公开(公告)号：US20170158992A1

公开(公告)日：2017-06-08

申请号：US15327326

申请日：2015-07-17

Applicant: Cabot Microelectronics Corporation

Inventor： Roman IVANOV ,  Cheng-yuan KO ,  Fred SUN

IPC: C11D11/00 ,  C11D7/36 ,  H01L21/768 ,  H01L21/02 ,  H01L21/321 ,  C11D7/32 ,  C11D7/26

CPC classification number: C11D11/0047 ,  C11D3/0073 ,  C11D3/0084 ,  C11D7/10 ,  C11D7/264 ,  C11D7/265 ,  C11D7/267 ,  C11D7/268 ,  C11D7/32 ,  C11D7/3209 ,  C11D7/3218 ,  C11D7/3245 ,  C11D7/3272 ,  C11D7/36 ,  H01L21/02074 ,  H01L21/3212 ,  H01L21/7684

Abstract: The invention provides a composition for cleaning contaminants from semiconductor wafers following chemical-mechanical polishing. The cleaning composition contains a bulky protecting ligand, an organic amine, an organic inhibitor, and water. The invention also provides methods for using the cleaning composition.

公开(公告)号：US20170158993A1

公开(公告)日：2017-06-08

申请号：US15327336

申请日：2015-07-17

Applicant: Cabot Microelectronics Corporation

Inventor： Roman IVANOV ,  Cheng-Yuan KO ,  Fred SUN

IPC: C11D11/00 ,  C11D7/32 ,  H01L21/02

CPC classification number: C11D11/0047 ,  C11D7/3209 ,  C11D7/3218 ,  C11D7/3272 ,  H01L21/02074

Abstract: The invention provides stabilized solutions useful as raw materials in various applications and methods for stabilizing such aqueous solutions with a stabilizer comprising one or more dialkylhydroxylamines or inorganic or organic acid salts thereof. Stabilized solutions and methods for stabilizing aqueous solutions thereof, include, for example, those of tris(2-hydroxy ethyl)methylammonium hydroxide (THEMAH) and/or carbohydrazide (CHZ).