公开(公告)号：US11434312B2

公开(公告)日：2022-09-06

申请号：US17122056

申请日：2020-12-15

Applicant: CANON KABUSHIKI KAISHA

Inventor： Fen Wan ,  Weijun Liu ,  Fei Li ,  Timothy Brian Stachowiak

IPC: C08F2/46 ,  C08F2/50 ,  C08G61/04 ,  C08F212/08 ,  B05D3/06 ,  C08F222/10 ,  B32B27/26 ,  B32B27/30

Abstract: A photocurable composition can comprise a polymerizable material and a photo-initiator, wherein the polymerizable material can comprise at least one multi-functional vinylbenzene in an amount of 15 wt % to 85 wt % and at least one multi-functional acrylate monomer in an amount of 15 wt % to 85 wt % based on the total weight of the photocurable composition. A photo-cured layer of the photocurable composition can have a high heat stability up to 400° C. and a glass transition temperature of at least 135° C.

公开(公告)号：US10883006B2

公开(公告)日：2021-01-05

申请号：US15426282

申请日：2017-02-07

Applicant: CANON KABUSHIKI KAISHA

Inventor： Keiko Chiba ,  Toshiki Ito ,  Timothy Brian Stachowiak ,  Niyaz Khusnatdinov ,  Weijun Liu

IPC: B05D3/12 ,  C09D11/101 ,  G03F7/16 ,  C09D133/06 ,  B05D1/30 ,  B05D3/04 ,  B29C35/08 ,  B29C59/02 ,  C09D11/107 ,  C09D11/30 ,  C09D133/08 ,  C09D135/02 ,  G03F7/00 ,  B29K33/00 ,  B29L11/00 ,  B29L31/34

Abstract: A pattern is formed on a substrate with forming a layer of a curable composition (A1) containing a polymerizable compound (a1) on a surface of the substrate, then dispensing droplets of a curable composition (A2) containing a polymerizable compound (a2) dropwise discretely onto the curable composition (A1) layer, subsequently sandwiching a mixture layer of the curable composition (A1) and the curable composition (A2) between a mold and the substrate, then irradiating the mixture layer with light to cure the mixture layer, and releasing the mold from the mixture layer after the curing. The curable composition (A1) except a solvent has a viscosity at 25° C. of 40 mPa·s or more and less than 500 mPa·s. The curable composition (A2) except a solvent has a viscosity at 25° C. of 1 mPa·s or more and less than 40 mPa·s.

公开(公告)号：US10754245B2

公开(公告)日：2020-08-25

申请号：US15453521

申请日：2017-03-08

Applicant: CANON KABUSHIKI KAISHA

Inventor： Toshiki Ito ,  Tomonori Otani ,  Keiko Chiba ,  Weijun Liu ,  Timothy Brian Stachowiak

IPC: G03F7/00 ,  C09D133/06 ,  C09D135/02

Abstract: A pattern is formed on a substrate with forming a layer of a curable composition (A1) containing a component (a1) serving as a polymerizable compound and a component (d1) serving as a solvent on a surface of the substrate, then dispensing droplets of a curable composition (A2) containing at least a component (a2) serving as a polymerizable compound dropwise discretely onto the layer of the curable composition, subsequently sandwiching a mixture layer of the curable composition (A1) and the curable composition (A2) between a mold and the substrate, then irradiating the mixture layer with light to cure the layer, and releasing the mold from the mixture layer after the curing.

公开(公告)号：US20180272634A1

公开(公告)日：2018-09-27

申请号：US15989728

申请日：2018-05-25

Applicant: Canon Kabushiki Kaisha

Inventor： Niyaz Khusnatdinov ,  Timothy Brian Stachowiak ,  Weijun Liu

IPC: B29D11/00 ,  G03F7/00 ,  B29C59/00 ,  B29C59/02

CPC classification number: B29D11/00865 ,  B29C59/002 ,  B29C59/02 ,  B29C2059/023 ,  G03F7/0002

Abstract: A nanoimprint lithography method includes disposing a pretreatment composition on a substrate to form a pretreatment coating. The pretreatment composition includes a polymerizable component. Discrete imprint resist portions are disposed on the pretreatment coating, with each discrete portion of the imprint resist covering a target area of the substrate. A composite polymerizable coating is formed on the substrate as each discrete portion of the imprint resist spreads beyond its target area. The composite polymerizable coating includes a mixture of the pretreatment composition and the imprint resist. The composite polymerizable coating is contacted with a template, and is polymerized to yield a composite polymeric layer on the substrate. The interfacial surface energy between the pretreatment composition-and air exceeds the interfacial surface energy between the imprint resist and air or between at least a component of the imprint resist and air.

公开(公告)号：US10935884B2

公开(公告)日：2021-03-02

申请号：US16556836

申请日：2019-08-30

Applicant: CANON KABUSHIKI KAISHA

Inventor： Keiko Chiba ,  Shingo Ishida ,  Toshiaki Ando ,  Toshiki Ito ,  Timothy Brian Stachowiak ,  Weijun Liu

IPC: H01L21/00 ,  G03F7/00 ,  H01L21/027

Abstract: The pattern forming method, which is a photo-nanoimprint technology, includes in this order: laying a layer formed of a curable composition (A1) containing at least a polymerizable compound on a surface of a substrate; dispensing liquid droplets of a curable composition (A2) containing at least a polymerizable compound dropwise discretely onto the layer of (A1) to lay the liquid droplets; sandwiching a layer obtained by partially mixing (A1) and (A2) between a mold and the substrate; of irradiating the layer obtained by partially mixing (A1) and (A2) with light from a side of the mold to cure the layer in one stroke; and releasing the mold from the layer formed of the curable compositions after the curing, in which a value Vr/Vc obtained by dividing a volume of (A2) per shot area (Vr) by a volume of (A1) (Vc) is 4 or more and 15 or less.

公开(公告)号：US10509313B2

公开(公告)日：2019-12-17

申请号：US15620621

申请日：2017-06-12

Applicant: Canon Kabushiki Kaisha

Inventor： Weijun Liu ,  Fen Wan ,  Timothy Brian Stachowiak

IPC: G03F7/00 ,  G03F7/004 ,  G03F7/027 ,  G03F7/029 ,  G03F7/031

Abstract: A nanoimprint lithography method includes disposing a pretreatment composition including a polymerizable component on a substrate to form a pretreatment coating. Discrete imprint resist portions are disposed on the pretreatment coating, with each discrete portion of the imprint resist covering a target area of the substrate. The imprint resist is a polymerizable composition and includes a fluorinated photoinitiator. A composite polymerizable coating is formed on the substrate as each discrete portion of the imprint resist spreads beyond its target area. The composite polymerizable coating includes a mixture of the pretreatment composition and the imprint resist. The composite polymerizable coating is contacted with a template, and is polymerized to yield a composite polymeric layer on the substrate. The interfacial surface energy between the pretreatment composition and air exceeds the interfacial surface energy between the imprint resist and air or between at least a component of the imprint resist and air.

公开(公告)号：US10451966B2

公开(公告)日：2019-10-22

申请号：US15620621

申请日：2017-06-12

Applicant: Canon Kabushiki Kaisha

Inventor： Weijun Liu ,  Fen Wan ,  Timothy Brian Stachowiak

IPC: G03F7/00 ,  G03F7/004 ,  G03F7/027 ,  G03F7/029 ,  G03F7/031

Abstract: A nanoimprint lithography method includes disposing a pretreatment composition including a polymerizable component on a substrate to form a pretreatment coating. Discrete imprint resist portions are disposed on the pretreatment coating, with each discrete portion of the imprint resist covering a target area of the substrate. The imprint resist is a polymerizable composition and includes a fluorinated photoinitiator. A composite polymerizable coating is formed on the substrate as each discrete portion of the imprint resist spreads beyond its target area. The composite polymerizable coating includes a mixture of the pretreatment composition and the imprint resist. The composite polymerizable coating is contacted with a template, and is polymerized to yield a composite polymeric layer on the substrate. The interfacial surface energy between the pretreatment composition and air exceeds the interfacial surface energy between the imprint resist and air or between at least a component of the imprint resist and air.

公开(公告)号：US20170371240A1

公开(公告)日：2017-12-28

申请号：US15620621

申请日：2017-06-12

Applicant: Canon Kabushiki Kaisha

Inventor： Weijun Liu ,  Fen Wan ,  Timothy Brian Stachowiak

IPC: G03F7/00

Abstract: A nanoimprint lithography method includes disposing a pretreatment composition including a polymerizable component on a substrate to form a pretreatment coating. Discrete imprint resist portions are disposed on the pretreatment coating, with each discrete portion of the imprint resist covering a target area of the substrate. The imprint resist is a polymerizable composition and includes a fluorinated photoinitiator. A composite polymerizable coating is formed on the substrate as each discrete portion of the imprint resist spreads beyond its target area. The composite polymerizable coating includes a mixture of the pretreatment composition and the imprint resist. The composite polymerizable coating is contacted with a template, and is polymerized to yield a composite polymeric layer on the substrate. The interfacial surface energy between the pretreatment composition and air exceeds the interfacial surface energy between the imprint resist and air or between at least a component of the imprint resist and air.

公开(公告)号：US20170287708A1

公开(公告)日：2017-10-05

申请号：US15469224

申请日：2017-03-24

Applicant: Canon Kabushiki Kaisha

Inventor： Weijun Liu ,  Timothy Brian Stachowiak ,  James P. DeYoung ,  Niyaz Khusnatdinov

IPC: H01L21/02 ,  H01L21/027 ,  G03F7/00

CPC classification number: H01L21/02304 ,  G03F7/0002 ,  H01L21/0212 ,  H01L21/022 ,  H01L21/0273

Abstract: Facilitating throughput in nanoimprint lithography processes by using an imprint resist including fluorinated components and a substrate treated with a pretreatment composition to promote spreading of an imprint resist on the substrate. The interfacial surface energy between the pretreatment composition and air exceeds the interfacial surface energy between the imprint resist and air by at least 1 mN/m, and the contact angle of the imprint resist on the surface of the nanoimprint lithography template is less than 15°.

公开(公告)号：US20170066208A1

公开(公告)日：2017-03-09

申请号：US15195789

申请日：2016-06-28

Applicant: CANON KABUSHIKI KAISHA

Inventor： Niyaz Khusnatdinov ,  Timothy Brian Stachowiak ,  Weijun Liu

IPC: B29D11/00 ,  B29C59/00 ,  B29C59/02

CPC classification number: B29D11/00865 ,  B29C59/002 ,  B29C59/02 ,  B29C2059/023 ,  G03F7/0002

Abstract: A nanoimprint lithography method includes disposing a pretreatment composition on a substrate to form a pretreatment coating. The pretreatment composition includes a polymerizable component. Discrete imprint resist portions are disposed on the pretreatment coating, with each discrete portion of the imprint resist covering a target area of the substrate. A composite polymerizable coating is formed on the substrate as each discrete portion of the imprint resist spreads beyond its target area. The composite polymerizable coating includes a mixture of the pretreatment composition and the imprint resist. The composite polymerizable coating is contacted with a template, and is polymerized to yield a composite polymeric layer on the substrate. The interfacial surface energy between the pretreatment composition-and air exceeds the interfacial surface energy between the imprint resist and air or between at least a component of the imprint resist and air.

Abstract translation: 纳米压印光刻方法包括在基底上设置预处理组合物以形成预处理涂层。 预处理组合物包括可聚合组分。 离散印记抗蚀剂部分设置在预处理涂层上，压印抗蚀剂的每个离散部分覆盖基材的目标区域。 当印记抗蚀剂的每个离散部分扩散到其目标区域之上时，在基底上形成复合聚合涂层。 复合聚合涂层包括预处理组合物和抗蚀剂的混合物。 将复合聚合涂层与模板接触，并聚合以在基底上产生复合聚合物层。 预处理组合物与空气之间的界面表面能超过压印抗蚀剂和空气之间或至少压印抗蚀剂和空气的一部分之间的界面表面能。