Methods for cleaning wafer containers
    1.
    发明授权
    Methods for cleaning wafer containers 有权
    清洗晶圆容器的方法

    公开(公告)号:US07060138B2

    公开(公告)日:2006-06-13

    申请号:US10917750

    申请日:2004-08-12

    IPC分类号: B08B3/02

    摘要: A system and method for cleaning boxes used for handling flat media includes a rotor rotatably mounted within an enclosure, with spray nozzles in the enclosure for spraying fluid toward the rotor. The rotor has at least one box holder assembly for holding a box. At least one retainer bar is located on the rotor for engaging a front section of the box to retain the box in the box holder assembly during rotation of the rotor. The retainer bar is preferably moveable from a first position where the retainer bar restrains the box on the box holder assembly, to a second position where the retainer bar is moved away from the box. The box holder assembly may alternatively include a base with a plurality of grooved elements thereon that are adapted to engage a flange on the box for securing the box to the box holder assembly.

    摘要翻译: 用于处理扁平介质的清洁盒的系统和方法包括可旋转地安装在外壳内的转子,在外壳中具有用于向转子喷射流体的喷嘴。 转子具有至少一个用于保持盒子的盒保持器组件。 至少一个保持杆位于转子上用于接合箱的前部,以在转子旋转期间将箱保持在箱保持器组件中。 保持杆优选地可以从保持杆将盒保持器组件上的盒限制的第一位置移动到保持杆从盒子移开的第二位置。 盒保持器组件可以可选地包括其上具有多个开槽元件的基座,其适于接合箱上的凸缘,以将盒固定到盒保持器组件。

    Cross flow processor
    2.
    发明授权
    Cross flow processor 失效
    横流处理器

    公开(公告)号:US06895981B2

    公开(公告)日:2005-05-24

    申请号:US10200073

    申请日:2002-07-19

    IPC分类号: H01L21/00 B08B3/00

    CPC分类号: H01L21/67034 H01L21/67028

    摘要: A centrifugal processor includes an elongated inlet and outlet in fluid communication with a rotor housing having an eccentric bowl. A rotor having fan blades and adapted to hold flat media is rotatably disposed within the rotor housing. An intake gate is pivotably mounted to the rotor housing to swing about the rotor into a closed position during a rinse mode and into an open position during a drying mode. The gate has a wedge that is designed to almost contact the rotor when the gate is in the open position for drying. The geometry of the elongated inlet, outlet, and eccentric bowl, in combination with the design of the rotor and that of the intake gate, work together to create a cross flow fan having a flow path across the flat media and one that exposes the flat media to large volumes of incoming air only once.

    摘要翻译: 离心处理器包括与具有偏心碗的转子壳体流体连通的细长入口和出口。 具有风扇叶片并且适于保持扁平介质的转子可旋转地设置在转子壳体内。 进气门可枢转地安装到转子壳体上,以在冲洗模式期间围绕转子摆动到关闭位置,并且在干燥模式期间进入打开位置。 闸门具有楔形件,当楔门处于打开位置进行干燥时,该楔形件设计成几乎接触转子。 细长的入口,出口和偏心碗的几何结构与转子的设计和进气门的几何结合在一起,以形成横流式风扇,该横流式风扇具有穿过平面介质的流动路径, 媒体大量进入空气只有一次。

    Wet chemical processing chambers for processing microfeature workpieces
    3.
    发明申请
    Wet chemical processing chambers for processing microfeature workpieces 审中-公开
    用于加工微型工件的湿化学处理室

    公开(公告)号:US20050050767A1

    公开(公告)日:2005-03-10

    申请号:US10859748

    申请日:2004-06-03

    摘要: A wet chemical processing chamber comprising a fixed unit, a detachable unit releasably coupled to the fixed unit, a seal contacting the fixed unit and the detachable unit, and a processing component disposed in the fixed unit and/or the detachable unit. The fixed unit can have a first flow system configured to direct a processing fluid through the fixed unit and a mounting fixture for fixedly attaching the fixed unit to a platform or deck of an integrated processing tool. The detachable unit can include a second flow system configured to direct the processing fluid to and/or from the first flow system of the fixed unit. The seal has an orifice through which processing fluid can flow between the first and second flow systems, and the processing component can impart a property to the processing fluid for processing a surface on a microfeature workpiece having submicron microfeatures.

    摘要翻译: 一种湿化学处理室,包括固定单元,可释放地联接到固定单元的可拆卸单元,接触固定单元和可拆卸单元的密封件,以及设置在固定单元和/或可拆卸单元中的处理部件。 固定单元可以具有构造成引导处理流体通过固定单元的第一流动系统和用于将固定单元固定地附接到集成处理工具的平台或甲板的安装夹具。 可拆卸单元可以包括构造成将处理流体引导到和/或从固定单元的第一流动系统引导的第二流动系统。 密封件具有孔口,处理流体可以通过该孔口在第一和第二流动系统之间流动,并且处理部件可以赋予处理流体以处理具有亚微米特征的微特征工件上的表面的性质。

    Method and apparatus for thermally processing microelectronic workpieces

    公开(公告)号:US20060105580A1

    公开(公告)日:2006-05-18

    申请号:US10987049

    申请日:2004-11-12

    IPC分类号: H01L21/31

    摘要: An apparatus for thermally processing a microelectronic workpiece is provided. The apparatus comprises a rotatable carousel assembly configured to support at least one workpiece. A driver is coupled to the carousel assembly and rotates the carousel assembly, moving the workpiece between a loading station, a heating station and a cooling station. The loading, heating and cooling stations are radially positioned and approximately equally spaced about a center axis of the carousel assembly. The heating station includes a heating element and an actuator for moving the heating element into thermal engagement with the workpiece in the heating station. The cooling station includes a cooling element and an actuator for moving the cooling element into thermal engagement with the workpiece in the cooling station. A process fluid distribution manifold for delivering process fluid to the workpieces at each station extends through a central opening in the carousel assembly. A non-oxidizing gas is delivered through the manifold to create an oxygen free environment during the thermal process.

    Robot for handling workpieces in an automated processing system

    公开(公告)号:US06572320B2

    公开(公告)日:2003-06-03

    申请号:US09907523

    申请日:2001-07-16

    申请人: Jeffry Davis

    发明人: Jeffry Davis

    IPC分类号: B25J1508

    摘要: An automated workpiece processing system has a transfer robot including an end effector having arms which move linearly towards each other to pick up a workpiece. Each arm has two workpiece contactors for engaging the edges of the workpiece. The contactors are positioned equally distant from the workpiece edges. The arms are moved linearly together, while they remain parallel to each other. The contactors contact the edges of the workpiece without causing sliding or displacement of the workpiece. Transfer robot movement or pre-positioning of the end effector is minimized, expediting handling of workpieces within the automated system.

    Apparatus and method for cleaning and drying a container for semiconductor workpieces
    6.
    发明申请
    Apparatus and method for cleaning and drying a container for semiconductor workpieces 有权
    用于清洁和干燥半导体工件的容器的装置和方法

    公开(公告)号:US20070125404A1

    公开(公告)日:2007-06-07

    申请号:US11294921

    申请日:2005-12-05

    IPC分类号: B08B7/00 B08B3/00

    摘要: The invention provides an apparatus for cleaning and drying a container for semiconductor workpieces. The apparatus comprises a load port with a fixture that receives a dirty container and delivers it to a deck assembly with a carrier that removably receives the container for further handling. While the container is received by the carrier, a robot with a first end effector removes the container door and places it on a portion of the carrier. The robot includes a second end effector that engages the carrier and elevates the carrier and container for insertion into a process chamber. The process chamber includes a rotor with at least one receptacle wherein the rotor is rotated to create both high pressure and low pressure regions. Once the container and carrier are loaded into the rotor, the rotor is rotated and means for cleaning injects a processing fluid onto the container and carrier. After a rinse stage and while the rotor is rotating, the means for drying delivers air across the container and carrier. Upon completion of the drying stage, the robot removes both the container and the carrier from the process chamber and reassembles the door to the container such that container can be returned to use.

    摘要翻译: 本发明提供一种用于清洁和干燥半导体工件的容器的装置。 该装置包括具有固定装置的装载端口,该装置接收脏污的容器并将其传送到具有可移除地容纳容器以进一步处理的载体的甲板组件。 当容器被承载件容纳时,具有第一端部执行器的机器人移除容器门并将其放置在承载件的一部分上。 机器人包括第二端部执行器,其接合载体并提升载体和容器以插入处理室。 处理室包括具有至少一个容器的转子,其中转子旋转以产生高压和低压区域。 一旦容器和载体被装载到转子中,则转子旋转,并且用于清洁的装置将处理流体注入到容器和载体上。 在冲洗阶段之后,当转子旋转时,干燥装置将空气穿过容器和载体。 干燥阶段完成后,机器人从处理室中移除容器和载体,并将门重新组装到容器上,使得容器可以返回使用。

    METHOD AND APPARATUS FOR THERMALLY PROCESSING MICROELECTRONIC WORKPIECES
    7.
    发明申请
    METHOD AND APPARATUS FOR THERMALLY PROCESSING MICROELECTRONIC WORKPIECES 失效
    用于热处理微电子工件的方法和装置

    公开(公告)号:US20070084832A1

    公开(公告)日:2007-04-19

    申请号:US11558723

    申请日:2006-11-10

    IPC分类号: B23H7/00 B23H1/00

    摘要: An apparatus for thermally processing a microelectronic workpiece comprises a rotatable carousel assembly configured to support at least one workpiece. A driver is coupled to the carousel assembly and rotates the carousel assembly, moving the workpiece between a loading station, a heating station and a cooling station. The loading, heating and cooling stations are radially positioned about a center axis of the carousel assembly. The heating station includes a heating element and an actuator for moving the heating element into thermal engagement with the workpiece in the heating station. The cooling station includes a cooling element and an actuator for moving the cooling element into thermal engagement with the workpiece in the cooling station. A process fluid distribution manifold for delivering process fluid to the workpieces at each station extends through a central opening in the carousel assembly. A non-oxidizing gas is delivered through the manifold to create an oxygen free environment during the thermal process.

    摘要翻译: 用于热处理微电子工件的装置包括构造成支撑至少一个工件的可旋转转盘组件。 驱动器联接到转盘组件并旋转转盘组件,在加载站,加热站和冷却站之间移动工件。 装载,加热和冷却站围绕转盘组件的中心轴线径向定位。 加热站包括加热元件和用于使加热元件与加热站中的工件热接合的致动器。 冷却站包括冷却元件和用于使冷却元件与冷却站中的工件热接合的致动器。 用于在每个站处将工艺流体输送到工件的工艺流体分配歧管延伸穿过转盘组件中的中心开口。 通过歧管输送非氧化气体,以在热过程中产生无氧环境。

    METHOD AND APPARATUS FOR THERMALLY PROCESSING MICROELECTRONIC WORKPIECES
    8.
    发明申请
    METHOD AND APPARATUS FOR THERMALLY PROCESSING MICROELECTRONIC WORKPIECES 审中-公开
    用于热处理微电子工件的方法和装置

    公开(公告)号:US20070057352A1

    公开(公告)日:2007-03-15

    申请号:US11555641

    申请日:2006-11-01

    IPC分类号: H01L23/495

    摘要: An apparatus for thermally processing a microelectronic workpiece is provided. The apparatus comprises a rotatable carousel assembly configured to support at least one workpiece. A driver is coupled to the carousel assembly and rotates the carousel assembly, moving the workpiece between a loading station, a heating station and a cooling station. The loading, heating and cooling stations are radially positioned and approximately equally spaced about a center axis of the carousel assembly. The heating station includes a heating element and an actuator for moving the heating element into thermal engagement with the workpiece in the heating station. The cooling station includes a cooling element and an actuator for moving the cooling element into thermal engagement with the workpiece in the cooling station. A process fluid distribution manifold for delivering process fluid to the workpieces at each station extends through a central opening in the carousel assembly. A non-oxidizing gas is delivered through the manifold to create an oxygen free environment during the thermal process.

    摘要翻译: 提供了一种用于热处理微电子工件的设备。 该装置包括构造成支撑至少一个工件的可旋转转盘组件。 驱动器联接到转盘组件并旋转转盘组件,在加载站,加热站和冷却站之间移动工件。 装载,加热和冷却站径向定位并围绕转盘组件的中心轴线大致等间隔。 加热站包括加热元件和用于使加热元件与加热站中的工件热接合的致动器。 冷却站包括冷却元件和用于使冷却元件与冷却站中的工件热接合的致动器。 用于在每个站处将工艺流体输送到工件的工艺流体分配歧管延伸穿过转盘组件中的中心开口。 通过歧管输送非氧化气体,以在热过程中产生无氧环境。

    Interchangeable workpiece handling apparatus and associated tool for processing microfeature workpieces
    9.
    发明申请
    Interchangeable workpiece handling apparatus and associated tool for processing microfeature workpieces 审中-公开
    可更换的工件处理设备及相关的加工微型工件的工具

    公开(公告)号:US20050063798A1

    公开(公告)日:2005-03-24

    申请号:US10860592

    申请日:2004-06-03

    IPC分类号: B65G1/00

    CPC分类号: B65G1/00

    摘要: Interchangeable workpiece handling apparatuses and associated tools for processing microfeature workpieces are disclosed. In one embodiment, an apparatus includes a device support having a first alignment surface at an alignment plane. A processing chamber is received in an aperture at the alignment plane. A workpiece handling device is positioned proximate to the processing chamber and includes a workpiece support, a drive unit operatively coupled to the workpiece support to move the workpiece support along a generally linear motion axis, and a mounting portion coupled to the workpiece support and having a second alignment surface removably mated with the first alignment surface. In a particular embodiment, the workpiece handling device is supported relative to the device support only at or above the alignment plane. Accordingly, the workpiece handling device can be easily removed from the device support and need not impede access to components beneath the alignment plane.

    摘要翻译: 公开了可互换的工件处理装置和用于加工微型工件的相关工具。 在一个实施例中,一种装置包括具有在对准平面处的第一对准表面的装置支撑件。 处理室被容纳在对准平面的孔中。 工件处理装置位于处理室附近,并且包括工件支撑件,可操作地联接到工件支撑件的驱动单元,以沿着大致线性的运动轴线移动工件支撑件,以及联接到工件支撑件的安装部分, 第二对准表面可拆卸地与第一对准表面配合。 在特定实施例中,工件处理装置仅在对准平面上或上方支撑相对于装置支撑。 因此,工件处理装置可以容易地从装置支撑件移除,并且不需要阻碍对准对准平面下方的部件。

    Wafer container cleaning system
    10.
    发明申请
    Wafer container cleaning system 有权
    晶圆容器清洗系统

    公开(公告)号:US20050011540A1

    公开(公告)日:2005-01-20

    申请号:US10917750

    申请日:2004-08-12

    摘要: A system and method for cleaning boxes used for handling flat media includes a rotor rotatably mounted within an enclosure, with spray nozzles in the enclosure for spraying fluid toward the rotor. The rotor has at least one box holder assembly for holding a box. At least one retainer bar is located on the rotor for engaging a front section of the box to retain the box in the box holder assembly during rotation of the rotor. The retainer bar is preferably moveable from a first position where the retainer bar restrains the box on the box holder assembly, to a second position where the retainer bar is moved away from the box. The box holder assembly may alternatively include a base with a plurality of grooved elements thereon that are adapted to engage a flange on the box for securing the box to the box holder assembly.

    摘要翻译: 用于处理扁平介质的清洁盒的系统和方法包括可旋转地安装在外壳内的转子,在外壳中具有用于向转子喷射流体的喷嘴。 转子具有至少一个用于保持盒子的盒保持器组件。 至少一个保持杆位于转子上用于接合箱的前部,以在转子旋转期间将箱保持在箱保持器组件中。 保持杆优选地可以从保持杆将盒保持器组件上的盒限制的第一位置移动到保持杆从盒子移开的第二位置。 盒保持器组件可以可选地包括其上具有多个开槽元件的基座,其适于接合箱上的凸缘,以将盒固定到盒保持器组件。