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公开(公告)号：US06907432B1
公开(公告)日：2005-06-14
申请号：US09723746
申请日：2000-11-28
申请人： Charles R. Szmanda , Peter Trefonas, III , Richard C. Hemond , Mark S. Thirsk , Leo L. Linehan , Anthony Zampini
发明人： Charles R. Szmanda , Peter Trefonas, III , Richard C. Hemond , Mark S. Thirsk , Leo L. Linehan , Anthony Zampini
CPC分类号： G06Q10/06 , Y10S707/99945 , Y10S707/99948
摘要： A system and method is provided for recycling raw materials from a plurality waste streams generated by waste stream providers and includes a waste stream monitoring module for monitoring the plurality of waste streams and determining an amount of reusable raw materials contained in each of the plurality of waste streams. Also included is a reusable materials database for storing the amount of each of the raw materials contained in any of the plurality of waste streams. A user operating an access device communications with the reusable materials database for viewing the amount of each of said raw materials.
摘要翻译： 提供了一种用于从废物流提供者产生的多个废物流中回收原材料的系统和方法，并且包括用于监测多个废物流的废物流监测模块，并且确定包含在多个废物中的每一个中的可重复使用的原料的量 流。 还包括用于存储包含在多个废物流中的任何一个中的每个原料的量的可重复使用的材料数据库。 用户操作访问设备与可重用材料数据库的通信，用于查看每个所述原材料的量。
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2.发明授权Positive photoresist composition with naphthoquinonediazidesulfonate of oligomeric phenol 失效具有低聚苯酚萘醌二叠氮化物的正性光致抗蚀剂组合物
公开(公告)号：US5178986A
公开(公告)日：1993-01-12
申请号：US902458
申请日：1992-06-19
IPC分类号： G03F7/022
CPC分类号： G03F7/022
摘要： A radiation sensitive oligomeric compound is described as the photoactive component with a base soluble phenolic matrix resin to provide improved photo-resist composition having high light-sensitivity, high resolution, excellent developer resistance and excellent resistance to thermal flow.
摘要翻译： 辐射敏感低聚化合物被描述为具有碱溶性酚基树脂的光活性组分，以提供具有高光敏性，高分辨率，优异的显影剂抗性和优异的耐热流动性的改进的光致抗蚀剂组合物。
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公开(公告)号：US07118847B2
公开(公告)日：2006-10-10
申请号：US10970837
申请日：2004-10-22
CPC分类号： G03F7/0395 , C08F32/08 , G03F7/0045 , G03F7/039 , G03F7/0397 , Y10S430/108
摘要： Disclosed are spirocyclic olefin polymers, methods of preparing spirocyclic olefin polymers, photresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions.
摘要翻译： 公开了螺环烯烃聚合物，制备螺环烯烃聚合物的方法，包括螺环烯烃树脂粘合剂的光热组合物以及使用这种光致抗蚀剂组合物形成浮雕图像的方法。
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公开(公告)号：US06599677B2
公开(公告)日：2003-07-29
申请号：US10126904
申请日：2002-04-20
IPC分类号： G03F7004
CPC分类号： G03F7/0395 , C08F32/08 , G03F7/0045 , G03F7/039 , G03F7/0397 , Y10S430/108
摘要： Disclosed are spirocyclic olefin ploymers, methods of preparing spirocyclic olefin polymers, photoresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions.
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公开(公告)号：US5866299A
公开(公告)日：1999-02-02
申请号：US877882
申请日：1997-06-18
IPC分类号： G03F7/004 , G03F7/038 , H01L21/027 , G03C5/00
CPC分类号： G03F7/038 , G03F7/0045 , Y10S430/121
摘要： A photoresist composition and process that minimizes the effect of photogenerated acid migration. The photoresist comprises an alkali soluble resin, a photoacid generating compound that undergoes photolysis within a wavelength of from 330 to 700 nm to yield a strong acid, a crosslinking agent capable of crosslinking the composition when activated by photogenerated hydrohalide acid and a buffer comprising a mixture of an organic carboxylic acid and a strong base having a pK.sub.b of 5 or less present in a concentration sufficient to immobilize from 0.1 to 25 mole percent of photogenerated acid. The buffer is responsible for immobilization of the acid.
摘要翻译： 光致抗蚀剂组合物和使光生酸迁移的作用最小化的方法。 光致抗蚀剂包括碱可溶性树脂，在330至700nm波长下经历光解作用以产生强酸的光致酸产生化合物，当由光生氢卤酸活化时能够交联组合物的交联剂和包含混合物的缓冲剂 的有机羧酸和pKb为5以下的强碱存在，其浓度足以固定0.1〜25摩尔％的光产酸。 缓冲液负责固定酸。
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公开(公告)号：US06406828B1
公开(公告)日：2002-06-18
申请号：US09511726
申请日：2000-02-24
IPC分类号： G03F7004
CPC分类号： G03F7/0395 , C08F32/08 , G03F7/0045 , G03F7/039 , G03F7/0397 , Y10S430/108
摘要： Disclosed are polymers including as polymerized units one or more spirocyclic olefin monomer of the formulae I or Ia wherein A=CH2; G=C(Z′), O, and NR2; R2=H, (C1-C8)alkyl or substituted (C1-C8)alkyl; E and W are independently selected from C(Z′), O and a chemical bond; Z′=O; n=1; m=1; m′=0; 1=0 to 5; and p=0 to 5; provided that when both E and W are C(Z′), G is NR2; wherein T and L are taken together to form a double bond. These polymers are useful in photoresist compositions. Methods of making and using these polymers are also disclosed.
摘要翻译： 公开了包括作为聚合单元的一种或多种式I或Iawherein A = CH 2的螺环烯烃单体的聚合物; G = C（Z'），O和NR2; R2 = H，（C1-C8）烷基或取代的（C1-C8）烷基; E和W独立地选自C（Z'），O和化学键; Z'= O; n = 1; m = 1; m'= 0; 1 = 0〜5; 和p = 0至5; 条件是当E和W都为C（Z'）时，G为NR2; 其中T和L一起形成双键。 这些聚合物可用于光致抗蚀剂组合物。 还公开了制备和使用这些聚合物的方法。
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公开(公告)号：US07202009B2
公开(公告)日：2007-04-10
申请号：US09948526
申请日：2001-09-08
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： This invention relates to resins and photoresist compositions that comprise such resins. Preferred polymers of the invention comprise adjacent saturated carbon atoms, either integral or pendant to the polymer backbone, that have a substantially gauche conformation. Polymers of the invention are particularly useful as a resin binder component of chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm and preferably about 157 nm. In such short-wavelength imaging applications, polymers of the invention that have a population of dihedral angles of adjacent saturated carbon atoms that are enriched in substantially gauche conformations can provide reduced undesired absorbance of the high energy exposure radiation.
摘要翻译： 本发明涉及包含这种树脂的树脂和光致抗蚀剂组合物。 本发明优选的聚合物包含相对于聚合物主链的整体或垂饰的饱和碳原子，其具有基本上高的构象。 本发明的聚合物特别可用作化学放大的正性作用抗蚀剂的树脂粘合剂组分，其可以在短波长如200nm以下，优选约157nm下有效成像。 在这样的短波长成像应用中，具有富含基本上高分子构象的相邻饱和碳原子的二面角群体的本发明的聚合物可以提供高能量曝光辐射的不希望的吸光度。
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公开(公告)号：US6110641A
公开(公告)日：2000-08-29
申请号：US984855
申请日：1997-12-04
CPC分类号： G03F7/038 , G03F7/091 , G03F7/0045 , H05K3/048 , Y10S430/121
摘要： A photoresist composition comprising an alkali soluble resin, a photoacid generating compound that undergoes photolysis when exposed to a pattern of activating irradiation within a wavelength of from 330 to 700 .mu.m, a crosslinking agent capable of crosslinking the composition when activated by photogenerated acid and a dye that is an aromatic carboxylic acid having phenylazo substitution. The photoresist is characterized by the dye which is soluble in the photoresist solution, unreactive with components of the photoresist composition and may be used in relatively high concentration.
摘要翻译： 一种光致抗蚀剂组合物，其包含碱溶性树脂，当暴露于波长为330-700μm的激活照射模式时经历光解的光产酸化合物，当通过光生酸活化时能够交联组合物的交联剂和 作为具有苯偶氮取代基的芳香族羧酸的染料。 光致抗蚀剂的特征在于可溶于光致抗蚀剂溶液中的染料，与光致抗蚀剂组合物的组分不反应，并且可以以相对高的浓度使用。
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9.发明授权Esterification product of aromatic novolak resin with quinone diazide sulfonyl group 失效芳香酚醛清漆与醌二叠氮磺酰基的酯化产物
公开(公告)号：US5589553A
公开(公告)日：1996-12-31
申请号：US413089
申请日：1995-03-29
CPC分类号： G03F7/023
摘要： A resin suitable for use as a photoresist that is the esterification product of an o-quinonediazide compound and an aromatic novolak resin. The aromatic novolak resin may be the condensation product of a reactive phenol with a bis(hydroxymethyl)phenol or an aromatic aldehyde. The aromatic resin may be chain extended by further reaction with an additional aldehyde. The resin has a maximum of 20 percent of its phenolic hydroxyl groups esterified with the o-quinonediazide sulfonate compound.
摘要翻译： 适合用作邻醌二叠氮化合物和芳族酚醛清漆树脂的酯化产物的光致抗蚀剂的树脂。 芳族酚醛清漆树脂可以是反应性苯酚与双（羟甲基）苯酚或芳族醛的缩合产物。 芳族树脂可以通过与另外的醛进一步反应而链延伸。 树脂具有最多20％的酚羟基与邻醌二叠氮化物磺酸酯化合物酯化。
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10.发明授权Positive dye photoresist compositions with 2,4-bis(phenylazo)resorcinol 失效具有2,4-双（苯偶氮）间苯二酚的正性染料光致抗蚀剂组合物
公开(公告)号：US4983492A
公开(公告)日：1991-01-08
申请号：US203043
申请日：1988-06-06
CPC分类号： G03F7/091
摘要： This invention provides improved positive photoresist compositions containing a bis(azophenyl)resorcinol as a dye.
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