公开(公告)号：US20160039056A1

公开(公告)日：2016-02-11

申请号：US14780994

申请日：2014-03-27

Applicant: DENSO CORPORATION

Inventor： Kazuaki KAFUKU ,  Isao KUROYANAGI ,  Yasutoshi YAMANAKA ,  Ryonosuke TERA ,  Yukihiro SANO

IPC: B23P15/26

CPC classification number: B23P15/26 ,  C23C16/405 ,  C23C16/45555 ,  F28D7/1684 ,  F28D9/0062 ,  F28F3/027 ,  F28F2275/04

Abstract: A method for manufacturing a heat exchanger includes: assembling a plurality of heat exchanger components in an assembly step; and forming a film on surfaces of the heat exchanger components using a chemical vapor deposition method in a film formation step after the assembly step. The film can restrict a formation of a through hole due to corrosion. The film can be restricted from being damaged at a delivery or assembling time, because the film formation step is provided after the assembly step. An occurrence of clogging can be restricted at a minute portion inside of the heat exchanger in the film formation step, because the film is formed using the chemical vapor deposition method.

Abstract translation: 制造热交换器的方法包括：在组装步骤中组装多个热交换器部件; 以及在组装步骤之后的成膜步骤中使用化学气相沉积法在热交换器部件的表面上形成膜。 该膜可以限制由于腐蚀形成的通孔。 由于在组装步骤之后提供成膜步骤，所以可以限制膜在输送或组装时间被损坏。 由于使用化学气相沉积法形成膜，所以在成膜步骤中可以在热交换器的内部的微小部分限制发生堵塞。

公开(公告)号：US20170327943A1

公开(公告)日：2017-11-16

申请号：US15531197

申请日：2015-11-24

Applicant: DENSO CORPORATION

Inventor： Kazuaki KAFUKU ,  Yukihiro SANO ,  Takayuki HAYASHI ,  Manabu TOMISAKA ,  Ryonosuke TERA

IPC: C23C16/02 ,  C23C16/40 ,  C23C16/42 ,  F01N13/16

CPC classification number: C23C16/02 ,  C23C16/0272 ,  C23C16/40 ,  C23C16/42 ,  C23C16/45529 ,  C23C16/45555 ,  F01N13/08 ,  F01N13/16 ,  F01N13/18 ,  F01N2510/08

Abstract: A coating structure includes a base made of metal, a foundation layer provided on the base, and an insulation film provided on the foundation layer. The insulation film includes a plurality of layers, each layer of the plurality of layers being different in material, the plurality of layers being layered alternately with each other. The foundation layer is provided by a method other than a coating method using a surface chemical reaction occurring on the base, and a part of the foundation layer in contact with the base is amorphous. According to this, when a foreign material adheres on the base, the foreign material can be covered by the foundation layer. Since the insulation film is provided on the foundation layer, forming defects of the insulation film caused by the foreign material can be limited.