/862

摘要： A resonant planar optical waveguide probe for measuring critical dimensions on an object in the range of 100 nm and below. The optical waveguide includes a central resonant cavity flanked by Bragg reflector layers with input and output means at either end. Light is supplied by a narrow bandwidth laser source. Light resonating in the cavity creates an evanescent electrical field. The object with the structures to be measured is translated past the resonant cavity. The refractive index contrasts presented by the structures perturb the field and cause variations in the intensity of the light in the cavity. The topography of the structures is determined from these variations.

摘要翻译： 一种谐振平面光波导探针，用于测量物体上的关键尺寸在100nm及以下范围内。 光波导包括中间谐振腔，其中两侧为布拉格反射器层，其两端具有输入和输出装置。 光由窄带激光源提供。 在腔中谐振的光产生消逝的电场。 具有要测量结构的物体被翻转过谐振腔。 由结构扰动场引起的折射率对比度，并引起腔体光强度的变化。 根据这些变化确定结构的形貌。

公开(公告)号：US06504943B1

公开(公告)日：2003-01-07

申请号：US09345604

申请日：1999-06-29

申请人： William C. Sweatt ,  Stephen M. Gentry ,  Clinton A. Boye ,  Carter L. Grotbeck ,  Brian R. Stallard ,  Michael R. Descour

发明人： William C. Sweatt ,  Stephen M. Gentry ,  Clinton A. Boye ,  Carter L. Grotbeck ,  Brian R. Stallard ,  Michael R. Descour

IPC分类号： G06K900

CPC分类号： G06T5/50 ,  G02B27/1086 ,  G02B27/123 ,  G02B27/126 ,  G02B27/145 ,  G02B27/28 ,  G02B27/4205 ,  G02B27/4294 ,  G06K9/0063 ,  G06T7/0008 ,  G06T2207/10152 ,  G06T2207/30108

摘要： A programmable optical filter for use in multispectral and hyperspectral imaging. The filter splits the light collected by an optical telescope into two channels for each of the pixels in a row in a scanned image, one channel to handle the positive elements of a spectral basis filter and one for the negative elements of the spectral basis filter. Each channel for each pixel disperses its light into n spectral bins, with the light in each bin being attenuated in accordance with the value of the associated positive or negative element of the spectral basis vector. The spectral basis vector is constructed so that its positive elements emphasize the presence of a target and its negative elements emphasize the presence of the constituents of the background of the imaged scene. The attenuated light in the channels is re-imaged onto separate detectors for each pixel and then the signals from the detectors are combined to give an indication of the presence or not of the target in each pixel of the scanned scene. This system provides for a very efficient optical determination of the presence of the target, as opposed to the very data intensive data manipulations that are required in conventional hyperspectral imaging systems.

摘要翻译： 一种用于多光谱和高光谱成像的可编程滤光片。 滤光器将由光学望远镜收集的光分成扫描图像中的一行中的每个像素的两个通道，一个通道用于处理光谱基滤波器的正元素，一个用于光谱基滤波器的负元件。 每个像素的每个通道将其光分散到n个光谱箱中，每个存储体中的光根据光谱基础矢量的相关联的正或负元素的值衰减。 构建光谱基矢量，使其正元素强调目标的存在，其负元素强调成像场景的背景的成分的存在。 通道中的衰减光被重新成像到用于每个像素的分离的检测器上，然后来自检测器的信号被组合以给出在扫描场景的每个像素中存在或不存在目标的指示。 与传统的高光谱成像系统中所需的非常数据密集的数据操作相反，该系统提供了对靶的存在的非常有效的光学确定。

公开(公告)号：US5674652A

公开(公告)日：1997-10-07

申请号：US662676

申请日：1991-02-28

申请人： Kenneth P. Bishop ,  Steven R. J. Brueck ,  Susan M. Gaspar ,  Kirt C. Hickman ,  John R. McNeil ,  S. Sohail H. Naqvi ,  Brian R. Stallard ,  Gary D. Tipton

发明人： Kenneth P. Bishop ,  Steven R. J. Brueck ,  Susan M. Gaspar ,  Kirt C. Hickman ,  John R. McNeil ,  S. Sohail H. Naqvi ,  Brian R. Stallard ,  Gary D. Tipton

IPC分类号： G03F7/20

CPC分类号： G03F7/70558 ,  G03F7/20

摘要： In microelectronics manufacturing, an arrangement for monitoring and control of exposure of an undeveloped photosensitive layer on a structure susceptible to variations in optical properties in order to attain the desired critical dimension for the pattern to be developed in the photosensitive layer. This is done by ascertaining the intensities for one or more respective orders of diffracted power for an incident beam of radiation corresponding to the desired critical dimension for the photosensitive layer as a function of exposure time and optical properties of the structure, illuminating the photosensitive layer with a beam of radiation of one or more frequencies to which the photosensitive layer is not exposure-sensitive, and monitoring the intensities of the orders of diffracted radiation due to said illumination including at least the first order of diffracted radiation thereof, such that when said predetermined intensities for the diffracted orders are reached during said illumination of photosensitive layer, it is known that a pattern having at least approximately the desired critical dimension can be developed on the photosensitive layer.

摘要翻译： 在微电子制造中，用于监测和控制未发展的感光层在易受光学特性变化影响的结构上的曝光的装置，以获得在感光层中显影图案的期望临界尺寸。 这是通过确定对于感光层的期望临界尺寸的入射光束的一个或多个相应衍射功率的衍射强度作为曝光时间和结构的光学性质的函数的强度，通过以下方式照射感光层： 感光层不受曝光敏感的一个或多个频率的辐射光束，以及监测由于所述照射引起的衍射辐射的级数的强度至少包括其衍射辐射的一级，使得当所述预定 在感光层的所述照射期间达到衍射次数的强度，已知在感光层上可以形成具有至少大致所需临界尺寸的图案。