公开(公告)号：US20180155819A1

公开(公告)日：2018-06-07

申请号：US15829594

申请日：2017-12-01

Applicant: California Institute of Technology

Inventor： Axel Scherer ,  Peter A. Petillo

IPC: C23C14/14 ,  C23C16/455 ,  C23F1/00 ,  C23C16/06 ,  C23C14/34

CPC classification number: C23C14/14 ,  C23C14/165 ,  C23C14/34 ,  C23C14/5873 ,  C23C16/06 ,  C23C16/45525 ,  C23C28/023 ,  C23C28/42 ,  C23F1/00 ,  G03F7/0002

Abstract: A multilayer structure can selectively bind certain molecules, due to reentrant spaces having an appropriate size. The multilayers can be fabricated by alternating layers of two different materials having different etching rate. The layers of the material having a higher etching rate form reentrant spaces which can protect molecules from further chemical interactions.