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公开(公告)号:US20190326066A1
公开(公告)日:2019-10-24
申请号:US16456552
申请日:2019-06-28
发明人: Young Mi Kim , Jong Bok Kim , Jong Gyu Baek , Kyu Soon Shin
IPC分类号: H01G9/20
摘要: The present invention relates to a dye-sensitized solar cell electrode and a dye-sensitized solar cell including the same. A membrane is formed on a surface of a working electrode, thereby preventing a dye from being separated from an oxide semiconductor layer. The membrane is formed on a surface of a counter electrode, thereby enabling electrolyte elements (I−, I3−, etc.) to be passed therethrough while not allowing the dye to be adsorbed. The reliability and efficiency of a dye-sensitized solar cell be improved.
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公开(公告)号:US10280336B2
公开(公告)日:2019-05-07
申请号:US15129416
申请日:2015-03-31
发明人: Kyu Soon Shin , Hee Jung Jung , Seung Sock Choi
摘要: The present invention relates to a coating method for preventing warpage of a substrate, and more specifically, to a coating method for preventing substrate warpage comprising forming two or more coating layers by coating the surface of a substrate with coating compositions having different densities, wherein at least one layer of the two or more coating layers is coated and cured with a coating composition containing a silsesquioxane composite polymer represented by a specific chemical formula, thereby not only preventing substrate warpage but also providing high surface hardness, excellent transparency, scratch resistance, water repellent characteristics, anti-fouling characteristics, anti-fingerprint property, thermal stability and gloss characteristics to the surface of the substrate.
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公开(公告)号:US11787974B2
公开(公告)日:2023-10-17
申请号:US17363105
申请日:2021-06-30
发明人: Weoun Gyuen Moon , Jae Hyun Kim , Kyu Soon Shin , Jong Dai Park , Min Gun Lee , Sung Hoon Jin , Goo Hwa Lee , Gyeong Sook Cho , Jae Hong Yoo
CPC分类号: C09G1/02 , C09K3/1436
摘要: The present disclosure provides chemical-mechanical polishing (CMP) particles exhibiting a high polishing rate and a high polishing quality of generating few defects or scratches due to their modified surface thereof. The present disclosure also provides a polishing slurry composition including the polishing particles.
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公开(公告)号:US11518908B2
公开(公告)日:2022-12-06
申请号:US16473697
申请日:2017-12-28
发明人: Seong Keun Jang , Seong Yeon Oh , Doo Shik Kim , Seung Sock Choi , Dong Jin Nam , Kyu Soon Shin
IPC分类号: C09D183/08 , C08G77/24 , C08K5/52 , C09D183/04 , C09D7/20 , C09D7/47 , C08K3/32 , C09D5/16 , C08K5/521 , C09K3/18
摘要: A water-repellent coating composition, and particularly, a water-repellent coating composition having improved adhesion and durability by including a phosphoric acid or a phosphoric acid-based compound, is provided.
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公开(公告)号:US20210324261A1
公开(公告)日:2021-10-21
申请号:US17360831
申请日:2021-06-28
发明人: Young Mi KIM , Jong Bok Kim , Jong Gyu Baek , Joo Cheol Lee , Kyu Soon Shin
IPC分类号: C09K9/02 , G02F1/1516 , G02F1/1523
摘要: Disclosed are an electrochromic device and a manufacturing method therefor. The disclosed electrochromic device may comprise: a first electrochromic layer made of a first electrochromic agent; and a second electrochromic layer located on at least one surface of the first electrochromic layer and made of at least one of a second electrochromic derivative and a second electrochromic agent.
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