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    Lithographic apparatus and device manufacturing method
    5.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US20050195380A1

    公开(公告)日：2005-09-08

    申请号：US10790257

    申请日：2004-03-02

    申请人： Joost Sytsma ,  Pieter de Jager

    发明人： Joost Sytsma ,  Pieter de Jager

    IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/52

    CPC分类号： G03F7/70558 ,  G03F7/70208 ,  G03F7/70275 ,  G03F7/70283 ,  G03F7/70291

    摘要： A detector, feedback and compensation system for use with a radiation distribution system for distributing the radiation from a radiation system to two or more arrays of individually controllable elements, each for patterning beams of radiation, which are subsequently projected onto a substrate. The detector determines the radiation lost in the radiation distribution system and feeds this information back to a compensation system, which compensates for the loss and keeps the radiation projected onto the substrate uniform.

    摘要翻译： 一种用于辐射分布系统的检测器，反馈和补偿系统，用于将辐射系统的辐射分配到两个或更多个独立可控元件的阵列，每个用于构图辐射束，其随后投射到衬底上。 检测器确定辐射分布系统中的辐射损失，并将该信息反馈给补偿系统，补偿系统补偿损耗并保持投射到基板上的辐射均匀。

    Lithographic apparatus and device manufacturing method
    6.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US07061586B2

    公开(公告)日：2006-06-13

    申请号：US10790257

    申请日：2004-03-02

    申请人： Joost Sytsma ,  Pieter Willem Herman de Jager

    发明人： Joost Sytsma ,  Pieter Willem Herman de Jager

    IPC分类号： G03B27/72 ,  G03B27/42

    CPC分类号： G03F7/70558 ,  G03F7/70208 ,  G03F7/70275 ,  G03F7/70283 ,  G03F7/70291

    摘要： A detector, feedback and compensation system for use with a radiation distribution system for distributing the radiation from a radiation system to two or more arrays of individually controllable elements, each for patterning beams of radiation, which are subsequently projected onto a substrate. The detector determines the radiation lost in the radiation distribution system and feeds this information back to a compensation system, which compensates for the loss and keeps the radiation projected onto the substrate uniform.

    摘要翻译： 一种用于辐射分布系统的检测器，反馈和补偿系统，用于将辐射系统的辐射分配到两个或更多个独立可控元件的阵列，每个用于构图辐射束，其随后投射到衬底上。 检测器确定辐射分布系统中的辐射损失，并将该信息反馈给补偿系统，补偿系统补偿损耗并保持投射到基板上的辐射均匀。

    Lithography apparatus with filters for optimizing uniformity of an image
    7.
    发明授权
    Lithography apparatus with filters for optimizing uniformity of an image 有权
    具有滤光片的平版印刷设备，用于优化图像的均匀性

    公开(公告)号：US06404499B1

    公开(公告)日：2002-06-11

    申请号：US09293000

    申请日：1999-04-16

    申请人： Judocus M. D. Stoeldraijer ,  Jan W. R. Ten Cate ,  Franciscus H. A. G. Fey ,  Joost Sytsma

    发明人： Judocus M. D. Stoeldraijer ,  Jan W. R. Ten Cate ,  Franciscus H. A. G. Fey ,  Joost Sytsma

    IPC分类号： G01B1100

    CPC分类号： G03F7/70191 ,  G03F7/70066 ,  G03F7/70558

    摘要： A lithographic projection apparatus has a correction device for lithographic projection. The lithographic projection apparatus has a projection system that projects a beam of radiation onto a mask. The correction device has a filter unit placed in the path of the beam for varying the spatial intensity of the beam along at least one direction of its cross-section so that the integrated intensity of radiation of mask level is substantially uniform across the entire length or the cross-section.

    摘要翻译： 光刻投影装置具有用于光刻投影的校正装置。 光刻投影装置具有将辐射束投射到掩模上的投影系统。 校正装置具有放置在光束的路径中的滤光器单元，用于沿着其横截面的至少一个方向改变光束的空间强度，使得掩模级的辐射的整体强度在整个长度上基本上是均匀的， 横截面。