公开(公告)号：US20030178379A1

公开(公告)日：2003-09-25

申请号：US10389631

申请日：2003-03-13

Applicant: Dainippon Screen Mfg. Co., Ltd.

Inventor： Koji Hasegawa ,  Nobutoshi Ogami ,  Hisao Nishizawa ,  Toshio Hiroe

IPC: A47G019/08

CPC classification number: H01L21/67313 ,  H01L21/6704 ,  H01L21/68707

Abstract: A substrate holding apparatus for holding substrates in vertical posture includes a first holder, a second holder and a substrate fall preventing stand arranged along edges of the substrates and located below centers of the substrates. The first holder is disposed in a position for holding the substrates between lower ends and lateral ends of the substrates. The second holder is disposed in a position for holding the substrates at the lower ends of the substrates, or in a position opposed to the first holder across the lower ends for holding the substrates between the lower ends and lateral ends of the substrates. The substrate fall preventing stand being disposed opposite the first holder across the lower ends of the substrates and above the second holder.

Abstract translation: 用于保持垂直姿势的基板的基板保持装置包括沿着基板的边缘布置并位于基板的中心下方的第一保持器，第二保持器和基板防止台。 第一保持器设置在用于将基板保持在基板的下端和侧端之间的位置。 第二保持器设置在用于将基板保持在基板的下端的位置，或者在与第一保持器相对的位置穿过下端，用于将基板保持在基板的下端和侧端之间。 基板防跌落架跨越基板的下端并且在第二支架上方与第一支架相对设置。

公开(公告)号：US20040211449A1

公开(公告)日：2004-10-28

申请号：US10832127

申请日：2004-04-26

Applicant: Dainippon Screen Mfg. Co., Ltd.

Inventor： Ryu Yokomoto ,  Toshio Hiroe ,  Koji Hasegawa

IPC: B08B003/00

CPC classification number: H01L21/67057 ,  B08B3/02 ,  B08B3/048 ,  B08B5/02 ,  H01L21/67051

Abstract: A cleaning apparatus cleaning a chuck is provided with a cleaning tank, an injection nozzle, a discharge nozzle, a liquid supply mechanism and a gas supply mechanism. The liquid supply mechanism has a supply tank, a heater and a liquid distribution mechanism so that the heater heats pure water supplied from the supply tank under the room temperature for forming warm water, reduced in electrical resistance, heated to a temperature higher than the room temperature. The liquid supply mechanism supplies the formed warm water to the cleaning tank through the liquid distribution mechanism. A vertical moving mechanism moves down a transport arm thereby dipping the chuck in the warm water and cleaning the chuck. Thus, the throughput of the cleaning apparatus cleaning the chuck is improved, the quantity of consumed gas is reduced and cleaning performance is improved.

Abstract translation: 清洁卡盘的清洁装置设置有清洗槽，喷射喷嘴，排出喷嘴，液体供给机构和气体供给机构。 液体供给机构具有供给箱，加热器和液体分配机构，使得加热器在室温下加热从供应罐供应的纯水，以形成温水，降低电阻，加热到高于室内的温度 温度。 液体供给机构通过液体分配机构将形成的温水供给清洗槽。 垂直移动机构向下移动输送臂，从而将卡盘浸入温水中并清洁卡盘。 因此，清洁卡盘的清洁装置的生产量提高，消耗的气体量减少，清洗性能提高。

公开(公告)号：US20040200415A1

公开(公告)日：2004-10-14

申请号：US10789870

申请日：2004-02-26

Applicant: Dainippon Screen Mfg. Co., Ltd.

Inventor： Tadashi Maegawa ,  Toshio Hiroe

IPC: C23C016/00

CPC classification number: H01L21/67207 ,  H01L21/67028 ,  H01L21/6719 ,  H01L21/67757

Abstract: A substrate processing apparatus of the present invention is surrounded by a hermetic member, and the internal space thereof is divided by a hermetic member into a rinse and dry processing chamber, a first and second liquid chemical processing chambers, and a substrate transport chamber. Openings for allowing transportation of substrates to and from corresponding chambers are capable of being exposed and blocked by open/close mechanisms including sealing means. Hence, substrates being processed can be transported in an environment isolated from outside an external atmosphere containing oxygen, to thereby suppress formation of unnecessary oxide films or generation of water marks on the surfaces of substrates while being transported. Further, exhaust emission can be reduced, which emission serves to prevent diffusion of an atmosphere containing vapor of a liquid chemical to the outside of the substrate processing apparatus.

Abstract translation: 本发明的基板处理装置由密封构件包围，其内部空间由密封构件分割成冲洗干燥处理室，第一和第二液体化学处理室以及基板输送室。 用于允许将衬底输送到相应室和从相应室传送的开口能够被包括密封装置的打开/关闭机构暴露和阻挡。 因此，被处理的基板可以在从含有氧的外部气氛的外部隔离的环境中运输，从而在运输的同时抑制不需要的氧化膜的形成或者在基板的表面上产生水痕。 此外，可以减少废气排放，该排放用于防止含液体化学气体的气氛扩散到基板处理装置的外部。

公开(公告)号：US20040071531A1

公开(公告)日：2004-04-15

申请号：US10681450

申请日：2003-10-08

Applicant: Dainippon Screen Mfg. Co., Ltd.

Inventor： Toshio Hiroe ,  Koji Hasegawa ,  Ichiro Mitsuyoshi ,  Yoshihiro Nishina

IPC: B65H001/00

CPC classification number: H01L21/67265 ,  H01L21/67057

Abstract: A substrate treating apparatus for treating substrates includes a treating tank for receiving and treating the substrates, a holding device movable, while holding the substrates in a cantilever mode, between a treating position in the treating tank and a transfer position above the treating tank, a transport device for supporting the substrates and transferring the substrates to and from the holding device in the transfer position, a detecting device for detecting a posture variation of the holding device, and a correcting device for correcting a position of the holding device or the transport device. The correcting device performs a correction according to the posture variation of the holding device detected by the detecting device in time of transfer of the substrates between the holding device and the transport device.

Abstract translation: 用于处理基板的基板处理装置包括：用于接收和处理基板的处理槽;保持装置，可以在处理槽中的处理位置和处理槽上方的转移位置之间以悬臂模式保持基板; 传送装置，用于支撑基板并在保持装置的传送位置上传送基板;检测装置，用于检测保持装置的姿势变化;以及校正装置，用于校正保持装置或输送装置的位置 。 校正装置根据在保持装置和输送装置之间的基板的传送时由检测装置检测到的保持装置的姿势变化进行校正。