公开(公告)号：US06724532B1

公开(公告)日：2004-04-20

申请号：US10339335

申请日：2003-01-10

申请人： Chiun-Lern Fu ,  Tsung-Hsin Lin ,  Hsin-Yih Lin ,  Mao-Hong Lu ,  Deh-Ming Shyu

发明人： Chiun-Lern Fu ,  Tsung-Hsin Lin ,  Hsin-Yih Lin ,  Mao-Hong Lu ,  Deh-Ming Shyu

IPC分类号： G02B2744

CPC分类号： G02B27/0037 ,  G02B13/001 ,  G02B13/003 ,  G02B27/4211

摘要： The present invention discloses a dual-lens hybrid diffractive/refractive imaging system comprising: a first lens including a concave surface and a convex surface; and the second lens including a convex surface and a concave surface. The concave surface of the first lens is an objective surface facing the object. The convex surface faces the convex surface of the second lens, while the concave surface of the second lens faces the charge-coupled device (CCD) through a filter. Any surface of the first lens and the second lens is spheric or aspheric. Moreover, the imaging system comprises at least one diffractive surface, referred to as a hybrid diffractive/refractive surface, formed on any surface of the two lenses. Therefore, aberration is eliminated and image quality is improved without increasing the number of lenses.

摘要翻译： 本发明公开了一种双透镜混合衍射/折射成像系统，包括：第一透镜，包括凹面和凸面; 并且所述第二透镜包括凸面和凹面。 第一透镜的凹面是面向物体的物镜面。 凸面面对第二透镜的凸面，而第二透镜的凹面通过滤光器面对电荷耦合器件（CCD）。 第一透镜和第二透镜的任何表面是球形或​​非球面。 此外，成像系统包括形成在两个透镜的任何表面上的至少一个被称为混合衍射/折射表面的衍射表面。 因此，不增加透镜数量就能消除像差并提高图像质量。

公开(公告)号：US08537213B2

公开(公告)日：2013-09-17

申请号：US12979353

申请日：2010-12-28

申请人： Deh-Ming Shyu ,  Yi-Sha Ku ,  Wei-Te Hsu

发明人： Deh-Ming Shyu ,  Yi-Sha Ku ,  Wei-Te Hsu

IPC分类号： H04N7/18 ,  G01B11/02 ,  G01B11/00 ,  G01B9/02

CPC分类号： H01L22/12 ,  G01N21/956 ,  G01N2021/95653

摘要： A method for measuring a via bottom profile is disclosed for obtaining a profile of a bottom of a via in a front side of a substrate. In this method, an infrared (IR) light source is transmitted from the back of the substrate to the bottom of the via through an objective by using an IR-microscope, and lights scattered from the bottom of the via are acquired by an image capturing device to generate an image, where the image displays a diameter (2Ea) of the via bottom profile and a diameter (2Ec) of a maximum receivable base area of the via for the IR-microscope. Thereafter, by using an elliptic equation, a minor axis radius thereof (Eb) is obtained, and thus the via bottom profile is obtained from a radius (Ea) of the via bottom profile and the minor axis radius (Eb) of the elliptic equation.

摘要翻译： 公开了一种用于测量通孔底部轮廓的方法，用于获得在基板正面中的通孔底部的轮廓。 在该方法中，红外（IR）光源通过使用IR显微镜通过物镜从基板的背面透射到通孔的底部，并且通过图像捕获获得从通孔底部散射的光 用于生成图像的装置，其中图像显示通孔底部轮廓的直径（2Ea）和用于IR显微镜的通孔的最大可接收基座面积的直径（2Ec）。 此后，通过使用椭圆方程，获得其短轴半径（Eb），因此从通孔底部轮廓的半径（Ea）和椭圆方程的短轴半径（Eb）获得通孔底部轮廓 。

公开(公告)号：US20090116035A1

公开(公告)日：2009-05-07

申请号：US12003164

申请日：2007-12-20

申请人： Deh-Ming Shyu ,  Yi-Sha Ku

发明人： Deh-Ming Shyu ,  Yi-Sha Ku

IPC分类号： G02B9/00

CPC分类号： G03F7/70633 ,  H01L23/544 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/00

摘要： A structure for overlay measurement is provided in the present invention, using the diffraction characteristics on the boundary portion between two microstructures formed on each of two material layers. The optical intensity distribution on the boundary portion between microstructures formed on the two overlaid material layers respectively are measured by an optical microscope to obtain the overlay error between the two overlaid material layers. In addition, the present invention also provides a method for overlay measurement using the structure for overlay measurement, wherein a merit relation based on the optical intensity distribution on the boundary portion between different microstructures is determined. The merit relation can be used to analyze the overlay error to improve the efficiency and accuracy of on-line error measurement.

摘要翻译： 在本发明中，使用在两个材料层中的每一个上形成的两个微结构之间的边界部分上的衍射特性，提供了用于覆盖测量的结构。 通过光学显微镜测量分别在两个叠层材料层上形成的微观结构之间的边界部分上的光强度分布，以获得两个重叠材料层之间的重叠误差。 此外，本发明还提供了一种使用覆盖测量结构进行覆盖测量的方法，其中确定基于不同微结构之间的边界部分上的光强度分布的优值关系。 优点关系可用于分析叠加误差，提高在线误差测量的效率和准确性。

公开(公告)号：US08319971B2

公开(公告)日：2012-11-27

申请号：US12187057

申请日：2008-08-06

申请人： Deh-Ming Shyu ,  Sen-Yih Chou ,  Yi-Sha Ku

发明人： Deh-Ming Shyu ,  Sen-Yih Chou ,  Yi-Sha Ku

IPC分类号： G01N21/55

CPC分类号： G02B21/0016 ,  G01N21/47 ,  G01N21/9501 ,  G02B21/082 ,  G02F1/1313 ,  G02F2001/291 ,  G02F2001/294 ,  G02F2203/12 ,  G02F2203/28

摘要： The present invention provides a scatterfield microscopical measuring method and apparatus, which combine scatterfield detecting technology into microscopical device so that the microscopical device is capable of measuring the sample whose dimension is under the limit of optical diffraction. The scatterfield microscopical measuring apparatus is capable of being controlled to focus uniform and collimated light beam on back focal plane of an objective lens disposed above the sample. By changing the position of the focus position on the back focal plane, it is capable of being adjusted to change the incident angle with respect to the sample.

摘要翻译： 本发明提供了一种将散射场检测技术结合到微观器件中的散射场微观测量方法和装置，使得微观器件能够测量尺寸在光学衍射极限下的样品。 散射场显微测量装置能够被控制以将均匀和准直的光束聚焦在设置在样品上方的物镜的后焦平面上。 通过改变焦点位置在后焦平面上的位置，能够调整相对于样品的入射角度的变化。

公开(公告)号：US07864324B2

公开(公告)日：2011-01-04

申请号：US12352069

申请日：2009-01-12

申请人： Deh-Ming Shyu ,  Yi-Sha Ku ,  Sen-Yih Chou ,  Shu-Ping Dong ,  Wei-Te Hsu

发明人： Deh-Ming Shyu ,  Yi-Sha Ku ,  Sen-Yih Chou ,  Shu-Ping Dong ,  Wei-Te Hsu

IPC分类号： G01N21/47

CPC分类号： G01N21/4788 ,  G01B2210/56 ,  G01N21/474 ,  G01N21/956 ,  G01N2201/0636 ,  G03F7/70625

摘要： A reflective scatterometer capable of measuring a sample is provided. The reflective scatterometer includes a paraboloid mirror, a light source, a first reflector, a second reflector and a detector. The paraboloid mirror has an optical axis and a parabolic surface, wherein the sample is disposed on the focal point of the parabolic surface and the normal direction of the sample is parallel with the optical axis. A collimated beam generated from the light source is reflected by the first reflector to the parabolic surface and then is reflected by the parabolic surface to the sample to form a first diffracted beam. The first diffracted beam is reflected by the parabolic surface to the second reflector and is then reflected by the second reflector to the detector.

摘要翻译： 提供了能够测量样品的反射式散射仪。 反射式散射仪包括抛物面镜，光源，第一反射器，第二反射器和检测器。 抛物面镜具有光轴和抛物面，其中样品设置在抛物面的焦点上，并且样品的法线方向与光轴平行。 从光源产生的准直光束被第一反射器反射到抛物线表面，然后被抛物面反射到样品以形成第一衍射光束。 第一衍射光束被抛物面反射到第二反射器，然后被第二反射器反射到检测器。

公开(公告)号：US20100007881A1

公开(公告)日：2010-01-14

申请号：US12187057

申请日：2008-08-06

申请人： Deh-Ming Shyu ,  Sen-Yih Chou ,  Yi-Sha Ku

发明人： Deh-Ming Shyu ,  Sen-Yih Chou ,  Yi-Sha Ku

IPC分类号： G01J4/00 ,  G02B21/06

CPC分类号： G02B21/0016 ,  G01N21/47 ,  G01N21/9501 ,  G02B21/082 ,  G02F1/1313 ,  G02F2001/291 ,  G02F2001/294 ,  G02F2203/12 ,  G02F2203/28

摘要： The present invention provides a scatterfield microscopical measuring method and apparatus, which combine scatterfield detecting technology into microscopical device so that the microscopical device is capable of measuring the sample whose dimension is under the limit of optical diffraction. The scatterfield microscopical measuring apparatus is capable of being controlled to focus uniform and collimated light beam on back focal plane of an objective lens disposed above the sample. By changing the position of the focus position on the back focal plane, it is capable of being adjusted to change the incident angle with respect to the sample.

摘要翻译： 本发明提供了一种将散射场检测技术结合到微观器件中的散射场微观测量方法和装置，使得微观器件能够测量尺寸在光学衍射极限下的样品。 散射场显微测量装置能够被控制以将均匀和准直的光束聚焦在设置在样品上方的物镜的后焦平面上。 通过改变焦点位置在后焦平面上的位置，能够调整相对于样品的入射角度的变化。

公开(公告)号：US20120147171A1

公开(公告)日：2012-06-14

申请号：US12979353

申请日：2010-12-28

申请人： Deh-Ming Shyu ,  Yi-Sha Ku ,  Wei-Te Hsu

发明人： Deh-Ming Shyu ,  Yi-Sha Ku ,  Wei-Te Hsu

IPC分类号： H04N7/18

CPC分类号： H01L22/12 ,  G01N21/956 ,  G01N2021/95653

摘要： A method for measuring a via bottom profile is disclosed for obtaining a profile of a bottom of a via in a front side of a substrate. In this method, an infrared (IR) light source is transmitted from the back of the substrate to the bottom of the via through an objective by using an IR-microscope, and lights scattered from the bottom of the via are acquired by an image capturing device to generate an image, where the image displays a diameter (2Ea) of the via bottom profile and a diameter (2Ec) of a maximum receivable base area of the via for the IR-microscope. Thereafter, by using an elliptic equation, a minor axis radius thereof (Eb) is obtained, and thus the via bottom profile is obtained from a radius (Ea) of the via bottom profile and the minor axis radius (Eb) of the elliptic equation.

摘要翻译： 公开了一种用于测量通孔底部轮廓的方法，用于获得在基板正面中的通孔底部的轮廓。 在该方法中，红外（IR）光源通过使用IR显微镜通过物镜从基板的背面透射到通孔的底部，并且通过图像捕获获得从通孔的底部散射的光 用于生成图像的装置，其中图像显示通孔底部轮廓的直径（2Ea）和用于IR显微镜的通孔的最大可接收基座面积的直径（2Ec）。 此后，通过使用椭圆方程，获得其短轴半径（Eb），从而从通孔底部轮廓的半径（Ea）和椭圆方程的短轴半径（Eb）获得通孔底部轮廓 。

公开(公告)号：US07872741B2

公开(公告)日：2011-01-18

申请号：US12071362

申请日：2008-02-20

申请人： Sen-Yih Chou ,  Shu-Ping Dong ,  Wei-Te Hsu ,  Deh-Ming Shyu ,  Chia-Lin Wu ,  Yi-Sha Ku ,  Chang-Hai Sung

发明人： Sen-Yih Chou ,  Shu-Ping Dong ,  Wei-Te Hsu ,  Deh-Ming Shyu ,  Chia-Lin Wu ,  Yi-Sha Ku ,  Chang-Hai Sung

IPC分类号： G01N21/00

CPC分类号： G01N21/47 ,  G01N2021/4709 ,  G02B21/02 ,  G02B21/06

摘要： A method and an apparatus are disclosed for scatterfield microscopical measurement. The method integrates a scatterometer and a bright-field microscope for enabling the measurement precision to be better than the optical diffraction limit. With the aforesaid method and apparatus, a detection beam is generated by performing a process on a uniform light using an LCoS (liquid crystal on silicon) or a DMD (digital micro-mirror device) which is to directed to image on the back focal plane of an object to be measured, and then scattered beams resulting from the detection beam on the object's surface are focused on a plane to form an optical signal which is to be detected by an array-type detection device. The detection beam can be oriented by the modulation device to illuminate on the object at a number of different angles, by which zero order or higher order diffraction intensities at different positions of the plane at different incident angles can be collected.

摘要翻译： 公开了用于散射场微观测量的方法和装置。 该方法集成了散射仪和明视野显微镜，使测量精度优于光学衍射极限。 利用上述方法和装置，通过使用LCoS（硅上液晶）或DMD（数字微镜装置）进行均匀光的处理来生成检测光束，DMD（数字微镜装置）是指向后焦平面上的图像 测量对象物体上的检测光束产生的散射光束聚焦在平面上，形成由阵列型检测装置检测出的光信号。 检测光束可以通过调制装置定向，以多个不同的角度对物体进行照射，从而可以收集在不同入射角处的平面不同位置的零级或更高阶衍射强度。

公开(公告)号：US07652776B2

公开(公告)日：2010-01-26

申请号：US12003164

申请日：2007-12-20

申请人： Deh-Ming Shyu ,  Yi-Sha Ku

发明人： Deh-Ming Shyu ,  Yi-Sha Ku

IPC分类号： G01B11/14 ,  G01B11/00

CPC分类号： G03F7/70633 ,  H01L23/544 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/00

摘要： A structure for overlay measurement is provided in the present invention, using the diffraction characteristics on the boundary portion between two microstructures formed on each of two material layers. The optical intensity distribution on the boundary portion between microstructures formed on the two overlaid material layers respectively are measured by an optical microscope to obtain the overlay error between the two overlaid material layers. In addition, the present invention also provides a method for overlay measurement using the structure for overlay measurement, wherein a merit relation based on the optical intensity distribution on the boundary portion between different microstructures is determined. The merit relation can be used to analyze the overlay error to improve the efficiency and accuracy of on-line error measurement.

摘要翻译： 在本发明中，使用在两个材料层中的每一个上形成的两个微结构之间的边界部分上的衍射特性，提供了用于覆盖测量的结构。 通过光学显微镜测量分别在两个叠层材料层上形成的微观结构之间的边界部分上的光强度分布，以获得两个重叠材料层之间的重叠误差。 此外，本发明还提供了一种使用覆盖测量结构进行覆盖测量的方法，其中确定基于不同微结构之间的边界部分上的光强度分布的优值关系。 优点关系可用于分析叠加误差，提高在线误差测量的效率和准确性。

公开(公告)号：US20090079969A1

公开(公告)日：2009-03-26

申请号：US12071362

申请日：2008-02-20

申请人： Sen-Yih Chou ,  Shu-Ping Dong ,  Wei-Te Hsu ,  Deh-Ming Shyu ,  Chia-Lin Wu ,  Yi-Sha Ku ,  Chang-Hai Sung

发明人： Sen-Yih Chou ,  Shu-Ping Dong ,  Wei-Te Hsu ,  Deh-Ming Shyu ,  Chia-Lin Wu ,  Yi-Sha Ku ,  Chang-Hai Sung

IPC分类号： G01N21/00

CPC分类号： G01N21/47 ,  G01N2021/4709 ,  G02B21/02 ,  G02B21/06

摘要： A method and an apparatus are disclosed for scatterfield microscopical measurement. The method integrates a scatterometer and a bright-field microscope for enabling the measurement precision to be better than the optical diffraction limit. With the aforesaid method and apparatus, a detection beam is generated by performing a process on a uniform light using an LCoS (liquid crystal on silicon) or a DMD (digital micro-mirror device) which is to directed to image on the back focal plane of an object to be measured, and then scattered beams resulting from the detection beam on the object's surface are focused on a plane to form an optical signal which is to be detected by an array-type detection device. The detection beam can be oriented by the modulation device to illuminate on the object at a number of different angles, by which zero order or higher order diffraction intensities at different positions of the plane at different incident angles can be collected.

摘要翻译： 公开了用于散射场微观测量的方法和装置。 该方法集成了散射仪和明视野显微镜，使测量精度优于光学衍射极限。 利用上述方法和装置，通过使用LCoS（硅上液晶）或DMD（数字微镜装置）进行均匀光的处理来生成检测光束，DMD（数字微镜装置）是指向后焦平面上的图像 测量对象物体上的检测光束产生的散射光束聚焦在平面上，形成由阵列型检测装置检测出的光信号。 检测光束可以通过调制装置定向，以多个不同的角度对物体进行照射，从而可以收集在不同入射角处的平面不同位置的零级或更高阶衍射强度。