摘要:
A combustor with a burner maintains combustion stability. The burner includes an air hole member 31 with a plurality of air holes 34, 35 provided at an upstream side of the combustion gases generated by a combustion chamber 1. A first fueling nozzle 33 jets fuel in a direction crossing a central axis of the burner towards at least two of air holes 35. A plurality of second fueling nozzles 32, one for each of the remaining air holes 34, are provided to jet the fuel in a direction routed along the burner axis towards the corresponding air hole 34. A fuel header 30 distributes the fuel to the first fueling nozzle 33 and each of the second fueling nozzles 32. A fuel header storage unit 70 shrouds the fuel header 30, fueling nozzles 32, 33, and has an air inflow hole 71.
摘要:
A combustor with a burner maintains combustion stability. The burner includes an air hole member 31 with a plurality of air holes 34, 35 provided at an upstream side of the combustion gases generated by a combustion chamber 1. A first fueling nozzle 33 jets fuel in a direction crossing a central axis of the burner towards at least two of air holes 35. A plurality of second fueling nozzles 32, one for each of the remaining air holes 34, are provided to jet the fuel in a direction routed along the burner axis towards the corresponding air hole 34. A fuel header 30 distributes the fuel to the first fueling nozzle 33 and each of the second fueling nozzles 32. A fuel header storage unit 70 shrouds the fuel header 30, fueling nozzles 32, 33, and has an air inflow hole 71.
摘要:
The liquid crystal panel according to an embodiment of the present invention includes, in the stated order from a viewer side: a first polarizer; a first optical compensation layer; a liquid crystal cell; a second optical compensation layer; and a second polarizer, wherein: the first optical compensation layer has an absolute value of a photoelastic coefficient of 40×10−12 (m2/N) or less, has an in-plane retardation Δnd of 90 nm to 200 nm, has relationships of the following Expressions (1) and (2), and functions as a protective layer on a liquid crystal cell side of the first polarizer; and the second optical compensation layer has relationships of the following Expressions (3) and (4), Δnd(380)=Δnd(550)=Δnd(780) (1) nx>ny>nz (2) Rth(380)>Rth(550)>Rth(780) (3) nx=ny>nz. (4)
摘要:
A substrate mounting structure that can maintain the temperature uniformity of a substrate mounted on a mounting stage. The substrate mounting structure disposed in a pressure reduced space has a base portion, a pillar portion mounted in a standing manner on the base portion and having an internal space, and a mounting stage supported on the pillar portion and having a substrate mounted thereon. The mounting stage has a heating element that heats the mounted substrate, and a thermal breaking unit that mechanically breaks an electrical power supply line connected to the heating element depending on the temperature of the substrate. The pillar portion is comprised of a thin-walled cylinder. The thermal breaking unit is disposed on the pillar portion's internal space side in the mounting stage, and the pressure in the internal space is reduced.
摘要:
An image captured with an imaging section is thinned out to generate a low resolution image. A face detection section obtains the low resolution image. The face detection section detects a face image from the low resolution image. A still state detector judges whether the face image is in a still state. The still state detector counts the number of frames which has been judged still by the still state detector. When the number of frames judged still reaches a predetermined value during half-pressing of a release button, a CPU automatically records the low resolution image as a substitute for a still image.
摘要:
A projector includes: a display device which modulates illumination light; a projection lens which projects modulation light produced by the display device; and a holding device which has a holder member supporting the display device, a frame member supporting the projection lens and functions as a base capable of supporting the holder member, and an expanding and contracting member disposed between the frame member and the display device, wherein a temperature coefficient for the expansion and contraction of the expanding and contracting member in the direction of the optical axis of the projection lens corresponds to a temperature coefficient for the increase and decrease of the focal distance of the projection lens.
摘要:
A planar heater 1 in which a power supply terminal unit 108 which supplies an electric power is arranged on a central portion on a lower surface of a silica glass plate-like member 102. The power supply terminal unit includes small-diameter silica glass tubes 105a and 106a, which contain a connection line which supplies an electric power to a carbon heat generator and a large-diameter silica glass tube 2 which contains the small-diameter silica glass tubes 105a and 106a. A flange portion 2a is formed on a lower end of the large-diameter silica glass tube 2, and a bent portion 2b having different diameters is formed between an upper end of the large-diameter silica glass and the flange portion 2a, and the first heat shielding plates 19, 20 and 21 configured by metal plates or opaque silica glass plates are contained in the large-diameter silica glass tube below the bent portion.
摘要:
A plasma processing apparatus includes a barrier wall member disposed between a plasma generation chamber and a processing chamber to separate the plasma generation chamber from the processing chamber. The barrier wall member assumes a fin structure achieved by disposing in a radial pattern numerous plate-like fin members extending from a central area thereof toward a peripheral edge. An upper end portion of each fin member overlaps a lower end portion of an adjacent fin member. The fin members are disposed with gaps formed between them and are made to range upward with a tilt along the circumferential direction.
摘要:
A substrate processing apparatus that can accurately control the temperature of a focus ring without causing abnormal electric discharge and the back-flow of radio frequency electrical power during the application of radio frequency electrical power. A wafer is mounted on a mounting stage disposed in a housing chamber. An annular focus ring is mounted on the mounting stage in such a manner as to surround the peripheral portion of the mounted wafer. The pressure in the housing chamber is reduced, radio frequency electrical power is applied to the mounting stage, and the focus ring generates heat by itself.
摘要:
A substrate processing method capable of preventing a reduction in productivity of the fabrication of a semiconductor device from a substrate. An HF gas is supplied toward a wafer having a thermally-oxidized film, a BPSG film, and a deposit film, to thereby selectively etch the BPSG film and the deposit film using fluorinated acid. A residual matter of H2SiF6 produced at the time of etching is decomposed into HF and SiF4 by being heated.