Combined ultra-fast x-ray and optical system for thin film measurements
    1.
    发明申请
    Combined ultra-fast x-ray and optical system for thin film measurements 审中-公开
    组合的超快速x射线和光学系统用于薄膜测量

    公开(公告)号:US20060256916A1

    公开(公告)日:2006-11-16

    申请号:US11129282

    申请日:2005-05-13

    IPC分类号: G01N23/20

    CPC分类号: G01N23/20

    摘要: A system comprising a means for generating an optical pump beam pulse and for directing the optical pump beam pulse to a first area of a surface of a sample having a plurality of film layers to generate an acoustic signal, a means for generating an x-ray probe pulse and for directing the x-ray probe pulse to a second area of the surface, a means for detecting an intensity of a diffracted x-ray probe pulse the intensity varying in response to the acoustic signal to form a probe pulse response signal, and a means for calculating an expected transient response to a theoretical acoustic signal propagated through a model of the sample and fitting the probe pulse response to the transient response to derive at least one characteristic of the sample.

    摘要翻译: 一种系统,包括用于产生光泵浦波束脉冲并用于将光泵浦波束脉冲引导到具有多个膜层的样品的表面的第一区域以产生声信号的装置,用于产生X射线 探针脉冲并用于将X射线探针脉冲引导到表面的第二区域;用于检测衍射X射线探针脉冲的强度的装置,该强度响应于声信号而变化,以形成探针脉冲响应信号, 以及用于计算通过样本模型传播的理论声学信号的预期瞬态响应的装置,并将探针脉冲响应拟合到瞬态响应以导出样本的至少一个特性。

    Method and apparatus for decreasing thermal loading and roughness sensitivity in a photoacoustic film thickness measurement system

    公开(公告)号:US06504618B2

    公开(公告)日:2003-01-07

    申请号:US10092866

    申请日:2002-03-06

    IPC分类号: G01B1106

    CPC分类号: G01N29/2418 G01B11/0666

    摘要: Disclosed are methods and apparatus for reducing thermal loading of a film disposed on a surface of a sample, such as a semiconductor wafer, while obtaining a measurement of a thickness of the film in an area about a measurement site. The method includes steps of (a) bringing an optical assembly of the measurement system into focus; (b) aligning a beam spot with the measurement site; (c) turning on one of a dither EOM or a dither AOM or a piezo-electric dither assembly to sweep the beam spot in an area about the measurement site, thereby reducing the thermal loading within the measurement site; (d) making a measurement by obtaining a signal representing an average for the film under the area; (e) recording the measurement data; and (f) analyzing the measurement data to determine an average film thickness in the measurement area.

    Metrology system with spectroscopic ellipsometer and photoacoustic measurements
    3.
    发明授权
    Metrology system with spectroscopic ellipsometer and photoacoustic measurements 有权
    光谱椭偏仪和光声测量的计量系统

    公开(公告)号:US07253887B2

    公开(公告)日:2007-08-07

    申请号:US11343717

    申请日:2006-01-30

    IPC分类号: G01N21/00

    摘要: A photoacoustic system with ellipsometer, where the ellipsometer includes a laser light source for generating an incident beam, an element for focusing the incident beam on a sample, a unit for measuring the change in amplitude of the incident beam on reflection and a unit for measuring the phase difference of the incident beam on reflection. The system further includes an element to convert an input narrow spectrum beam generated by the laser light source to a broadband sample measurement beam that is focused onto the sample.

    摘要翻译: 具有椭偏仪的光声系统,其中椭偏仪包括用于产生入射光束的激光光源,用于将入射光束聚焦在样本上的元件,用于测量反射时入射光束的振幅变化的单元和用于测量的单元 入射光束的反射相位差。 该系统还包括将由激光光源产生的输入窄光谱束转换成聚焦到样本上的宽带样品测量光束的元件。

    Metrology system with spectroscopic ellipsometer and photoacoustic measurements
    4.
    发明授权
    Metrology system with spectroscopic ellipsometer and photoacoustic measurements 有权
    光谱椭偏仪和光声测量的计量系统

    公开(公告)号:US07705974B2

    公开(公告)日:2010-04-27

    申请号:US12381477

    申请日:2009-03-11

    IPC分类号: G01N21/00

    摘要: An optical system includes both a microspot broadband spectroscopic ellipsometer and a photoacoustic film thickness measurement system that are supplied laser light by the same laser light source. One of the systems makes a measurement, the result of which is used to adjust a parameter of the other system; e.g. the ellipsometer measures thickness and the photoacoustic system uses the thickness result to measure the speed of sound. In one version, the ellipsometer converts the laser beam to a broad-spectrum beam that provides higher intensity.

    摘要翻译: 光学系统包括通过相同的激光光源提供激光的微波宽带光谱椭偏仪和光声膜厚度测量系统。 其中一个系统进行测量,其结果用于调整另一个系统的参数; 例如 椭偏仪测量厚度,光声系统使用厚度结果来测量声速。 在一个版本中,椭偏仪将激光束转换成提供更高强度的广谱光束。

    Metrology system with spectroscopic ellipsometer and photoacoustic measurements
    5.
    发明申请
    Metrology system with spectroscopic ellipsometer and photoacoustic measurements 有权
    光谱椭偏仪和光声测量的计量系统

    公开(公告)号:US20070268478A1

    公开(公告)日:2007-11-22

    申请号:US11881079

    申请日:2007-07-24

    IPC分类号: G01N21/00 G01J4/00

    摘要: An optical system includes both a microspot broadband spectroscopic ellipsometer and a photoacoustic film thickness measurement system that are supplied laser light by the same laser light source. One of the systems makes a measurement, the result of which is used to adjust a parameter of the other system; e.g. the ellipsometer measures thickness and the photoacoustic system uses the thickness result to measure the speed of sound. In one version, the ellipsometer converts the laser beam to a broad-spectrum beam that provides higher intensity.

    摘要翻译: 光学系统包括通过相同的激光光源提供激光的微波宽带光谱椭偏仪和光声膜厚度测量系统。 其中一个系统进行测量,其结果用于调整另一个系统的参数; 例如 椭偏仪测量厚度,光声系统使用厚度结果来测量声速。 在一个版本中,椭偏仪将激光束转换成提供更高强度的广谱光束。

    Method and apparatus for increasing signal to noise ratio in a photoacoustic film thickness measurement system

    公开(公告)号:US07050178B2

    公开(公告)日:2006-05-23

    申请号:US10194169

    申请日:2002-07-12

    IPC分类号: G01B11/28 G01J4/00

    摘要: An apparatus for improving the signal to noise ratio of measurements of the thickness of layers in a thin film stack uses a photoacoustic measurement system that includes a time differentiation system for inducing a delay in pump beam pulses. The time differentiation system uses, among other things, a birefringent element and other elements to control the polarization of pump beam pulses. Use of the apparatus involves applying a time varying voltage to an electro-optic modulator driver and setting a time differentiation step; or, in another embodiment, applying a time varying voltage to an electro-optic modulator to induce a fixed time delay delta-t between a vertically polarized pulse and a horizontally polarized pulse. The high frequency operation of the system provides for improved determinations of film thickness.

    Metrology system with spectroscopic ellipsometer and photoacoustic measurements
    8.
    发明申请
    Metrology system with spectroscopic ellipsometer and photoacoustic measurements 有权
    光谱椭偏仪和光声测量的计量系统

    公开(公告)号:US20090201502A1

    公开(公告)日:2009-08-13

    申请号:US12381477

    申请日:2009-03-11

    IPC分类号: G01N21/00 G01B11/06

    摘要: An optical system includes both a microspot broadband spectroscopic ellipsometer and a photoacoustic film thickness measurement system that are supplied laser light by the same laser light source. One of the systems makes a measurement, the result of which is used to adjust a parameter of the other system; e.g. the ellipsometer measures thickness and the photoacoustic system uses the thickness result to measure the speed of sound. In one version, the ellipsometer converts the laser beam to a broad-spectrum beam that provides higher intensity.

    摘要翻译: 光学系统包括通过相同的激光光源提供激光的微波宽带光谱椭偏仪和光声膜厚度测量系统。 其中一个系统进行测量,其结果用于调整另一个系统的参数; 例如 椭偏仪测量厚度,光声系统使用厚度结果来测量声速。 在一个版本中,椭偏仪将激光束转换成提供更高强度的广谱光束。

    Metrology system with spectroscopic ellipsometer and photoacoustic measurements
    10.
    发明申请
    Metrology system with spectroscopic ellipsometer and photoacoustic measurements 有权
    光谱椭偏仪和光声测量的计量系统

    公开(公告)号:US20060126057A1

    公开(公告)日:2006-06-15

    申请号:US11343717

    申请日:2006-01-30

    IPC分类号: G01N21/00 G01J4/00

    摘要: A photoacoustic system with ellipsometer, where the ellipsometer includes a laser light source for generating an incident beam, an element for focusing the incident beam on a sample, a unit for measuring the change in amplitude of the incident beam on reflection and a unit for measuring the phase difference of the incident beam on reflection. The system further includes an element to convert an input narrow spectrum beam generated by the laser light source to a broadband sample measurement beam that is focused onto the sample.

    摘要翻译: 具有椭偏仪的光声系统,其中椭偏仪包括用于产生入射光束的激光光源,用于将入射光束聚焦在样本上的元件,用于测量反射时入射光束的振幅变化的单元和用于测量的单元 入射光束的反射相位差。 该系统还包括将由激光光源产生的输入窄光谱束转换成聚焦到样本上的宽带样品测量光束的元件。