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    METHOD OF ADJUSTING SPEED AND/OR ROUTING OF A TABLE MOVEMENT PLAN AND A LITHOGRAPHIC APPARATUS
    1.
    发明申请
    METHOD OF ADJUSTING SPEED AND/OR ROUTING OF A TABLE MOVEMENT PLAN AND A LITHOGRAPHIC APPARATUS 有权
    调整表格运动计划和地图设备的速度和/或路由的方法

    公开(公告)号：US20120003381A1

    公开(公告)日：2012-01-05

    申请号：US13168177

    申请日：2011-06-24

    申请人： Cédric Désiré GROUWSTRA ,  Nicolaas Rudolf Kemper ,  Norbertus Josephus Martinus Van Den Nieuwelaar ,  Dirk De Vries ,  Hua Li ,  Marinus Jochemsen

    发明人： Cédric Désiré GROUWSTRA ,  Nicolaas Rudolf Kemper ,  Norbertus Josephus Martinus Van Den Nieuwelaar ,  Dirk De Vries ,  Hua Li ,  Marinus Jochemsen

    IPC分类号： C23C16/52 ,  B05C11/00 ,  B01J19/12

    CPC分类号： G03F7/70775 ,  G03F7/70341 ,  G03F7/70725

    摘要： A method of adjusting speed and/or routing of a part of a movement plan of a table under an immersion fluid supply system of a lithographic apparatus. The method includes splitting the movement plan of the table into a plurality of discrete movements; determining a risk of a bubble of a size greater than a certain size being present in immersion fluid through which a patterned beam of the lithographic apparatus will pass during a certain discrete movement by determining whether the immersion fluid supply system passes over a position at which immersion fluid leaked from the immersion fluid supply system is present; and adjusting the speed and/or routing of a part of the movement plan corresponding to (i) a discrete movement earlier than a discrete movement for which the risk of a bubble is determined, and/or (ii) a discrete movement for which the risk of a bubble is determined.

    摘要翻译： 一种在光刻设备的浸没液体供应系统下调整桌子的运动计划的一部分的速度和/或路线的方法。 该方法包括将表的运动计划分成多个离散运动; 确定存在于浸没流体中的尺寸大于一定尺寸的气泡的风险，通过该浸入流体中的光刻设备的图案化束将在特定离散运动期间通过该气泡通过确定浸没流体供应系统是否经过浸没的位置 存在从浸没液体供应系统泄漏的液体; 以及调整所述运动计划的一部分的速度和/或路线，其对应于（i）比确定气泡风险的离散运动更早的离散运动，和/或（ii）离散运动， 确定泡沫的风险。

    Method of adjusting speed and/or routing of a table movement plan and a lithographic apparatus
    2.
    发明授权
    Method of adjusting speed and/or routing of a table movement plan and a lithographic apparatus 有权
    调整台面移动平面图和光刻设备的速度和/或路线的方法

    公开(公告)号：US09329491B2

    公开(公告)日：2016-05-03

    申请号：US13168177

    申请日：2011-06-24

    申请人： Cédric Désiré Grouwstra ,  Nicolaas Rudolf Kemper ,  Norbertus Josephus Martinus Van Den Nieuwelaar ,  Dirk De Vries ,  Hua Li ,  Marinus Jochemsen

    发明人： Cédric Désiré Grouwstra ,  Nicolaas Rudolf Kemper ,  Norbertus Josephus Martinus Van Den Nieuwelaar ,  Dirk De Vries ,  Hua Li ,  Marinus Jochemsen

    IPC分类号： G03B27/52 ,  G03F7/20

    CPC分类号： G03F7/70775 ,  G03F7/70341 ,  G03F7/70725

    摘要： A method of adjusting speed and/or routing of a part of a movement plan of a table under an immersion fluid supply system of a lithographic apparatus. The method includes splitting the movement plan of the table into a plurality of discrete movements; determining a risk of a bubble of a size greater than a certain size being present in immersion fluid through which a patterned beam of the lithographic apparatus will pass during a certain discrete movement by determining whether the immersion fluid supply system passes over a position at which immersion fluid leaked from the immersion fluid supply system is present; and adjusting the speed and/or routing of a part of the movement plan corresponding to (i) a discrete movement earlier than a discrete movement for which the risk of a bubble is determined, and/or (ii) a discrete movement for which the risk of a bubble is determined.

    摘要翻译： 一种在光刻设备的浸没液体供应系统下调整桌子的运动计划的一部分的速度和/或路线的方法。 该方法包括将表的运动计划分成多个离散运动; 确定存在于浸没流体中的尺寸大于一定尺寸的气泡的风险，通过该浸入流体中的光刻设备的图案化束将在特定离散运动期间通过该气泡通过确定浸没流体供应系统是否经过浸没的位置 存在从浸没液体供应系统泄漏的液体; 以及调整所述运动计划的一部分的速度和/或路线，其对应于（i）比确定气泡风险的离散运动更早的离散运动，和/或（ii）离散运动， 确定泡沫的风险。

    Immersion lithography
    3.
    发明授权
    Immersion lithography 失效
    浸没光刻

    公开(公告)号：US08129097B2

    公开(公告)日：2012-03-06

    申请号：US12318033

    申请日：2008-12-19

    申请人： Dirk De Vries ,  Richard Moerman ,  Cédric Désiré Grouwstra ,  Michel Franciscus Johannes Van Rooy

    发明人： Dirk De Vries ,  Richard Moerman ,  Cédric Désiré Grouwstra ,  Michel Franciscus Johannes Van Rooy

    IPC分类号： G03F7/26

    CPC分类号： G03F7/70916 ,  G03F7/70341 ,  G03F7/70608

    摘要： A method of obtaining information related to a defect present in the irradiation of a substrate coated with a layer of radiation sensitive material using immersion lithography is disclosed. The method includes irradiating an area of the radiation sensitive material with a non-patterned radiation beam, the area being irradiated with a dose which is sufficient for the radiation sensitive material to be substantially removed during subsequent development of the radiation sensitive material if the radiation sensitive material is a positive radiation sensitive material, or with a dose which is sufficient for the radiation sensitive material to be substantially insoluble during subsequent development of the radiation sensitive material if the radiation sensitive material is a negative radiation sensitive material. The method further includes developing the radiation sensitive material and obtaining information at least indicative of the topography of radiation sensitive material remaining on the substrate after the radiation sensitive material has been developed in order to obtain information related to the defect.

    摘要翻译： 公开了一种使用浸没式光刻法获得与涂覆有辐射敏感材料层的基板的照射中存在的缺陷有关的信息的方法。 该方法包括用未图案化的辐射束照射辐射敏感材料的区域，如果辐射敏感材料的辐射敏感材料的后续显影期间，该辐射敏感材料的辐射敏感材料的辐射敏感材料的辐照敏感材料的辐射敏感材料的辐照敏感材料 材料是正的辐射敏感材料，或者如果辐射敏感材料是负辐射敏感材料，则辐射敏感材料在辐射敏感材料的后续显影期间足以使辐射敏感材料基本上不溶的剂量。 该方法还包括开发辐射敏感材料并获得至少指示辐射敏感材料已被开发之后剩余在基底上的辐射敏感材料的形貌的信息，以获得与该缺陷有关的信息。

    Immersion lithography
    7.
    发明申请
    Immersion lithography 失效
    浸没光刻

    公开(公告)号：US20090170041A1

    公开(公告)日：2009-07-02

    申请号：US12318033

    申请日：2008-12-19

    申请人： Dirk De Vries ,  Richard Moerman ,  Cedric Desire Grouwstra ,  Michel Franciscus Johannes Van Rooy

    发明人： Dirk De Vries ,  Richard Moerman ,  Cedric Desire Grouwstra ,  Michel Franciscus Johannes Van Rooy

    IPC分类号： G03F7/20 ,  G03B27/52

    CPC分类号： G03F7/70916 ,  G03F7/70341 ,  G03F7/70608

    摘要： A method of obtaining information related to a defect present in the irradiation of a substrate coated with a layer of radiation sensitive material using immersion lithography is disclosed. The method includes irradiating an area of the radiation sensitive material with a non-patterned radiation beam, the area being irradiated with a dose which is sufficient for the radiation sensitive material to be substantially removed during subsequent development of the radiation sensitive material if the radiation sensitive material is a positive radiation sensitive material, or with a dose which is sufficient for the radiation sensitive material to be substantially insoluble during subsequent development of the radiation sensitive material if the radiation sensitive material is a negative radiation sensitive material. The method further includes developing the radiation sensitive material and obtaining information at least indicative of the topography of radiation sensitive material remaining on the substrate after the radiation sensitive material has been developed in order to obtain information related to the defect.

    摘要翻译： 公开了一种使用浸没式光刻法获得与涂覆有辐射敏感材料层的基板的照射中存在的缺陷有关的信息的方法。 该方法包括用未图案化的辐射束照射辐射敏感材料的区域，如果辐射敏感材料的辐射敏感材料的后续显影期间，该辐射敏感材料的辐射敏感材料的辐射敏感材料的辐照敏感材料的辐射敏感材料的辐射敏感材料 材料是正的辐射敏感材料，或者如果辐射敏感材料是负辐射敏感材料，则辐射敏感材料在辐射敏感材料的后续显影期间足以使辐射敏感材料基本上不溶的剂量。 该方法还包括开发辐射敏感材料并获得至少指示辐射敏感材料已被开发之后剩余在基底上的辐射敏感材料的形貌的信息，以获得与该缺陷有关的信息。