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    Method of polishing a lanthanide substrate
    1.
    发明申请
    Method of polishing a lanthanide substrate 失效
    镧系元素抛光方法

    公开(公告)号：US20040175949A1

    公开(公告)日：2004-09-09

    申请号：US10382370

    申请日：2003-03-06

    Applicant: Cabot Microelectronics Corporation

    Inventor： Jui-Kun Lee ,  Ronald E. Myers

    IPC: C23F001/00 ,  B44C001/22 ,  C03C015/00 ,  H01L021/302 ,  C03C025/68 ,  H01L021/461

    CPC classification number: C04B41/009 ,  C04B41/53 ,  C04B41/91 ,  H01M4/9025 ,  H01M8/1246 ,  H01M2008/1293 ,  Y02E60/525 ,  Y02P70/56 ,  C04B35/50

    Abstract: The invention provides a method of polishing a substrate comprising a lanthanide-containing metal oxide material. The method comprises the steps of (i) providing a polishing system comprising (a) an abrasive, a polishing pad, or a combination thereof, (b) an acid, and (c) a liquid carrier, (ii) providing a substrate comprising a metal oxide layer, wherein the metal oxide layer comprises at least one lanthanide series element, and (iii) abrading at least a portion of the metal oxide layer with the polishing system to polish the substrate. The lanthanide-containing metal oxide material can be a lanthanide oxide, a doped lanthanide oxide, a lanthanide-doped metal oxide, a lanthanide perovskite, or any other suitable lanthanide-containing mixed metal oxide material, in particular those used as solid electrode and solid electrolyte materials in gas sensor and fuel cell devices.

    Abstract translation: 本发明提供了一种抛光包含含镧系元素的金属氧化物材料的基材的方法。 该方法包括以下步骤：（i）提供抛光系统，其包括（a）研磨剂，抛光垫或其组合，（b）酸，和（c）液体载体，（ii）提供包含 金属氧化物层，其中所述金属氧化物层包含至少一种镧系元素，和（iii）用所述抛光系统研磨所述金属氧化物层的至少一部分以抛光所述衬底。 含镧系元素的金属氧化物材料可以是镧系元素氧化物，掺杂的镧系元素氧化物，镧系元素掺杂的金属氧化物，镧系元素钙钛矿或任何其它合适的含镧系元素的混合金属氧化物材料，特别是用作固体电极和固体 气体传感器和燃料电池装置中的电解质材料。

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