System Having a Plurality of Scanning Units of a Position Measuring Device
    1.
    发明申请
    System Having a Plurality of Scanning Units of a Position Measuring Device 有权
    具有位置测量装置的多个扫描单元的系统

    公开(公告)号:US20130208287A1

    公开(公告)日:2013-08-15

    申请号:US13760409

    申请日:2013-02-06

    IPC分类号: G01B11/00

    摘要: In a system for detecting the position of an object in relation to a reference system, the object is arranged so as to be movable in relation to the reference system along at least two orthogonal first and second main movement axes. To record the position of the object in relation to the reference system, a position measuring device includes at least two two-dimensional measuring standards situated along the first main movement axis, and four scanning units for an optical scanning of these measuring standards. In addition, at least four additional supplementary scanning units are provided, which are situated between the four scanning units along the first main movement axis.

    摘要翻译: 在用于检测物体相对于基准系统的位置的系统中,所述物体被布置成沿着至少两个正交的第一和第二主移动轴线可相对于所述基准系统移动。 为了记录物体相对于基准系统的位置,位置测量装置包括沿着第一主移动轴定位的至少两个二维测量标准,以及用于这些测量标准的光学扫描的四个扫描单元。 此外,提供至少四个附加的补充扫描单元,其位于沿着第一主移动轴线的四个扫描单元之间。

    Optical position measuring device

    公开(公告)号:US11644348B2

    公开(公告)日:2023-05-09

    申请号:US17164867

    申请日:2021-02-02

    IPC分类号: G01D5/38 G01B11/00 G01D5/347

    摘要: An optical position measuring device for recording a relative position of two scales includes the scales. The longitudinal extents of the scales are oriented parallel to a first and second measuring direction. A horizontal plane of movement is spanned by these measuring directions. A light source is configured to emit an illumination beam that is split into at least two sub-beam bundles at the first scale. The sub-beam bundles subsequently impinge on the second scale, which is tilted about the direction of the longitudinal extent thereof relative to the horizontal plane of movement, and are back-reflected to impinge again on the first scale and are recombined there such that a resulting signal beam is subsequently propagated toward a detection unit, via which phase-shifted scanning signals are generatable with respect to a relative movement of the scales along a third perpendicular measuring direction and the first or second measuring direction.

    Interferometer
    3.
    发明授权
    Interferometer 有权
    干涉仪

    公开(公告)号:US09188424B2

    公开(公告)日:2015-11-17

    申请号:US14135000

    申请日:2013-12-19

    IPC分类号: G01B9/02

    CPC分类号: G01B9/02059 G01B9/02018

    摘要: An interferometer includes a light source and a beam splitter, via which the beam of rays emitted by the light source is split into a measurement beam and a reference beam. The measurement beam propagates in a measuring arm extending in a first direction between the beam splitter and a measuring reflector. The measuring reflector brings about an offset perpendicular to the direction of incidence between the measurement beam falling on it and the measurement beam reflected back by it. In a reference arm extending in a second direction, the reference beam propagates between the beam splitter and a reference reflector. In addition, the interferometer has a detector system, to which the superposed and recombined measurement beam and reference beam are able to be supplied, and via which a distance-dependent interference signal with respect to the position of the measuring reflector is able to be generated. The measuring reflector in each case includes at least one transmission grating as well as a reflector element.

    摘要翻译: 干涉仪包括光源和分束器,由光源发射的光束通过该分束器被分成测量光束和参考光束。 测量光束在分束器和测量反射器之间沿第一方向延伸的测量臂中传播。 测量反射器产生垂直于落在其上的测量光束与由其反射的测量光束之间的入射方向的偏移的偏移。 在沿第二方向延伸的参考臂中,参考光束在分束器和参考反射器之间传播。 此外,干涉仪具有检测器系统,叠加和重组的测量光束和参考光束能够被提供到该检测器系统,通过该检测器系统能够产生相对于测量反射器的位置的与距离相关的干扰信号 。 每种情况下的测量反射器包括至少一个透射光栅以及反射器元件。

    Optical position-measuring device

    公开(公告)号:US11313672B2

    公开(公告)日:2022-04-26

    申请号:US16869606

    申请日:2020-05-08

    发明人: Thomas Kaelberer

    摘要: An optical position-measuring device for sensing a relative position of two objects, each object being connected to a grating. The optical position-measuring device is configured such that, at one of the gratings, an illumination beam emitted from a light source is split into two sub-beams which, in respective scanning beam paths following the splitting, experience different polarization-optical effects and recombine at one of the gratings. After the differently polarized sub-beams are recombined, a plurality of phase-shifted, displacement-dependent scanning signals are generatable from a resulting signal beam in a detection unit. No separate polarization-optical components are disposed in the scanning beam paths of the sub-beams between splitting and recombination. At least one of the gratings is configured as a polarization grating configured to produce the different polarization-optical effects and such that diffraction orders with different polarization states are produced at each point of incidence on the polarization grating.

    OPTICAL POSITION MEASURING DEVICE

    公开(公告)号:US20210255008A1

    公开(公告)日:2021-08-19

    申请号:US17164867

    申请日:2021-02-02

    IPC分类号: G01D5/38 G01D5/347 G01B11/00

    摘要: An optical position measuring device for recording a relative position of two scales includes the scales. The longitudinal extents of the scales are oriented parallel to a first and second measuring direction. A horizontal plane of movement is spanned by these measuring directions. A light source is configured to emit an illumination beam that is split into at least two sub-beam bundles at the first scale. The sub-beam bundles subsequently impinge on the second scale, which is tilted about the direction of the longitudinal extent thereof relative to the horizontal plane of movement, and are back-reflected to impinge again on the first scale and are recombined there such that a resulting signal beam is subsequently propagated toward a detection unit, via which phase-shifted scanning signals are generatable with respect to a relative movement of the scales along a third perpendicular measuring direction and the first or second measuring direction.

    Optical position measuring instrument
    6.
    发明授权
    Optical position measuring instrument 有权
    光学位置测量仪

    公开(公告)号:US09389100B2

    公开(公告)日:2016-07-12

    申请号:US14075088

    申请日:2013-11-08

    IPC分类号: G01B11/24 G01D5/26 G01D5/347

    CPC分类号: G01D5/26 G01B11/24 G01D5/3473

    摘要: An optical position measuring instrument including a first scale having a first graduation, wherein the first scale is disposed movable in a first measuring direction, and at a first defined position in the first measuring direction, the first scale includes a spatially limited first marking that differs from the first graduation. The optical position measuring instrument further including a second scale having a second graduation, wherein the second scale is disposed movable in a second measuring direction, and at a second defined position, the second scale includes a second reference marking that is usable for generating at least one reference signal at a reference position of the second scale only if the first scale is located in the first defined position.

    摘要翻译: 一种光学位置测量仪器,包括具有第一刻度的第一刻度,其中所述第一刻度尺可在第一测量方向上移动,并且在所述第一测量方向上的第一限定位置处,所述第一刻度尺包括不同的空间有限的第一标记 从第一毕业。 所述光学位置测量仪器还包括具有第二刻度的第二刻度,其中所述第二刻度尺可在第二测量方向上移动,并且在第二限定位置,所述第二刻度尺包括可用于至少产生的第二参考标记 仅在第一标尺位于第一限定位置时在第二刻度的参考位置处的一个参考信号。

    System and method for positioning a processing tool in relation to a workpiece
    7.
    发明授权
    System and method for positioning a processing tool in relation to a workpiece 有权
    用于将加工工具相对于工件定位的系统和方法

    公开(公告)号:US09151593B2

    公开(公告)日:2015-10-06

    申请号:US13770413

    申请日:2013-02-19

    摘要: In a system and a method for positioning a processing tool in relation to a workpiece, an object alignment mark and the workpiece are situated on a first object. In addition, a workpiece alignment mark is situated on the workpiece. The processing tool via which the object alignment mark is detectable is situated on a second object, which is disposed so as to be displaceable along at least one movement direction in relation to the first object. Furthermore, an alignment sensor is disposed thereon, with whose aid the object alignment mark and the workpiece alignment mark are detectable. In addition, a scannable measuring standard, which extends along the at least one movement direction, is disposed on the second object. At least two scanning units for scanning the measuring standard are situated on the first object in order to thereby determine the relative position between the first and the second object along the movement direction, the two scanning units having a defined offset.

    摘要翻译: 在相对于工件定位加工工具的系统和方法中,物体对准标记和工件位于第一物体上。 此外,工件对准标记位于工件上。 可以检测物体对准标记的处理工具位于第二物体上,第二物体被布置成能够相对于第一物体沿着至少一个移动方向移位。 此外,在其上设置对准传感器,借助于该对准传感器可以检测物体对准标记和工件对准标记。 此外,沿着至少一个运动方向延伸的可扫描测量标准被布置在第二物体上。 用于扫描测量标准的至少两个扫描单元位于第一物体上,从而确定沿移动方向的第一和第二物体之间的相对位置,两个扫描单元具有限定的偏移。

    OPTICAL POSITION-MEASURING DEVICE

    公开(公告)号:US20230120787A1

    公开(公告)日:2023-04-20

    申请号:US17960148

    申请日:2022-10-05

    发明人: Thomas Kaelberer

    IPC分类号: G01D5/347

    摘要: An optical position-measuring device for determining a relative position of scales includes a light source, the scales and a detector. The scales are movable relative to each other along measurement directions and disposed in different planes in crossed relation to each other, and each have a graduation having grating regions which are arranged periodically and have different optical properties. At the first scale, the illumination beam is split into sub-beams, the sub-beams subsequently impinge on the second scale and are reflected back toward the first scale, and the reflected-back sub-beams strike the first scale again, where they are recombined, so that a resulting signal beam subsequently propagates toward the detector. The measuring graduation of one or more of the scales is configured as a two-dimensional cross grating which has a filtering effect that suppresses disturbing higher diffraction orders.