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公开(公告)号:US12071709B2
公开(公告)日:2024-08-27
申请号:US18362117
申请日:2023-07-31
申请人: DENSO CORPORATION
摘要: A raw material gas is supplied to a space in which a silicon carbide seed crystal is placed. A silicon carbide single crystal is grown on the seed crystal by keeping a monosilane partial pressure at 4 kPa or more and heating the space to a temperature of 2400° C. to 2700° C. The temperature of the space and supply of the raw material gas are controlled such that a temperature gradient of a growth crystal surface of the silicon carbide single crystal in a radial direction is 0.1° C./mm or less, and a radius of curvature of the growth crystal surface is 4.5 m or more, thereby producing a silicon carbide single crystal ingot having a growth length of 3 mm or more and an internal stress of 10 MPa or less. The ingot is then cut into a silicon carbide single crystal wafer.
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公开(公告)号:US11846040B2
公开(公告)日:2023-12-19
申请号:US17123338
申请日:2020-12-16
IPC分类号: C30B29/36 , C30B25/20 , C01B32/956
CPC分类号: C30B29/36 , C30B25/20 , C01B32/956
摘要: A silicon carbide single crystal contains a heavy metal element having a specific gravity higher than a specific gravity of iron. An addition density of the heavy metal element at least in an outer peripheral portion of the silicon carbide single crystal is set to 1×1015 cm−3 or more.
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