公开(公告)号：US20040238753A1

公开(公告)日：2004-12-02

申请号：US10829841

申请日：2004-04-22

Applicant: Cabot Microelectronics Corporation

Inventor： David G. Mikolas

IPC: G01N023/00

CPC classification number: H01J37/317 ,  H01J37/08 ,  H01J37/3007

Abstract: This invention relates to an apparatus for processing particles. The apparatus comprises a particle source having an exist aperture; an extraction electrode located at the exist aperture; an acceleration electrode adjacent to the extraction electrode; a processing compartment adjacent to the acceleration electrode; and a deceleration electrode located adjacent to the processing compartment. The invention also relates to methods of processing particles and to particles processed by the apparatus and methods of the invention.

Abstract translation: 本发明涉及一种处理颗粒的装置。 该装置包括具有存在孔径的颗粒源; 位于存在的孔的引出电极; 与提取电极相邻的加速电极; 与加速电极相邻的加工室; 以及位于处理室附近的减速电极。 本发明还涉及处理颗粒和通过本发明的装置和方法处理的颗粒的方法。

公开(公告)号：US20040188379A1

公开(公告)日：2004-09-30

申请号：US10810257

申请日：2004-03-26

Applicant: Cabot Microelectronics Corporation

Inventor： David G. Mikolas

IPC: B29D011/00

CPC classification number: G02B6/125 ,  G02B6/132 ,  G02B6/136 ,  G02B2006/12085 ,  G02B2006/121 ,  G02B2006/12109 ,  G02B2006/12116 ,  G02B2006/12119 ,  G02B2006/12121 ,  G02B2006/12126

Abstract: Photonic light circuits including one or more optical waveguides and one or more waveguide features and methods for manufacturing photonic light circuits including one or more optical waveguides.

Abstract translation: 包括一个或多个光波导的光子电路和一个或多个波导特征以及用于制造包括一个或多个光波导的光子光电路的方法。

公开(公告)号：US20030151020A1

公开(公告)日：2003-08-14

申请号：US10193589

申请日：2002-07-11

Applicant: Cabot Microelectronics Corporation

Inventor： Jui-Kun Lee ,  Chris C. Yu ,  David G. Mikolas

IPC: A62D001/00 ,  A62C002/00

CPC classification number: B81C1/00611 ,  B81C2201/0123

Abstract: Methods for manufacturing substrates with difficult to polish features using reverse mask etching and chemical mechanical planarization techniques.

Abstract translation: 使用反掩模蚀刻和化学机械平面化技术制造具有难以抛光特征的基板的方法。