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公开(公告)号：US20080119048A1
公开(公告)日：2008-05-22
申请号：US11602886
申请日：2006-11-21
IPC分类号： H01L21/302
CPC分类号： G03F1/50 , G02B5/3083 , Y10T428/24479
摘要： Lithography masks and methods of manufacture thereof are disclosed. A preferred embodiment comprises a method of manufacturing a lithography mask. The method includes providing a substrate, forming a first pattern in a first region of the substrate, and forming a second pattern in a second region of the substrate, the second pattern comprising patterns for features oriented differently than patterns for features of the first pattern. The method includes affecting a polarization rotation of light differently in the first region than in the second region of the substrate.
摘要翻译： 公开了平版印刷掩模及其制造方法。 优选实施例包括制造光刻掩模的方法。 所述方法包括提供衬底，在所述衬底的第一区域中形成第一图案，以及在所述衬底的第二区域中形成第二图案，所述第二图案包括不同于第一图案特征的图案的图案。 该方法包括在第一区域中比在衬底的第二区域中影响光的偏振旋转。
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公开(公告)号：US07799486B2
公开(公告)日：2010-09-21
申请号：US11602886
申请日：2006-11-21
IPC分类号： G03F1/00
CPC分类号： G03F1/50 , G02B5/3083 , Y10T428/24479
摘要： Lithography masks and methods of manufacture thereof are disclosed. A preferred embodiment comprises a method of manufacturing a lithography mask. The method includes providing a substrate, forming a first pattern in a first region of the substrate, and forming a second pattern in a second region of the substrate, the second pattern comprising patterns for features oriented differently than patterns for features of the first pattern. The method includes affecting a polarization rotation of light differently in the first region than in the second region of the substrate.
摘要翻译： 公开了平版印刷掩模及其制造方法。 优选实施例包括制造光刻掩模的方法。 所述方法包括提供衬底，在所述衬底的第一区域中形成第一图案，以及在所述衬底的第二区域中形成第二图案，所述第二图案包括不同于第一图案特征的图案的图案。 该方法包括在第一区域中比在衬底的第二区域中影响光的偏振旋转。
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公开(公告)号：US20100297398A1
公开(公告)日：2010-11-25
申请号：US12847641
申请日：2010-07-30
CPC分类号： G03F1/50 , G02B5/3083 , Y10T428/24479
摘要： Lithography masks and methods of manufacture thereof are disclosed. A preferred embodiment comprises a method of manufacturing a lithography mask. The method includes providing a substrate, forming a first pattern in a first region of the substrate, and forming a second pattern in a second region of the substrate, the second pattern comprising patterns for features oriented differently than patterns for features of the first pattern. The method includes affecting a polarization rotation of light differently in the first region than in the second region of the substrate.
摘要翻译： 公开了平版印刷掩模及其制造方法。 优选实施例包括制造光刻掩模的方法。 所述方法包括提供衬底，在所述衬底的第一区域中形成第一图案，以及在所述衬底的第二区域中形成第二图案，所述第二图案包括不同于第一图案特征的图案的图案。 该方法包括在第一区域中比在衬底的第二区域中影响光的偏振旋转。
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公开(公告)号：US07947431B2
公开(公告)日：2011-05-24
申请号：US12847641
申请日：2010-07-30
CPC分类号： G03F1/50 , G02B5/3083 , Y10T428/24479
摘要： Lithography masks and methods of manufacture thereof are disclosed. A preferred embodiment comprises a method of manufacturing a lithography mask. The method includes providing a substrate, forming a first pattern in a first region of the substrate, and forming a second pattern in a second region of the substrate, the second pattern comprising patterns for features oriented differently than patterns for features of the first pattern. The method includes affecting a polarization rotation of light differently in the first region than in the second region of the substrate.
摘要翻译： 公开了平版印刷掩模及其制造方法。 优选实施例包括制造光刻掩模的方法。 所述方法包括提供衬底，在所述衬底的第一区域中形成第一图案，以及在所述衬底的第二区域中形成第二图案，所述第二图案包括不同于第一图案特征的图案的图案。 该方法包括在第一区域中比在衬底的第二区域中影响光的偏振旋转。
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公开(公告)号：US20090091729A1
公开(公告)日：2009-04-09
申请号：US11868362
申请日：2007-10-05
CPC分类号： G03B27/32 , G03F7/70208
摘要： Lithography systems and methods of manufacturing semiconductor devices are disclosed. For example, a lithography system includes at least two reticle stages and a common projection lens system disposed between the reticle stages and a wafer stage, and at least one alignment system for aligning the reticle stages.
摘要翻译： 公开了制造半导体器件的平版印刷系统和方法。 例如，光刻系统包括至少两个标线片级和设置在标线片级和晶片级之间的公共投影透镜系统，以及用于对准标线片级的至少一个对准系统。
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公开(公告)号：US20090023078A1
公开(公告)日：2009-01-22
申请号：US11781105
申请日：2007-07-20
申请人： Alois Gutmann , Sajan Marokkey , Henning Haffner , Chandrasekhar Sarma , Haoren Zhuang , Matthias Lipinski
发明人： Alois Gutmann , Sajan Marokkey , Henning Haffner , Chandrasekhar Sarma , Haoren Zhuang , Matthias Lipinski
摘要： Lithography masks and methods of manufacture thereof are disclosed. For example, a method of manufacturing a lithography mask includes forming a stack over a substrate. The stack includes bottom attenuated phase shift material layers, intermediate opaque material layers, and finally top resist layers. The method further includes patterning the stack and then trimming the resist layers to uncover a portion of the opaque material layers. The uncovered opaque material layers are subsequently etched followed by removal of any remaining resist layers.
摘要翻译： 公开了平版印刷掩模及其制造方法。 例如，制造光刻掩模的方法包括在衬底上形成叠层。 该堆叠包括底部衰减相移材料层，中间不透明材料层，最后是顶部抗蚀剂层。 该方法还包括图案化叠层，然后修整抗蚀剂层以露出不透明材料层的一部分。 随后蚀刻未覆盖的不透明材料层，随后除去任何剩余的抗蚀剂层。
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公开(公告)号：US20090092926A1
公开(公告)日：2009-04-09
申请号：US11868374
申请日：2007-10-05
IPC分类号： G03C5/00
CPC分类号： G03F7/70466 , G03F1/26 , G03F1/70 , G03F7/70208 , G03F7/70283
摘要： Multi-beam lithography systems and methods of manufacturing semiconductor devices using the same are disclosed. For example, the method utilizes non-coincidence of boundaries of electrical fields emanating from chrome on glass or phase shifted mask features distributed over two masks for the optimization of lithographic process windows, side lobe suppression, or pattern orientation dependent process window optimization employing one mask with polarization rotating film on the backside.
摘要翻译： 公开了多光束光刻系统和使用其的制造半导体器件的方法。 例如，该方法利用玻璃上镀铬的电场边界的不重合或分布在两个掩模上的相移掩模特征，用于优化光刻工艺窗口，旁瓣抑制或使用一个掩模的图案取向依赖的工艺窗口优化 背面有偏振旋转胶片。
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公开(公告)号：US08715909B2
公开(公告)日：2014-05-06
申请号：US11868374
申请日：2007-10-05
IPC分类号： G03F7/20
CPC分类号： G03F7/70466 , G03F1/26 , G03F1/70 , G03F7/70208 , G03F7/70283
摘要： Multi-beam lithography systems and methods of manufacturing semiconductor devices using the same are disclosed. For example, the method utilizes non-coincidence of boundaries of electrical fields emanating from chrome on glass or phase shifted mask features distributed over two masks for the optimization of lithographic process windows, side lobe suppression, or pattern orientation dependent process window optimization employing one mask with polarization rotating film on the backside.
摘要翻译： 公开了多光束光刻系统和使用其的制造半导体器件的方法。 例如，该方法利用玻璃上镀铬的电场边界的不重合或分布在两个掩模上的相移掩模特征，用于优化光刻工艺窗口，旁瓣抑制或使用一个掩模的图案取向依赖的工艺窗口优化 背面有偏振旋转胶片。
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公开(公告)号：US08071261B2
公开(公告)日：2011-12-06
申请号：US11781105
申请日：2007-07-20
申请人： Alois Gutmann , Sajan Marokkey , Henning Haffner , Chandrasekhar Sarma , Haoren Zhuang , Matthias Lipinski
发明人： Alois Gutmann , Sajan Marokkey , Henning Haffner , Chandrasekhar Sarma , Haoren Zhuang , Matthias Lipinski
IPC分类号： G03F1/00
摘要： Lithography masks and methods of manufacture thereof are disclosed. For example, a method of manufacturing a lithography mask includes forming a stack over a substrate. The stack includes bottom attenuated phase shift material layers, intermediate opaque material layers, and finally top resist layers. The method further includes patterning the stack and then trimming the resist layers to uncover a portion of the opaque material layers. The uncovered opaque material layers are subsequently etched followed by removal of any remaining resist layers.
摘要翻译： 公开了平版印刷掩模及其制造方法。 例如，制造光刻掩模的方法包括在衬底上形成叠层。 该堆叠包括底部衰减相移材料层，中间不透明材料层，最后是顶部抗蚀剂层。 该方法还包括图案化叠层，然后修整抗蚀剂层以露出不透明材料层的一部分。 随后蚀刻未覆盖的不透明材料层，随后除去任何剩余的抗蚀剂层。
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公开(公告)号：US08875063B2
公开(公告)日：2014-10-28
申请号：US12901595
申请日：2010-10-11
申请人： Zachary Baum , Scott D. Halle , Henning Haffner
发明人： Zachary Baum , Scott D. Halle , Henning Haffner
CPC分类号： G03F1/30 , G03F1/0069
摘要： A method for forming a mask layout is described. A plurality of phase shapes are formed on either side of a critical feature of a design layout of an intergrated circuit chip having a plurality of critical features. A plurality of transition edges are identified from the edges of each phase shape. Each transition edge is parallel to critical feature. A transition space is identified as defined by one of the group including two transition edges and one transition edge. A transition polygon is formed by closing each transition space with at least one closing edge. Each transition polygon is transformed into a printing assist feature. A mask layout is formed from the printing assist features and critical features.
摘要翻译： 描述了形成掩模布局的方法。 在具有多个关键特征的集成电路芯片的设计布局的关键特征的任一侧上形成多个相位形状。 从每个相位形状的边缘识别多个过渡边缘。 每个过渡边缘与关键特征平行。 识别由包括两个过渡边缘和一个过渡边缘的组之一所定义的过渡空间。 通过用至少一个关闭边缘关闭每个过渡空间来形成过渡多边形。 每个过渡多边形被转换成打印辅助功能。 从打印辅助功能和关键特征形成面罩布局。
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