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1.发明授权公开(公告)号：US08778115B2
公开(公告)日：2014-07-15
申请号：US12969365
申请日：2010-12-15
申请人： Choong-Ho Lee , Yoon-Chan Oh , Seung-Ho Choi , Suk-Won Jung , Jung-Soo Rhee
发明人： Choong-Ho Lee , Yoon-Chan Oh , Seung-Ho Choi , Suk-Won Jung , Jung-Soo Rhee
IPC分类号： B29C65/78
CPC分类号： C23C14/042 , B23K26/0846 , H01L51/56
摘要： A method of efficiently manufacturing a large-sized mask is disclosed. In one embodiment, the method includes: 1) providing a first mask member comprising i) a first pattern unit having a plurality of slits, ii) a first buffer unit spaced apart from the first pattern unit, and iii) a first bonding unit interconnecting the first pattern unit and the first buffer unit and 2) providing a second mask member comprising i) a second pattern unit having a plurality of slits, ii) a second buffer unit spaced apart from the second pattern unit, and iii) a second bonding unit interconnecting the second pattern unit and the second buffer unit. The method may further include contacting the first bonding unit and the second bonding unit; and connecting the first mask member to the second mask member while tensile forces are applied to the first mask member and the second mask member.
摘要翻译： 公开了一种有效地制造大尺寸掩模的方法。 在一个实施例中，该方法包括：1）提供第一掩模构件，其包括i）具有多个狭缝的第一图案单元，ii）与第一图案单元间隔开的第一缓冲单元，以及iii） 第一图案单元和第一缓冲单元，以及2）提供第二掩模构件，其包括i）具有多个狭缝的第二图案单元，ii）与第二图案单元间隔开的第二缓冲单元，以及iii）第二粘合 将第二图案单元和第二缓冲单元互连的单元。 该方法还可以包括使第一接合单元和第二接合单元接触; 以及当所述第一掩模构件和所述第二掩模构件施加张力时，将所述第一掩模构件连接到所述第二掩模构件。
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2.发明申请公开(公告)号：US20110139357A1
公开(公告)日：2011-06-16
申请号：US12969365
申请日：2010-12-15
申请人： Choong-Ho Lee , Yoon-Chan Oh , Seung-Ho Choi , Suk-Won Jung , Jung-Soo Rhee
发明人： Choong-Ho Lee , Yoon-Chan Oh , Seung-Ho Choi , Suk-Won Jung , Jung-Soo Rhee
CPC分类号： C23C14/042 , B23K26/0846 , H01L51/56
摘要： A method of efficiently manufacturing a large-sized mask is disclosed. In one embodiment, the method includes: 1) providing a first mask member comprising i) a first pattern unit having a plurality of slits, ii) a first buffer unit spaced apart from the first pattern unit, and iii) a first bonding unit interconnecting the first pattern unit and the first buffer unit and 2) providing a second mask member comprising i) a second pattern unit having a plurality of slits, ii) a second buffer unit spaced apart from the second pattern unit, and iii) a second bonding unit interconnecting the second pattern unit and the second buffer unit. The method may further include contacting the first bonding unit and the second bonding unit; and connecting the first mask member to the second mask member while tensile forces are applied to the first mask member and the second mask member.
摘要翻译： 公开了一种有效地制造大尺寸掩模的方法。 在一个实施例中，该方法包括：1）提供第一掩模构件，其包括i）具有多个狭缝的第一图案单元，ii）与第一图案单元间隔开的第一缓冲单元，以及iii） 第一图案单元和第一缓冲单元，以及2）提供第二掩模构件，其包括i）具有多个狭缝的第二图案单元，ii）与第二图案单元间隔开的第二缓冲单元，以及iii）第二粘合 将第二图案单元和第二缓冲单元互连的单元。 该方法还可以包括使第一接合单元和第二接合单元接触; 以及当所述第一掩模构件和所述第二掩模构件施加张力时，将所述第一掩模构件连接到所述第二掩模构件。
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3.发明申请Deposition apparatus and method of manufacturing organic light emitting device using the same 审中-公开使用该有机发光装置的沉积装置和制造方法公开(公告)号：US20110129596A1
公开(公告)日：2011-06-02
申请号：US12801601
申请日：2010-06-16
申请人： Jung-Min Lee , Choong-Ho Lee , Yoon-Chan Oh , Soo-Jin Park
发明人： Jung-Min Lee , Choong-Ho Lee , Yoon-Chan Oh , Soo-Jin Park
CPC分类号： H01L51/0008
摘要： A deposition apparatus that improves deposition characteristics and the uniformity of a deposited layer, and a method of manufacturing an organic light emitting device using the deposition apparatus. The deposition apparatus includes: a base; a heat blocking layer formed on the base; a heat emitting layer patterned into stripes and formed on the heat blocking layer to heat a deposition material to be deposited; and a barrier rib formed and patterned on the heat blocking layer to define a space in which the deposition material is disposed.
摘要翻译： 改善沉积特性和沉积层的均匀性的沉积设备，以及使用沉积设备制造有机发光器件的方法。 沉积设备包括：基底; 形成在基底上的热阻层; 形成条纹并形成在热阻层上的发热层，以加热待沉积的沉积材料; 以及在所述热阻层上形成和图案化以限定其中设置所述沉积材料的空间的障壁。
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公开(公告)号：US09174250B2
公开(公告)日：2015-11-03
申请号：US13208261
申请日：2011-08-11
申请人： Jung-Min Lee , Choong-Ho Lee , Yoon-Chan Oh , Hee-Seong Jeong
发明人： Jung-Min Lee , Choong-Ho Lee , Yoon-Chan Oh , Hee-Seong Jeong
CPC分类号： B08B7/0035 , B08B7/0042 , C23C14/042 , C23C14/564 , H01L51/0025 , H01L51/56
摘要： A method of cleaning off organic deposition material accumulated on a mask includes forming an organic deposition material pattern on a substrate using the mask, which includes a plurality of slots, in a deposition chamber including a deposition source; transporting the mask to a stock chamber that is maintained at a vacuum and adjacent to the deposition chamber; and partially cleaning off the organic deposition material accumulated along the boundaries of the slots of the mask in the stock chamber. A system to clean off an organic deposition material accumulated on a mask having a plurality of slots, includes a deposition chamber including a deposition source; and a stock chamber that is maintained at substantially the same vacuum as the deposition chamber and includes a cleaning device that cleans off the organic deposition material accumulated on the mask.
摘要翻译： 清理积聚在掩模上的有机沉积材料的方法包括：在包括沉积源的沉积室中，使用包括多个槽的掩模在基板上形成有机沉积材料图案; 将掩模运送到保持在真空并邻近沉积室的储存室; 并且部分地清除沿着储存室中的掩模的槽的边界积聚的有机沉积材料。 一种清除积聚在具有多个狭缝的掩模上的有机沉积材料的系统，包括：沉积室，包括沉积源; 以及保持在与沉积室基本相同的真空的储存室，并且包括清除积聚在掩模上的有机沉积材料的清洁装置。
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5.发明授权Mask frame assembly for thin film deposition and method of assembling the same 有权用于薄膜沉积的面罩框架组件及其组装方法公开(公告)号：US08707894B2
公开(公告)日：2014-04-29
申请号：US12796509
申请日：2010-06-08
申请人： Choong-Ho Lee , Yoon-Chan Oh , Jung-Min Lee
发明人： Choong-Ho Lee , Yoon-Chan Oh , Jung-Min Lee
IPC分类号： B05C11/00
CPC分类号： C23C14/042 , H01L51/0011 , H01L51/56
摘要： A mask frame assembly for thin film deposition, the mask frame assembly including a frame having an opening; a plurality of masks having deposition patterns, the masks being fixed to the frame such that the deposition patterns extend over the opening; and a balance stick being fixed to the frame such that the balance stick is between two of the plurality of masks, the balance stick made from an elastically tensile material.
摘要翻译： 一种用于薄膜沉积的面罩框架组件，所述面罩框架组件包括具有开口的框架; 具有沉积图案的多个掩模，所述掩模固定到所述框架，使得所述沉积图案在所述开口上延伸; 以及平衡杆，其被固定到所述框架上，使得所述平衡杆在所述多个掩模中的两个之间，所述平衡杆由弹性拉伸材料制成。
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6.发明授权公开(公告)号：US08536057B2
公开(公告)日：2013-09-17
申请号：US12797858
申请日：2010-06-10
申请人： Choong-Ho Lee , Yoon-Chan Oh , Jung-Min Lee
发明人： Choong-Ho Lee , Yoon-Chan Oh , Jung-Min Lee
IPC分类号： H01L21/44
CPC分类号： C23C14/12 , C23C14/042 , C23C14/243
摘要： A thin film deposition apparatus and a method of manufacturing an organic light emitting device (OLED) using the thin film deposition apparatus. The thin film deposition apparatus includes a deposition source; a first nozzle in which a plurality of first slits are formed in one direction; a second nozzle in which a plurality of second slits are formed in the one direction; a second nozzle frame combined with the second nozzle to support the second nozzle; a first barrier wall assembly including a plurality of first barrier walls disposed in the one direction to form a space between the first nozzle and the second nozzle; and a second barrier wall assembly having a plurality of second barrier walls disposed in the one direction and a second barrier wall frame to support the second barrier walls, the second barrier wall assembly disposed at one side of the first barrier wall assembly, wherein the second barrier walls are mounted on the second barrier wall frame in the one direction and the second barrier walls slide on the second barrier wall frame.
摘要翻译： 一种薄膜沉积设备和使用该薄膜沉积设备制造有机发光器件（OLED）的方法。 薄膜沉积设备包括沉积源; 第一喷嘴，其中在一个方向上形成有多个第一狭缝; 第二喷嘴，其中在所述一个方向上形成有多个第二狭缝; 与所述第二喷嘴结合以支撑所述第二喷嘴的第二喷嘴框架; 第一阻挡壁组件，其包括沿所述一个方向设置的多个第一阻挡壁，以在所述第一喷嘴和所述第二喷嘴之间形成空间; 以及第二阻挡壁组件，其具有沿所述一个方向设置的多个第二阻挡壁和用于支撑所述第二阻挡壁的第二阻挡壁框架，所述第二阻挡壁组件设置在所述第一阻挡壁组件的一侧，其中所述第二阻挡壁组件 阻挡壁沿一个方向安装在第二阻挡壁框架上，第二阻挡壁在第二阻挡壁框架上滑动。
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7.发明申请公开(公告)号：US20100330712A1
公开(公告)日：2010-12-30
申请号：US12797858
申请日：2010-06-10
申请人： Choong-Ho LEE , Yoon-Chan Oh , Jung-Min Lee
发明人： Choong-Ho LEE , Yoon-Chan Oh , Jung-Min Lee
IPC分类号： H01L51/56
CPC分类号： C23C14/12 , C23C14/042 , C23C14/243
摘要： A thin film deposition apparatus and a method of manufacturing an organic light emitting device (OLED) using the thin film deposition apparatus. The thin film deposition apparatus includes a deposition source; a first nozzle in which a plurality of first slits are formed in one direction; a second nozzle in which a plurality of second slits are formed in the one direction; a second nozzle frame combined with the second nozzle to support the second nozzle; a first barrier wall assembly including a plurality of first barrier walls disposed in the one direction to form a space between the first nozzle and the second nozzle; and a second barrier wall assembly having a plurality of second barrier walls disposed in the one direction and a second barrier wall frame to support the second barrier walls, the second barrier wall assembly disposed at one side of the first barrier wall assembly, wherein the second barrier walls are mounted on the second barrier wall frame in the one direction and the second barrier walls slide on the second barrier wall frame.
摘要翻译： 一种薄膜沉积设备和使用该薄膜沉积设备制造有机发光器件（OLED）的方法。 薄膜沉积设备包括沉积源; 第一喷嘴，其中在一个方向上形成有多个第一狭缝; 第二喷嘴，其中在所述一个方向上形成有多个第二狭缝; 与所述第二喷嘴结合以支撑所述第二喷嘴的第二喷嘴框架; 第一阻挡壁组件，其包括沿所述一个方向设置的多个第一阻挡壁，以在所述第一喷嘴和所述第二喷嘴之间形成空间; 以及第二阻挡壁组件，其具有沿所述一个方向设置的多个第二阻挡壁和用于支撑所述第二阻挡壁的第二阻挡壁框架，所述第二阻挡壁组件设置在所述第一阻挡壁组件的一侧，其中所述第二阻挡壁组件 阻挡壁沿一个方向安装在第二阻挡壁框架上，第二阻挡壁在第二阻挡壁框架上滑动。
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公开(公告)号：US20140033975A1
公开(公告)日：2014-02-06
申请号：US13918352
申请日：2013-06-14
申请人： Yoon-Chan Oh , Choong-Ho Lee , Da-Hee Jeong
发明人： Yoon-Chan Oh , Choong-Ho Lee , Da-Hee Jeong
IPC分类号： H01L21/02
CPC分类号： H01L21/02104 , B05C21/005 , C23C14/042
摘要： A frame and a mask assembly having the same. The frame supports both ends of each unit mask, each unit mask applying a tensile force in a first direction. The frame includes a frame main body part forming an opening exposing the unit mask, and a first through hole formed by passing through the frame main body part.
摘要翻译： 具有相同的框架和面罩组件。 框架支撑每个单元掩模的两端，每个单元掩模在第一方向施加拉力。 框架包括形成露出单元掩模的开口的框架主体部分和通过框架主体部分形成的第一通孔。
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公开(公告)号：US08531349B2
公开(公告)日：2013-09-10
申请号：US12382556
申请日：2009-03-18
申请人： Yoon-Chan Oh , Chan-Kyoung Moon , Kyoung-Soo Lee , Min-Hyeng Lee , Seon-Hee Kim , Gun-Mo Kim , Choong-Ho Lee , Byung-Hee Kim , Kuen-Dong Ha
发明人： Yoon-Chan Oh , Chan-Kyoung Moon , Kyoung-Soo Lee , Min-Hyeng Lee , Seon-Hee Kim , Gun-Mo Kim , Choong-Ho Lee , Byung-Hee Kim , Kuen-Dong Ha
IPC分类号： G09G5/00
CPC分类号： G06F1/1601 , G02F2001/133317 , G02F2001/133342 , G06F1/1616 , G06F1/1637 , G06F1/1647 , G09G2300/023 , H01L25/048 , H01L27/3267 , H01L27/3281 , H01L2924/0002 , H01L2924/00
摘要： A dual display module having a first display panel and a second display panel, the dual display module including a bezel arranged between the first display panel and the second display panel, and having a penetration area between the first display panel and the second display panel; and a supporting member arranged between the bezel and the second display panel and supporting the second display panel, the supporting member having at least one protrusion unit that protrudes through the penetration area to face the first display panel.
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公开(公告)号：US20100310759A1
公开(公告)日：2010-12-09
申请号：US12795896
申请日：2010-06-08
申请人： Jung-Min Lee , Choong-Ho Lee , Yoon-Chan Oh , Hee-Seong Jeong
发明人： Jung-Min Lee , Choong-Ho Lee , Yoon-Chan Oh , Hee-Seong Jeong
CPC分类号： C23C14/042 , B08B7/0035 , B08B7/0042 , C23C14/564 , H01L51/56
摘要： A method of cleaning off organic deposition material accumulated on a mask includes forming an organic deposition material pattern on a substrate using the mask, which includes a plurality of slots, in a deposition chamber including a deposition source; transporting the mask to a stock chamber that is maintained at a vacuum and adjacent to the deposition chamber; and partially cleaning off the organic deposition material accumulated along the boundaries of the slots of the mask in the stock chamber. A system to clean off an organic deposition material accumulated on a mask having a plurality of slots, includes a deposition chamber including a deposition source; and a stock chamber that is maintained at substantially the same vacuum as the deposition chamber and includes a cleaning device that cleans off the organic deposition material accumulated on the mask.
摘要翻译： 清理积聚在掩模上的有机沉积材料的方法包括：在包括沉积源的沉积室中，使用包括多个槽的掩模在基板上形成有机沉积材料图案; 将掩模运送到保持在真空并邻近沉积室的储存室; 并且部分地清除沿着储存室中的掩模的槽的边界积聚的有机沉积材料。 一种清除积聚在具有多个狭缝的掩模上的有机沉积材料的系统，包括：沉积室，包括沉积源; 以及保持在与沉积室基本相同的真空的储存室，并且包括清除积聚在掩模上的有机沉积材料的清洁装置。
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