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    Method for providing desirable wetting and release characteristics between a mold and a polymerizable composition
    1.
    发明申请
    Method for providing desirable wetting and release characteristics between a mold and a polymerizable composition 审中-公开
    在模具和可聚合组合物之间提供所需润湿和释放特性的方法

    公开(公告)号：US20060279024A1

    公开(公告)日：2006-12-14

    申请号：US11459797

    申请日：2006-07-25

    申请人： Byung-Jin Choi ,  Frank Xu ,  Nicholas Stacey ,  Van Truskett ,  Michael Watts

    发明人： Byung-Jin Choi ,  Frank Xu ,  Nicholas Stacey ,  Van Truskett ,  Michael Watts

    IPC分类号： B28B7/36

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    摘要： The present invention provides a method to reduce adhesion between a conformable region on a substrate and a pattern of a mold, which selectively comes into contact with the conformable region. The method features forming a conformable material on the substrate and contacting the conformable material with the surface. A conditioned layer is formed from the conformable material. The conditioned layer has first and second sub-portions, with the first sub-portion being solidified and the second sub-portion having a first affinity for the surface and a second affinity for the first sub-portion. The first affinity is greater than the second affinity. In this fashion, upon separation of the mold from the conditioned layer, a subset of the second sub-portion maintains contact with the mold, thereby reducing the probability that a pattern formed in the conditioned layer becomes compromised.

    摘要翻译： 本发明提供一种降低基材上的适形区域和选择性地与适形区域接触的模具图案之间的粘附性的方法。 该方法的特征在于在基底上形成适形材料并使适形材料与表面接触。 由适形材料形成调理层。 调理层具有第一和第二子部分，其中第一子部分被固化，第二子部分对于表面具有第一亲和力，对第一子部分具有第二亲和力。 第一亲和力大于第二亲和力。 以这种方式，在模具与调理层分离时，第二子部分的子集保持与模具的接触，从而降低在调理层中形成的图案变得损害的可能性。

    Method to improve the flow rate of imprinting material employing an absorption layer
    2.
    发明申请
    Method to improve the flow rate of imprinting material employing an absorption layer 审中-公开
    提高使用吸收层的压印材料流动速率的方法

    公开(公告)号：US20060125154A1

    公开(公告)日：2006-06-15

    申请号：US11347096

    申请日：2006-02-03

    申请人： Michael Watts ,  Byung-Jin Choi ,  Frank Xu

    发明人： Michael Watts ,  Byung-Jin Choi ,  Frank Xu

    IPC分类号： B29C35/08

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： The present invention is directed to a method to improve a flow rate of imprinting material, said method including, inter alia, propagating radiation through said imprinting material to impinge upon an absorption layer; absorbing said radiation by said absorption layer to collect thermal energy with said absorption layer, defining collected thermal energy; and transferring said collected thermal energy to said imprinting material through thermal conduction to increase a temperature of said imprinting material

    摘要翻译： 本发明涉及一种改善压印材料的流速的方法，所述方法尤其包括通过所述压印材料传播辐射以冲击吸收层; 通过所述吸收层吸收所述辐射以与所述吸收层收集热能，限定收集的热能; 以及通过热传导将所述收集的热能转移到所述压印材料，以增加所述压印材料的温度

    Thermal processing system for imprint lithography
    3.
    发明申请
    Thermal processing system for imprint lithography 审中-公开
    用于压印光刻的热处理系统

    公开(公告)号：US20050158419A1

    公开(公告)日：2005-07-21

    申请号：US10758384

    申请日：2004-01-15

    申请人： Michael Watts ,  Byung-Jin Choi ,  Frank Xu

    发明人： Michael Watts ,  Byung-Jin Choi ,  Frank Xu

    IPC分类号： B05B5/00 ,  B29C35/10 ,  G03F7/00

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    摘要： The present invention is a system that selectively directs radiation of multiple wavelengths at a substrate to facilitate pattern formation. The system may include a wavelength discriminator to filter the radiation and an absorption layer to develop a localized heat source. The localized heat source may be employed to raise a temperature of an imprinting layer. This improves the flow rate and the fill factor of the material disposed within the imprinting layer, thus reducing the time required to fill the features defined on a mold.

    摘要翻译： 本发明是一种系统，其选择性地引导衬底上的多个波长的辐射以促进图案形成。 该系统可以包括用于过滤辐射的波长鉴别器和吸收层以形成局部热源。 可以采用局部热源来提高压印层的温度。 这改善了设置在压印层内的材料的流速和填充因子，从而减少了填充模具上限定的特征所需的时间。

    Method to improve the flow rate of imprinting material
    4.
    发明申请
    Method to improve the flow rate of imprinting material 审中-公开
    提高压印材料流动速率的方法

    公开(公告)号：US20050156353A1

    公开(公告)日：2005-07-21

    申请号：US10757778

    申请日：2004-01-15

    申请人： Michael Watts ,  Byung-Jin Choi ,  Frank Xu

    发明人： Michael Watts ,  Byung-Jin Choi ,  Frank Xu

    IPC分类号： B29C59/02 ,  G03F7/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： The present invention is a method of increasing the flow rate of an imprinting layer disposed between a source of radiation and a target to facilitate pattern formation. Infrared radiation is directed toward the target with the imprinting layer substantially transparent to infrared radiation. The target substantially absorbs the infrared radiation to create a thermal energy in the same, and the thermal energy is subsequently transferred to the liquid, causing a temperature rise of the liquid, and thus improving a flow rate of the imprinting layer and reducing the time required to fill the features defined on a mold.

    摘要翻译： 本发明是一种增加设置在辐射源和靶之间的压印层的流速以促进图案形成的方法。 红外辐射指向靶，其中压印层对于红外辐射基本上是透明的。 目标基本上吸收红外辐射以在其中产生热能，并且热能随后转移到液体中，引起液体的温度上升，从而改善压印层的流速并减少所需的时间 填补模具上定义的特征。

    Polymerization Technique to Attenuate Oxygen Inhibition of Solidification of Liquids and Composition Therefor
    5.
    发明申请
    Polymerization Technique to Attenuate Oxygen Inhibition of Solidification of Liquids and Composition Therefor 有权
    聚合技术降低液体及其组合物固化的氧气抑制

    公开(公告)号：US20080085465A1

    公开(公告)日：2008-04-10

    申请号：US11858687

    申请日：2007-09-20

    申请人： Frank Xu ,  Edward Fletcher ,  Pankaj Lad ,  Michael Watts

    发明人： Frank Xu ,  Edward Fletcher ,  Pankaj Lad ,  Michael Watts

    IPC分类号： G03C1/73

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： The present invention includes a method of solidifying a polymerizable liquid to form a film on a substrate that features minimizing inhibition of the polymerization process by oxygen contained in the atmosphere surrounding the polymerizable liquid. To that end, the polymerizable liquid includes, inter alia, an initiator that consumes oxygen that interacts with the polymerizable liquid and generates additional free radicals to facilitate the polymerizable process.

    摘要翻译： 本发明包括固化可聚合液体以在基材上形成膜的方法，该方法的特征在于使包围在可聚合液体周围的气氛中的氧的聚合过程的抑制最小化。 为此，可聚合液体尤其包括消耗与可聚合液体相互作用的氧的引发剂，并产生额外的自由基以促进可聚合过程。

    Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor
    6.
    发明申请
    Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor 审中-公开
    聚合技术减弱了液体固化的氧气抑制及其组成

    公开(公告)号：US20060062922A1

    公开(公告)日：2006-03-23

    申请号：US10948511

    申请日：2004-09-23

    申请人： Frank Xu ,  Edward Fletcher ,  Pankaj Lad ,  Michael Watts

    发明人： Frank Xu ,  Edward Fletcher ,  Pankaj Lad ,  Michael Watts

    IPC分类号： B05D3/02

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： The present invention includes a method of solidifying a polymerizable liquid to form a film on a substrate that features minimizing inhibition of the polymerization process by oxygen contained in the atmosphere surrounding the polymerizable liquid. To that end, the polymerizable liquid includes, inter alia, an initiator that consumes oxygen that interacts with the polymerizable liquid and generates additional free radicals to facilitate the polymerization process.

    摘要翻译： 本发明包括固化可聚合液体以在基材上形成薄膜的方法，其特征在于使包围在可聚合液体周围的气氛中的氧的聚合过程的抑制最小化。 为此，可聚合液体尤其包括消耗与可聚合液体相互作用的氧的引发剂，并产生另外的自由基以促进聚合过程。

    Composition for an etching mask comprising a silicon-containing material
    9.
    发明申请
    Composition for an etching mask comprising a silicon-containing material 有权
    包含含硅材料的蚀刻掩模的组合物

    公开(公告)号：US20050192421A1

    公开(公告)日：2005-09-01

    申请号：US10789319

    申请日：2004-02-27

    申请人： Frank Xu ,  Michael Miller ,  Michael Watts

    发明人： Frank Xu ,  Michael Miller ,  Michael Watts

    IPC分类号： C08L83/04 ,  C08L83/06

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    摘要： The present invention includes a composition for a silicon-containing material used as an etch mask for underlying layers. More specifically, the silicon-containing material may be used as an etch mask for a patterned imprinted layer comprising protrusions and recessions. To that end, in one embodiment of the present invention, the composition includes a hydroxyl-functional silicone component, a cross-linking component, a catalyst component, and a solvent. This composition allows the silicon-containing material to selectively etch the protrusions and the segments of the patterned imprinting layer in superimposition therewith, while minimizing the etching of the segments in superposition with the recessions, and therefore allowing an in-situ hardened mask to be created by the silicon-containing material, with the hardened mask and the patterned imprinting layer forming a substantially planarized profile.

    摘要翻译： 本发明包括用作下层的蚀刻掩模的含硅材料用组合物。 更具体地，含硅材料可以用作包括突起和凹陷的图案化印记层的蚀刻掩模。 为此，在本发明的一个实施方案中，组合物包括羟基官能的硅氧烷组分，交联组分，催化剂组分和溶剂。 该组合物允许含硅材料与图案化压印层的突起和段的叠加选择性地蚀刻，同时最小化与凹陷叠加的段的蚀刻，并且因此允许形成原位硬化的掩模 通过含硅材料，硬化的掩模和图案化的压印层形成基本平坦化的轮廓。