Method for providing desirable wetting and release characteristics between a mold and a polymerizable composition
    1.
    发明申请
    Method for providing desirable wetting and release characteristics between a mold and a polymerizable composition 审中-公开
    在模具和可聚合组合物之间提供所需润湿和释放特性的方法

    公开(公告)号:US20060279024A1

    公开(公告)日:2006-12-14

    申请号:US11459797

    申请日:2006-07-25

    IPC分类号: B28B7/36

    摘要: The present invention provides a method to reduce adhesion between a conformable region on a substrate and a pattern of a mold, which selectively comes into contact with the conformable region. The method features forming a conformable material on the substrate and contacting the conformable material with the surface. A conditioned layer is formed from the conformable material. The conditioned layer has first and second sub-portions, with the first sub-portion being solidified and the second sub-portion having a first affinity for the surface and a second affinity for the first sub-portion. The first affinity is greater than the second affinity. In this fashion, upon separation of the mold from the conditioned layer, a subset of the second sub-portion maintains contact with the mold, thereby reducing the probability that a pattern formed in the conditioned layer becomes compromised.

    摘要翻译: 本发明提供一种降低基材上的适形区域和选择性地与适形区域接触的模具图案之间的粘附性的方法。 该方法的特征在于在基底上形成适形材料并使适形材料与表面接触。 由适形材料形成调理层。 调理层具有第一和第二子部分,其中第一子部分被固化,第二子部分对于表面具有第一亲和力,对第一子部分具有第二亲和力。 第一亲和力大于第二亲和力。 以这种方式,在模具与调理层分离时,第二子部分的子集保持与模具的接触,从而降低在调理层中形成的图案变得损害的可能性。

    Method to improve the flow rate of imprinting material employing an absorption layer
    7.
    发明申请
    Method to improve the flow rate of imprinting material employing an absorption layer 审中-公开
    提高使用吸收层的压印材料流动速率的方法

    公开(公告)号:US20060125154A1

    公开(公告)日:2006-06-15

    申请号:US11347096

    申请日:2006-02-03

    IPC分类号: B29C35/08

    摘要: The present invention is directed to a method to improve a flow rate of imprinting material, said method including, inter alia, propagating radiation through said imprinting material to impinge upon an absorption layer; absorbing said radiation by said absorption layer to collect thermal energy with said absorption layer, defining collected thermal energy; and transferring said collected thermal energy to said imprinting material through thermal conduction to increase a temperature of said imprinting material

    摘要翻译: 本发明涉及一种改善压印材料的流速的方法,所述方法尤其包括通过所述压印材料传播辐射以冲击吸收层; 通过所述吸收层吸收所述辐射以与所述吸收层收集热能,限定收集的热能; 以及通过热传导将所述收集的热能转移到所述压印材料,以增加所述压印材料的温度

    Thermal processing system for imprint lithography
    8.
    发明申请
    Thermal processing system for imprint lithography 审中-公开
    用于压印光刻的热处理系统

    公开(公告)号:US20050158419A1

    公开(公告)日:2005-07-21

    申请号:US10758384

    申请日:2004-01-15

    IPC分类号: B05B5/00 B29C35/10 G03F7/00

    摘要: The present invention is a system that selectively directs radiation of multiple wavelengths at a substrate to facilitate pattern formation. The system may include a wavelength discriminator to filter the radiation and an absorption layer to develop a localized heat source. The localized heat source may be employed to raise a temperature of an imprinting layer. This improves the flow rate and the fill factor of the material disposed within the imprinting layer, thus reducing the time required to fill the features defined on a mold.

    摘要翻译: 本发明是一种系统,其选择性地引导衬底上的多个波长的辐射以促进图案形成。 该系统可以包括用于过滤辐射的波长鉴别器和吸收层以形成局部热源。 可以采用局部热源来提高压印层的温度。 这改善了设置在压印层内的材料的流速和填充因子,从而减少了填充模具上限定的特征所需的时间。

    Method to improve the flow rate of imprinting material
    9.
    发明申请
    Method to improve the flow rate of imprinting material 审中-公开
    提高压印材料流动速率的方法

    公开(公告)号:US20050156353A1

    公开(公告)日:2005-07-21

    申请号:US10757778

    申请日:2004-01-15

    IPC分类号: B29C59/02 G03F7/00

    摘要: The present invention is a method of increasing the flow rate of an imprinting layer disposed between a source of radiation and a target to facilitate pattern formation. Infrared radiation is directed toward the target with the imprinting layer substantially transparent to infrared radiation. The target substantially absorbs the infrared radiation to create a thermal energy in the same, and the thermal energy is subsequently transferred to the liquid, causing a temperature rise of the liquid, and thus improving a flow rate of the imprinting layer and reducing the time required to fill the features defined on a mold.

    摘要翻译: 本发明是一种增加设置在辐射源和靶之间的压印层的流速以促进图案形成的方法。 红外辐射指向靶,其中压印层对于红外辐射基本上是透明的。 目标基本上吸收红外辐射以在其中产生热能,并且热能随后转移到液体中,引起液体的温度上升,从而改善压印层的流速并减少所需的时间 填补模具上定义的特征。

    Methods for fabricating patterned features utilizing imprint lithography
    10.
    发明申请
    Methods for fabricating patterned features utilizing imprint lithography 有权
    使用压印光刻制造图案特征的方法

    公开(公告)号:US20050100830A1

    公开(公告)日:2005-05-12

    申请号:US10694284

    申请日:2003-10-27

    摘要: One embodiment of the present invention is a method for generating patterned features on a substrate that includes: (a) forming a first layer on at least a portion of a surface of the substrate, the first layer comprising at least one layer of a first material, which one layer abuts the surface of the substrate; (b) forming a second layer of a second material on at least a portion of the first layer, which second layer is imprinted with the patterned features; (c) removing at least portions of the second layer to extend the patterned features to the first layer; and (d) removing at least portions of the first layer to extend the patterned features to the substrate; wherein the first layer and the second layer may be exposed to an etching process that undercuts the patterned features, and the first material may be lifted-off.

    摘要翻译: 本发明的一个实施例是一种用于在衬底上产生图案化特征的方法,其包括:(a)在衬底的表面的至少一部分上形成第一层,第一层包括至少一层第一材料 其中一层邻接衬底的表面; (b)在所述第一层的至少一部分上形成第二材料的第二层,所述第二层被印刷所述图案化特征; (c)去除所述第二层的至少一部分以将所述图案化特征延伸到所述第一层; 和(d)去除所述第一层的至少一部分以将所述图案化特征延伸到所述基底; 其中第一层和第二层可以暴露于蚀刻过程,其蚀刻图案化的特征,并且第一材料可以被剥离。