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77 条记录 (耗时 0.029 秒)

    Method and system for recycling materials
    1.
    发明授权
    Method and system for recycling materials 有权
    回收材料的方法和系统

    公开(公告)号：US06907432B1

    公开(公告)日：2005-06-14

    申请号：US09723746

    申请日：2000-11-28

    申请人： Charles R. Szmanda ,  Peter Trefonas, III ,  Richard C. Hemond ,  Mark S. Thirsk ,  Leo L. Linehan ,  Anthony Zampini

    发明人： Charles R. Szmanda ,  Peter Trefonas, III ,  Richard C. Hemond ,  Mark S. Thirsk ,  Leo L. Linehan ,  Anthony Zampini

    IPC分类号： G06F17/30 ,  G06Q10/00

    CPC分类号： G06Q10/06 ,  Y10S707/99945 ,  Y10S707/99948

    摘要： A system and method is provided for recycling raw materials from a plurality waste streams generated by waste stream providers and includes a waste stream monitoring module for monitoring the plurality of waste streams and determining an amount of reusable raw materials contained in each of the plurality of waste streams. Also included is a reusable materials database for storing the amount of each of the raw materials contained in any of the plurality of waste streams. A user operating an access device communications with the reusable materials database for viewing the amount of each of said raw materials.

    摘要翻译： 提供了一种用于从废物流提供者产生的多个废物流中回收原材料的系统和方法，并且包括用于监测多个废物流的废物流监测模块，并且确定包含在多个废物中的每一个中的可重复使用的原料的量 流。 还包括用于存储包含在多个废物流中的任何一个中的每个原料的量的可重复使用的材料数据库。 用户操作访问设备与可重用材料数据库的通信，用于查看每个所述原材料的量。

    Photoresist with photoactive compound mixtures
    4.
    发明授权
    Photoresist with photoactive compound mixtures 失效
    光敏复合混合物

    公开(公告)号：US5723254A

    公开(公告)日：1998-03-03

    申请号：US706096

    申请日：1996-09-04

    申请人： Anthony Zampini ,  Peter Trefonas, III ,  Pamela Turci ,  Catherine C. Meister ,  Gerald C. Vizvary

    发明人： Anthony Zampini ,  Peter Trefonas, III ,  Pamela Turci ,  Catherine C. Meister ,  Gerald C. Vizvary

    IPC分类号： C08G8/28 ,  G03F7/022 ,  G03F7/023 ,  H01L21/027

    CPC分类号： G03F7/023 ,  C08G8/28 ,  G03F7/022 ,  G03F7/0236

    摘要： The invention relates to a positive-acting photoresist composition containing a mixture of photoactive compounds. One component of the mixture is the esterification product of an o-quinonediazide sulfonyl compound with a phenolic resin. Another component of the mixture is the esterification product of an o-quinonediazide sulfonyl compound with a low molecular weight phenol having from one to three aryl groups and from one to three hydroxyl groups. A third photoactive component which may be present in the formulation is the esterification product of an o-quinonediazide sulfonyl compound with a relative high molecular weight, polyhydric, polynuclear phenol.

    摘要翻译： 本发明涉及含有光活性化合物混合物的正性光致抗蚀剂组合物。 该混合物的一个组分是邻醌二叠氮化物磺酰化合物与酚醛树脂的酯化产物。 该混合物的另一成分是邻醌二叠氮化物磺酰化合物与具有1至3个芳基和1至3个羟基的低分子量苯酚的酯化产物。 可能存在于制剂中的第三种光活性组分是邻醌二叠氮化物磺酰化合物与相对高分子量的多羟基多酚苯酚的酯化产物。

    Esterification product of aromatic novolak resin with quinone diazide sulfonyl group
    5.
    发明授权
    Esterification product of aromatic novolak resin with quinone diazide sulfonyl group 失效
    芳香酚醛清漆与醌二叠氮磺酰基的酯化产物

    公开(公告)号：US5589553A

    公开(公告)日：1996-12-31

    申请号：US413089

    申请日：1995-03-29

    申请人： Anthony Zampini ,  Peter Trefonas, III

    发明人： Anthony Zampini ,  Peter Trefonas, III

    IPC分类号： G03F7/023 ,  C08L61/06 ,  C08L61/14

    CPC分类号： G03F7/023

    摘要： A resin suitable for use as a photoresist that is the esterification product of an o-quinonediazide compound and an aromatic novolak resin. The aromatic novolak resin may be the condensation product of a reactive phenol with a bis(hydroxymethyl)phenol or an aromatic aldehyde. The aromatic resin may be chain extended by further reaction with an additional aldehyde. The resin has a maximum of 20 percent of its phenolic hydroxyl groups esterified with the o-quinonediazide sulfonate compound.

    摘要翻译： 适合用作邻醌二叠氮化合物和芳族酚醛清漆树脂的酯化产物的光致抗蚀剂的树脂。 芳族酚醛清漆树脂可以是反应性苯酚与双（羟甲基）苯酚或芳族醛的缩合产物。 芳族树脂可以通过与另外的醛进一步反应而链延伸。 树脂具有最多20％的酚羟基与邻醌二叠氮化物磺酸酯化合物酯化。

    Photoresist with a mixture of a photosensitive esterified resin and an o-naphthoquinone diazide compound
    6.
    发明授权
    Photoresist with a mixture of a photosensitive esterified resin and an o-naphthoquinone diazide compound 失效
    用感光酯化树脂和邻萘醌二叠氮化合物的混合物进行光刻

    公开(公告)号：US5529880A

    公开(公告)日：1996-06-25

    申请号：US413081

    申请日：1995-03-29

    申请人： Anthony Zampini ,  Peter Trefonas, III

    发明人： Anthony Zampini ,  Peter Trefonas, III

    IPC分类号： G03F7/022 ,  C08G8/28 ,  C08L61/04 ,  C08L61/14 ,  G03F7/023 ,  H01L21/027 ,  G03F7/30

    CPC分类号： C08G8/28 ,  G03F7/023

    摘要： A photoresist that is a mixture of the esterification product of an o-quinonediazide compound and a novolak resin and a high molecular weight phenol having from 2 to 5 phenolic groups and at least 4 diazo naphthoquinone groups. The extent of esterification of the novolak resin is up to 20 percent of the hydroxyl groups and the degree of esterification of the phenol is at least 50 percent of the phenolic hydroxyl groups. The preferred novolak resins are the aromatic novolak resin that are the condensation product of a reactive phenol with a bis(hydroxymethyl)phenol or an aromatic aldehyde, each alone or in the presence of a reactive phenol.

    摘要翻译： 作为邻醌二叠氮化合物和酚醛清漆树脂的酯化产物和具有2至5个酚基和至少4个重氮萘醌基团的高分子量酚的混合物的光致抗蚀剂。 酚醛清漆树脂的酯化程度高达羟基的20％，酚的酯化度至少为酚羟基的50％。 优选的酚醛清漆树脂是芳族酚醛清漆树脂，它们是反应性苯酚与双（羟甲基）苯酚或芳族醛的缩合产物，每个单独或在反应性苯酚存在下。

    Solvents and photoresist compositions for short wavelength imaging
    9.
    发明授权
    Solvents and photoresist compositions for short wavelength imaging 失效
    用于短波长成像的溶剂和光致抗蚀剂组合物

    公开(公告)号：US06787286B2

    公开(公告)日：2004-09-07

    申请号：US10101202

    申请日：2002-03-19

    申请人： Charles R. Szmanda ,  Anthony Zampini

    发明人： Charles R. Szmanda ,  Anthony Zampini

    IPC分类号： G03F7039

    CPC分类号： H05K3/381 ,  C08J7/02 ,  C23C18/2006 ,  C23C18/24 ,  G03F7/0046 ,  G03F7/0048 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  H05K3/0055 ,  Y10S430/113

    摘要： New photoresists are provides that are suitable for short wavelength imaging, particularly sub-170 nm such as 157 nm. Resists of the invention comprise a fluorine-containing polymer, a photoactive component, and a solvent component. Preferred solvents for use on the resists of the invention can maintain the resist components in solution and include one or more preferably two or more (i.e. blends) of solvents. In particularly preferred solvent blends of the invention, each blend member evaporates at substantially equal rates, whereby the resist composition maintains a substantially constant concentration of each blend member.

    摘要翻译： 提供适用于短波长成像的新型光致抗蚀剂，特别是亚170nm，例如157nm。 本发明的抗菌剂包括含氟聚合物，光敏组分和溶剂组分。 用于本发明抗蚀剂的优选溶剂可以将抗蚀剂组分保持在溶液中，并且包括溶剂的一种或多种（即共混物）。 在本发明的特别优选的溶剂共混物中，每个共混构件以基本上相等的速率蒸发，由此抗蚀剂组合物保持每个共混构件的基本恒定的浓度。

    Photoresist compositions for short wavelength imaging
    10.
    发明授权
    Photoresist compositions for short wavelength imaging 有权
    用于短波长成像的光刻胶组合物

    公开(公告)号：US06858379B2

    公开(公告)日：2005-02-22

    申请号：US10101768

    申请日：2002-03-20

    申请人： Anthony Zampini ,  Charles R. Szmanda ,  Gary N. Taylor ,  James F. Cameron ,  Gerhard Pohlers

    发明人： Anthony Zampini ,  Charles R. Szmanda ,  Gary N. Taylor ,  James F. Cameron ,  Gerhard Pohlers

    IPC分类号： G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  G03C5/00

    CPC分类号： G03F7/0392 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0395 ,  Y10S430/108

    摘要： New photoresists are provided that are suitable for short wavelength imaging, including sub-200 nm such as 157 nm. In one aspect, resists of the invention comprise a fluorine-containing polymer, a photoactive component, and one or more additional components of an amine or other basic composition, a dissolution inhibitor compound, a surfactant or leveling agent, or a plasticizer material. In another aspect, resists of the invention contain a fluorine-containing resin and one or more photoacid generator compounds, particularly non-aromatic onium salts and imidosulfonates, and other non-ionic photoacid generator compounds.

    摘要翻译： 提供了适用于短波长成像的新型光致抗蚀剂，包括亚200nm，例如157nm。 一方面，本发明的抗蚀剂包含含氟聚合物，光活性组分和胺或其它碱性组合物的一种或多种另外的组分，溶解抑制剂化合物，表面活性剂或流平剂或增塑剂材料。 在另一方面，本发明的抗蚀剂含有含氟树脂和一种或多种光酸产生剂化合物，特别是非芳族鎓盐和亚氨磺酸盐，以及其它非离子光酸产生剂化合物。