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    COATED OPEN-CELL POLYURETHANE FOAM STRUCTURES WITH THERMAL ABSORPTION CAPABILITIES
    3.
    发明申请
    COATED OPEN-CELL POLYURETHANE FOAM STRUCTURES WITH THERMAL ABSORPTION CAPABILITIES 有权

    公开(公告)号：US20210267382A1

    公开(公告)日：2021-09-02

    申请号：US17266293

    申请日：2019-08-21

    申请人： Dow Global Technologies LLC

    发明人： Kaoru Aou ,  Wenbo Xu ,  Yibei Gu ,  Douglas A. Brune ,  Laura J. Dietsche ,  Marc S. Black

    IPC分类号： A47C27/15 ,  C09D133/08 ,  C09D171/02 ,  A47C21/04 ,  A47C27/00 ,  A47G9/10 ,  B32B5/18 ,  B32B5/32

    摘要： The present disclosure provides for a coated flexible open-cell polyurethane foam structure. The coated flexible open-cell polyurethane foam structure includes a flexible open-cell polyurethane foam having a first major surface and a second major surface opposite the first major surface. The coated flexible open-cell polyurethane foam structure further includes a flexible heat conductive material covering 30 to 90 percent (cov., expressed in %) of a surface area of the first major surface of the flexible open-cell polyurethane foam in a predefined shape to provide one or more gaps exposing the flexible open-cell polyurethane foam between defined edges of the flexible heat conductive material, where each gap of the one or more gaps has a gap width according to Formula I: gap width (mm) ≤−0.196×cov. (%)+20.6 (Formula I) where a total surface area of the one or more gaps provides 70 to 10 percent of the surface area of the first major surface of the flexible open-cell polyurethane foam.

    AEROSOL METHODS FOR MAKING CHEMICAL MECHANICAL PLANARIZATION (CMP) POLISHING PADS
    5.
    发明申请
    AEROSOL METHODS FOR MAKING CHEMICAL MECHANICAL PLANARIZATION (CMP) POLISHING PADS 审中-公开

    公开(公告)号：US20180147689A1

    公开(公告)日：2018-05-31

    申请号：US15365329

    申请日：2016-11-30

    申请人： Dow Global Technologies LLC

    发明人： Adam Broderick ,  Douglas A. Brune

    IPC分类号： B24B37/24

    CPC分类号： B24B37/24

    摘要： The present invention provides methods for making CMP polishing pads or layers therefore, the methods comprising introducing, separately, to a static mixer having a nozzle at its downstream end two solvent free and substantially water free components, a liquid polyol component having a temperature T1 and a liquid isocyanate component having a temperature T2, each under a low gauge pressure of from 5 to 120 kPa (1 to 14 psi), the liquid polyol component comprising one or more polyol, an amine curative; and the liquid isocyanate component comprising one or more polyisocyanate or isocyanate-terminated urethane prepolymer; mixing the two components in the static mixer to form a reaction mixture, discharging a stream of the reaction mixture from the nozzle onto an open mold substrate having a urethane releasing surface, and curing to form a porous polyurethane reaction product.

    AIRLESS ATOMIZING METHODS FOR MAKING CHEMICAL MECHANICAL PLANARIZATION (CMP) POLISHING PADS
    7.
    发明申请
    AIRLESS ATOMIZING METHODS FOR MAKING CHEMICAL MECHANICAL PLANARIZATION (CMP) POLISHING PADS 审中-公开

    公开(公告)号：US20180147688A1

    公开(公告)日：2018-05-31

    申请号：US15365289

    申请日：2016-11-30

    申请人： Dow Global Technologies LLC

    发明人： Adam Broderick ,  Douglas A. Brune

    IPC分类号： B24B37/24

    CPC分类号： B24B37/24

    摘要： The present invention provides methods of making chemical mechanical planarization (CMP) polishing pads comprising introducing, separately, through a side liquid feed port into an internal chamber having a downstream open end a liquid polyol component stream comprising an amine curative at a temperature T1 of from 40 to 90° C. and a liquid isocyanate component stream at a temperature T2 of from 40 to 90° C., each of the two components under a set point pressure of from 13,000 to 24,000 kPa so that the two streams are pointed towards each other at 90 degrees to downstream flow, thereby impingement mixing the two components to form a reaction mixture, discharging a stream of the reaction mixture from the open end of the internal chamber under pressure through a narrow, preferably, round orifice and onto an open mold substrate having a urethane releasing surface, and curing the reaction mixture to form a porous polyurethane reaction product.