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1.发明申请Integrated tool with automated calibration system and interchangeable wet processing components for processing microfeature workpieces 失效具有自动校准系统的集成工具和可互换的湿加工部件，用于加工微型工件公开(公告)号：US20050109088A1
公开(公告)日：2005-05-26
申请号：US10860385
申请日：2004-06-03
申请人： Daniel Woodruff , David Mattson , James Erickson , Matthew Egloff
发明人： Daniel Woodruff , David Mattson , James Erickson , Matthew Egloff
CPC分类号： H01L21/6723 , B01D61/425 , C25D17/00 , H01L21/67005 , H01L21/6719 , H01L21/67742 , H01L21/68707
摘要： An integrated tool and automatic calibration systems that enable wet chemical processing chambers, lift-rotate units and other hardware to be quickly interchanged without having to recalibrate the transport system or other components to the replacement items. These tools are expected to reduce the down time associated with repairing or maintaining processing chambers and/or lift-rotate units so that the tools can maintain a high throughput. Several aspects of these tools are particularly useful for applications that have stringent performance requirements because components are more likely to require maintenance more frequently, and reducing the down time associated with maintaining such components will significantly enhance the integrated tool.
摘要翻译： 集成的工具和自动校准系统，使湿化学处理室，提升 - 旋转单元和其他硬件能够快速互换，而无需重新校准运输系统或其他组件到更换项目。 预计这些工具可以减少与修理或维护处理室和/或提升旋转单元相关联的停机时间，从而使工具能够保持高通量。 这些工具的几个方面对于具有严格性能要求的应用程序特别有用，因为组件更有可能需要更频繁的维护，并且减少与维护这些组件相关联的停机时间将显着增强集成工具。
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2.发明申请Integrated tool with interchangeable wet processing components for processing microfeature workpieces and automated calibration systems 有权集成工具，可互换的湿加工部件，用于加工微型工件和自动校准系统公开(公告)号：US20050034809A1
公开(公告)日：2005-02-17
申请号：US10861240
申请日：2004-06-03
申请人： Daniel Woodruff , Jeffry Davis , Randy Harris , David Mattson , James Erickson , Matthew Egloff
发明人： Daniel Woodruff , Jeffry Davis , Randy Harris , David Mattson , James Erickson , Matthew Egloff
IPC分类号： B24B20060101 , C12N15/31 , C23F1/00 , H01L21/00
CPC分类号： H01L21/6719
摘要： An integrated tool and automatic calibration systems that enable wet chemical processing chambers, lift-rotate units and other hardware to be quickly interchanged without having to recalibrate the transport system or other components to the replacement items. These tools are expected to reduce the down time associated with repairing or maintaining processing chambers and/or lift-rotate units so that the tools can maintain a high throughput. Several aspects of these tools are particularly useful for applications that have stringent performance requirements because components are more likely to require maintenance more frequently, and reducing the down time associated with maintaining such components will significantly enhance the integrated tool.
摘要翻译： 集成的工具和自动校准系统，使湿化学处理室，提升 - 旋转单元和其他硬件能够快速互换，而无需重新校准运输系统或其他组件到更换项目。 预计这些工具可以减少与修理或维护处理室和/或提升旋转单元相关联的停机时间，从而使工具能够保持高通量。 这些工具的几个方面对于具有严格性能要求的应用程序特别有用，因为组件更有可能需要更频繁的维护，并且减少与维护这些组件相关联的停机时间将显着增强集成工具。
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3.发明授权Processing apparatus including a reactor for electrochemically etching a microelectronic workpiece 失效包括用于电化学蚀刻微电子工件的反应器的处理装置公开(公告)号：US06773559B2
公开(公告)日：2004-08-10
申请号：US09782216
申请日：2001-02-13
IPC分类号： C25D1700
CPC分类号： H01L21/67086 , C25D5/08 , C25D7/123 , C25D17/001 , C25D17/007 , C25D21/10 , H01L21/67005 , H01L21/67023 , H01L21/67057 , H01L21/6723
摘要： Although there are several inventions disclosed herein, the present application is directed to a reactor for electrochemically processing a microelectronic workpiece. The reactor comprises a movable electrode assembly that is disposed for movement along a motion path. The motion path includes at least a portion thereof over which the electrode assembly is positioned for processing at least one surface of the microelectronic workpiece. A cleaning electrode is located along the motion path of the movable electrode assembly. In one embodiment, a programmable controller is connected to direct the movable electrode assembly to move to the cleaning electrode during a cleaning cycle. At that time, the programmable controller connects the movable electrode assembly as an anode and the cleaning electrode as a cathode for cleaning of the movable electrode assembly. The cleaning electrode may be disposed along a position of the motion path that is beyond the range of motion required to process the microelectronic workpiece so that the programmable controller may be programmed to conduct a cleaning cycle while a microelectronic workpiece is present in the reactor for processing.
摘要翻译： 虽然本文公开了几个发明，但是本申请涉及用于电化学处理微电子工件的反应器。 反应器包括可移动电极组件，其被设置为沿着运动路径移动。 运动路径至少包括一部分，电极组件定位在该部分上用于处理微电子工件的至少一个表面。 沿着可动电极组件的运动路径设置清洁电极。 在一个实施例中，连接可编程控制器以在清洁循环期间引导可移动电极组件移动到清洁电极。 此时，可编程控制器将作为阳极的可动电极组件和作为用于清洁可动电极组件的阴极的清洁电极连接起来。 清洁电极可以沿着运动路径的位置设置，该位置超出处理微电子工件所需的运动范围，使得可编程控制器可以被编程以在微电子工件存在于反应器中进行清洁循环以进行处理 。
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4.发明授权Processing apparatus including a reactor for electrochemically etching microelectronic workpiece 失效包括用于电化学蚀刻微电子工件的反应器的处理装置公开(公告)号：US07524406B2
公开(公告)日：2009-04-28
申请号：US10745190
申请日：2003-12-23
CPC分类号： H01L21/67086 , C25D5/08 , C25D7/123 , C25D17/001 , C25D17/007 , C25D21/10 , H01L21/67005 , H01L21/67023 , H01L21/67057 , H01L21/6723
摘要： Although there are several inventions disclosed herein, the present application is directed to a reactor for electrochemically processing a microelectronic workpiece. The reactor comprises a movable electrode assembly that is disposed for movement along a motion path. The motion path includes at least a portion thereof over which the electrode assembly is positioned for processing at least one surface of the microelectronic workpiece. A cleaning electrode is located along the motion path of the movable electrode assembly. In one embodiment, a programmable controller is connected to direct the movable electrode assembly to move to the cleaning electrode during a cleaning cycle. At that time, the programmable controller connects the movable electrode assembly as an anode and the cleaning electrode as a cathode for cleaning of the movable electrode assembly. The cleaning electrode may be disposed along a position of the motion path that is beyond the range of motion required to process the microelectronic workpiece so that the programmable controller may be programmed to conduct a cleaning cycle while a microelectronic workpiece is present in the reactor for processing.
摘要翻译： 虽然本文公开了几个发明，但是本申请涉及用于电化学处理微电子工件的反应器。 反应器包括可移动电极组件，其被设置为沿着运动路径移动。 运动路径至少包括一部分，电极组件定位在该部分上用于处理微电子工件的至少一个表面。 沿着可动电极组件的运动路径设置清洁电极。 在一个实施例中，连接可编程控制器以在清洁循环期间引导可移动电极组件移动到清洁电极。 此时，可编程控制器将作为阳极的可动电极组件和作为用于清洁可动电极组件的阴极的清洁电极连接起来。 清洁电极可以沿着运动路径的位置设置，该位置超出处理微电子工件所需的运动范围，使得可编程控制器可以被编程以在微电子工件存在于反应器中进行清洁循环以进行处理 。
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