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77 条记录 (耗时 0.023 秒)

    Photoresist with photoactive compound mixtures
    3.
    发明授权
    Photoresist with photoactive compound mixtures 失效
    光敏复合混合物

    公开(公告)号：US5723254A

    公开(公告)日：1998-03-03

    申请号：US706096

    申请日：1996-09-04

    申请人： Anthony Zampini ,  Peter Trefonas, III ,  Pamela Turci ,  Catherine C. Meister ,  Gerald C. Vizvary

    发明人： Anthony Zampini ,  Peter Trefonas, III ,  Pamela Turci ,  Catherine C. Meister ,  Gerald C. Vizvary

    IPC分类号： C08G8/28 ,  G03F7/022 ,  G03F7/023 ,  H01L21/027

    CPC分类号： G03F7/023 ,  C08G8/28 ,  G03F7/022 ,  G03F7/0236

    摘要： The invention relates to a positive-acting photoresist composition containing a mixture of photoactive compounds. One component of the mixture is the esterification product of an o-quinonediazide sulfonyl compound with a phenolic resin. Another component of the mixture is the esterification product of an o-quinonediazide sulfonyl compound with a low molecular weight phenol having from one to three aryl groups and from one to three hydroxyl groups. A third photoactive component which may be present in the formulation is the esterification product of an o-quinonediazide sulfonyl compound with a relative high molecular weight, polyhydric, polynuclear phenol.

    摘要翻译： 本发明涉及含有光活性化合物混合物的正性光致抗蚀剂组合物。 该混合物的一个组分是邻醌二叠氮化物磺酰化合物与酚醛树脂的酯化产物。 该混合物的另一成分是邻醌二叠氮化物磺酰化合物与具有1至3个芳基和1至3个羟基的低分子量苯酚的酯化产物。 可能存在于制剂中的第三种光活性组分是邻醌二叠氮化物磺酰化合物与相对高分子量的多羟基多酚苯酚的酯化产物。

    Esterification product of aromatic novolak resin with quinone diazide sulfonyl group
    4.
    发明授权
    Esterification product of aromatic novolak resin with quinone diazide sulfonyl group 失效
    芳香酚醛清漆与醌二叠氮磺酰基的酯化产物

    公开(公告)号：US5589553A

    公开(公告)日：1996-12-31

    申请号：US413089

    申请日：1995-03-29

    申请人： Anthony Zampini ,  Peter Trefonas, III

    发明人： Anthony Zampini ,  Peter Trefonas, III

    IPC分类号： G03F7/023 ,  C08L61/06 ,  C08L61/14

    CPC分类号： G03F7/023

    摘要： A resin suitable for use as a photoresist that is the esterification product of an o-quinonediazide compound and an aromatic novolak resin. The aromatic novolak resin may be the condensation product of a reactive phenol with a bis(hydroxymethyl)phenol or an aromatic aldehyde. The aromatic resin may be chain extended by further reaction with an additional aldehyde. The resin has a maximum of 20 percent of its phenolic hydroxyl groups esterified with the o-quinonediazide sulfonate compound.

    摘要翻译： 适合用作邻醌二叠氮化合物和芳族酚醛清漆树脂的酯化产物的光致抗蚀剂的树脂。 芳族酚醛清漆树脂可以是反应性苯酚与双（羟甲基）苯酚或芳族醛的缩合产物。 芳族树脂可以通过与另外的醛进一步反应而链延伸。 树脂具有最多20％的酚羟基与邻醌二叠氮化物磺酸酯化合物酯化。

    Method and system for recycling materials
    5.
    发明授权
    Method and system for recycling materials 有权
    回收材料的方法和系统

    公开(公告)号：US06907432B1

    公开(公告)日：2005-06-14

    申请号：US09723746

    申请日：2000-11-28

    申请人： Charles R. Szmanda ,  Peter Trefonas, III ,  Richard C. Hemond ,  Mark S. Thirsk ,  Leo L. Linehan ,  Anthony Zampini

    发明人： Charles R. Szmanda ,  Peter Trefonas, III ,  Richard C. Hemond ,  Mark S. Thirsk ,  Leo L. Linehan ,  Anthony Zampini

    IPC分类号： G06F17/30 ,  G06Q10/00

    CPC分类号： G06Q10/06 ,  Y10S707/99945 ,  Y10S707/99948

    摘要： A system and method is provided for recycling raw materials from a plurality waste streams generated by waste stream providers and includes a waste stream monitoring module for monitoring the plurality of waste streams and determining an amount of reusable raw materials contained in each of the plurality of waste streams. Also included is a reusable materials database for storing the amount of each of the raw materials contained in any of the plurality of waste streams. A user operating an access device communications with the reusable materials database for viewing the amount of each of said raw materials.

    摘要翻译： 提供了一种用于从废物流提供者产生的多个废物流中回收原材料的系统和方法，并且包括用于监测多个废物流的废物流监测模块，并且确定包含在多个废物中的每一个中的可重复使用的原料的量 流。 还包括用于存储包含在多个废物流中的任何一个中的每个原料的量的可重复使用的材料数据库。 用户操作访问设备与可重用材料数据库的通信，用于查看每个所述原材料的量。

    Photoresist with a mixture of a photosensitive esterified resin and an o-naphthoquinone diazide compound
    6.
    发明授权
    Photoresist with a mixture of a photosensitive esterified resin and an o-naphthoquinone diazide compound 失效
    用感光酯化树脂和邻萘醌二叠氮化合物的混合物进行光刻

    公开(公告)号：US5529880A

    公开(公告)日：1996-06-25

    申请号：US413081

    申请日：1995-03-29

    申请人： Anthony Zampini ,  Peter Trefonas, III

    发明人： Anthony Zampini ,  Peter Trefonas, III

    IPC分类号： G03F7/022 ,  C08G8/28 ,  C08L61/04 ,  C08L61/14 ,  G03F7/023 ,  H01L21/027 ,  G03F7/30

    CPC分类号： C08G8/28 ,  G03F7/023

    摘要： A photoresist that is a mixture of the esterification product of an o-quinonediazide compound and a novolak resin and a high molecular weight phenol having from 2 to 5 phenolic groups and at least 4 diazo naphthoquinone groups. The extent of esterification of the novolak resin is up to 20 percent of the hydroxyl groups and the degree of esterification of the phenol is at least 50 percent of the phenolic hydroxyl groups. The preferred novolak resins are the aromatic novolak resin that are the condensation product of a reactive phenol with a bis(hydroxymethyl)phenol or an aromatic aldehyde, each alone or in the presence of a reactive phenol.

    摘要翻译： 作为邻醌二叠氮化合物和酚醛清漆树脂的酯化产物和具有2至5个酚基和至少4个重氮萘醌基团的高分子量酚的混合物的光致抗蚀剂。 酚醛清漆树脂的酯化程度高达羟基的20％，酚的酯化度至少为酚羟基的50％。 优选的酚醛清漆树脂是芳族酚醛清漆树脂，它们是反应性苯酚与双（羟甲基）苯酚或芳族醛的缩合产物，每个单独或在反应性苯酚存在下。