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公开(公告)号：US06780491B1
公开(公告)日：2004-08-24
申请号：US09621496
申请日：2000-07-21
申请人： David A. Cathey , Kevin Tjaden , James J. Alwan
发明人： David A. Cathey , Kevin Tjaden , James J. Alwan
IPC分类号： B44C122
CPC分类号： H01J9/025 , Y10T428/24355 , Y10T428/24372 , Y10T428/24421
摘要： A substrate is placed on a charging surface, to which a first voltage is applied. Etch-resistant dry particles are placed in a cup in a nozzle to which a second voltage, less than the first voltage, is applied. A carrier gas is directed through the nozzle, which projects the dry particles out of the nozzle toward the substrate. The particles pick up a charge from the potential applied to the nozzle and are electrostatically attracted to the substrate. The particles adhere to the substrate, where they form an etch mask. The substrate is etched and the particles are removed. Emitter tips for a field emission display may be formed in the substrate.
摘要翻译： 将基板放置在施加第一电压的充电表面上。 将耐蚀刻干燥颗粒放置在喷嘴中的杯中，其中施加小于第一电压的第二电压。 载气被引导通过喷嘴，其将干燥颗粒从喷嘴向衬底投射。 颗粒从施加到喷嘴的电位拾取电荷，并被静电吸引到基板上。 颗粒粘附到基底上，在那里它们形成蚀刻掩模。 蚀刻基板并除去颗粒。 用于场致发射显示器的发射极尖端可以形成在衬底中。
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2.发明授权
公开(公告)号：US6010917A
公开(公告)日：2000-01-04
申请号：US725646
申请日：1996-10-15
申请人： James J. Alwan , Kevin Tjaden , David A. Cathey
发明人： James J. Alwan , Kevin Tjaden , David A. Cathey
IPC分类号： H01L21/00
CPC分类号： H01J31/127 , H01J29/467 , H01J3/022 , H01J9/148 , H01J2203/0228 , H01J2203/0232 , H01J2329/4626 , H01J2329/463
摘要： A method for fabricating microelectronic deices in which an interconnect layer is electrically isolated from large protuberances that project from a lower conductive layer to a desired endpoint of a chemical-mechanical planarization process. The lower conductive layer is covered with an insulating material to form an insulator layer that generally follows the contour of the lower conductive layer and any large protuberances. A highly conductive interconnect material is then deposited over the insulator layer to form an interconnect layer that generally follows the contour of the insulator layer. The interconnect layer may be deposited directly on the insulator layer, or it may be deposited on an intermediate layer between the interconnect layer and the insulator layer. After the upper conductive layer is deposited, the insulator layer and the upper conductive layer are planarized with a chemical-mechanical planarization process to a desired endpoint.
摘要翻译： 一种用于制造微电子器件的方法，其中互连层与从下导电层突出到化学机械平面化工艺的期望端点的大突起电隔离。 下导电层被绝缘材料覆盖以形成通常遵循下导电层和任何大突起的轮廓的绝缘体层。 然后将高度导电的互连材料沉积在绝缘体层上，以形成大致遵循绝缘体层的轮廓的互连层。 互连层可以直接沉积在绝缘体层上，或者它可以沉积在互连层和绝缘体层之间的中间层上。 在沉积上导电层之后，通过化学机械平面化工艺将绝缘体层和上导电层平坦化成期望的端点。
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公开(公告)号：US5817373A
公开(公告)日：1998-10-06
申请号：US764756
申请日：1996-12-12
申请人： David A. Cathey , Kevin Tjaden , James J. Alwan
发明人： David A. Cathey , Kevin Tjaden , James J. Alwan
CPC分类号： H01J9/025
摘要： A substrate is placed on a charging surface, to which a first voltage is applied. Etch-resistant dry particles are placed in a cup in a nozzle to which a second voltage, less than the first voltage, is applied. A carrier gas is directed through the nozzle, which projects the dry particles out of the nozzle toward the substrate. The particles pick up a charge from the potential applied to the nozzle and are electrostatically attracted to the substrate. The particles adhere to the substrate, where they form an etch mask. The substrate is etched and the particles are removed. Emitter tips for a field emission display may be formed in the substrate.
摘要翻译： 将基板放置在施加第一电压的充电表面上。 将耐蚀刻干燥颗粒放置在喷嘴中的杯中，其中施加小于第一电压的第二电压。 载气被引导通过喷嘴，其将干燥颗粒从喷嘴向衬底投射。 颗粒从施加到喷嘴的电位拾取电荷，并被静电吸引到基板上。 颗粒粘附到基底上，在那里它们形成蚀刻掩模。 蚀刻基板并除去颗粒。 用于场致发射显示器的发射极尖端可以形成在衬底中。
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公开(公告)号：US6110394A
公开(公告)日：2000-08-29
申请号：US120558
申请日：1998-07-22
申请人： David A. Cathey , Kevin Tjaden , James J. Alwan
发明人： David A. Cathey , Kevin Tjaden , James J. Alwan
CPC分类号： H01J9/025
摘要： A substrate is placed on a charging surface, to which a first voltage is applied. Etch-resistant dry particles are placed in a cup in a nozzle to which a second voltage, less than the first voltage, is applied. A carrier gas is directed through the nozzle, which projects the dry particles out of the nozzle toward the substrate. The particles pick up a charge from the potential applied to the nozzle and are electrostatically attracted to the substrate. The particles adhere to the substrate, where they form an etch mask. The substrate is etched and the particles are removed. Emitter tips for a field emission display may be formed in the substrate.
摘要翻译： 将基板放置在施加第一电压的充电表面上。 将耐蚀刻干燥颗粒放置在喷嘴中的杯中，其中施加小于第一电压的第二电压。 载气被引导通过喷嘴，其将干燥颗粒从喷嘴向衬底投射。 颗粒从施加到喷嘴的电位拾取电荷，并被静电吸引到基板上。 颗粒粘附到基底上，在那里它们形成蚀刻掩模。 蚀刻基板并除去颗粒。 用于场致发射显示器的发射极尖端可以形成在衬底中。
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公开(公告)号：US06733354B1
公开(公告)日：2004-05-11
申请号：US09652630
申请日：2000-08-31
申请人： David A. Cathey , James J. Alwan
发明人： David A. Cathey , James J. Alwan
IPC分类号： H01J902
CPC分类号： H01J9/242 , H01J9/18 , H01J9/185 , H01J29/028 , H01J29/864 , H01J31/123 , H01J2329/864 , H01J2329/8645
摘要： The disclosed method for forming a field emission display includes forming a cathode and an anode, forming a plurality of photoresist posts over the cathode, and coating the posts with a coating material. The coating material forms sidewalls around the posts. The photoresist posts may then be removed from within the sidewalls. The anode may then be fitted onto the sidewalls so that the sidewalls function as spacers in the field emission display.
摘要翻译： 所公开的用于形成场发射显示的方法包括形成阴极和阳极，在阴极上形成多个光致抗蚀剂柱，以及用涂料涂覆柱。 涂层材料在柱上形成侧壁。 然后可以从侧壁内去除光致抗蚀剂柱。 然后可以将阳极装配到侧壁上，使得侧壁在场发射显示器中用作间隔物。
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公开(公告)号：US07274138B2
公开(公告)日：2007-09-25
申请号：US11348933
申请日：2006-02-07
申请人： David A. Cathey , James J. Alwan
发明人： David A. Cathey , James J. Alwan
CPC分类号： H01J9/242 , H01J9/18 , H01J9/185 , H01J29/028 , H01J29/864 , H01J31/123 , H01J2329/864 , H01J2329/8645
摘要： The disclosed method for forming a field emission display includes forming a cathode and an anode, forming a plurality of photoresist posts over the cathode, and coating the posts with a layer of coating material. The layer of coating material forms sidewalls around the posts. The photoresist posts may then be removed from within the sidewalls. The anode may then be fitted onto the sidewalls so that the sidewalls function as spacers in the field emission display.
摘要翻译： 所公开的用于形成场致发射显示的方法包括形成阴极和阳极，在阴极上形成多个光致抗蚀剂柱，并用一层涂料涂覆柱。 涂层材料层在柱子周围形成侧壁。 然后可以在侧壁内去除光致抗蚀剂柱。 然后可以将阳极装配到侧壁上，使得侧壁在场发射显示器中用作间隔物。
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公开(公告)号：US06995504B2
公开(公告)日：2006-02-07
申请号：US10320238
申请日：2002-12-16
申请人： David A. Cathey , James J. Alwan
发明人： David A. Cathey , James J. Alwan
CPC分类号： H01J9/242 , H01J9/18 , H01J9/185 , H01J29/028 , H01J29/864 , H01J31/123 , H01J2329/864 , H01J2329/8645
摘要： The disclosed method for forming a field emission display includes forming a cathode and an anode, forming a plurality of photoresist posts over the cathode, and coating the posts with a coating material. The coating material forms sidewalls around the posts. The photoresist posts may then be removed from within the sidewalls. The anode may then be fitted onto the sidewalls so that the sidewalls function as spacers in the field emission display.
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公开(公告)号：US5391259A
公开(公告)日：1995-02-21
申请号：US184819
申请日：1994-01-21
申请人： David A. Cathey , Kevin Tjaden
发明人： David A. Cathey , Kevin Tjaden
CPC分类号： H01J9/025 , H01J2201/30403
摘要： A method for forming a substantially uniform array of atomically sharp emitter tips, comprising: patterning a substrate with a mask, thereby defining an array; isotropically etching the array to form pointed tips; and removing the mask when substantially all of the tips have become sharp. A mask having a composition and dimensions which enable the mask to remain balanced on the apex of the tips until all of the tips are of substantially the same shape is used to form the array of substantially uniform tips.
摘要翻译： 一种用于形成基本上均匀阵列的原子锋利的发射极尖端的方法，包括：用掩模图案化衬底，从而限定阵列; 各向同性蚀刻阵列以形成尖端; 并且当基本上所有的尖端已经变得尖锐时去除掩模。 具有使掩模在尖端的顶点上保持平衡的成分和尺寸的掩模，直到所有尖端具有基本相同的形状，以形成基本均匀的尖端的阵列。
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公开(公告)号：US6165374A
公开(公告)日：2000-12-26
申请号：US354529
申请日：1999-07-15
申请人： David A. Cathey , Kevin Tjaden
发明人： David A. Cathey , Kevin Tjaden
CPC分类号： H01J9/025 , H01J2201/30403
摘要： A method for fabricating sharp asperities. A substrate is provided which has a mask layer disposed thereon, and a layer of micro-spheres is disposed superjacent the mask layer. The micro-spheres are for patterning the mask layer. Portions of the mask layer are selectively removed, thereby forming circular masks. The substrate is isotropically etched, thereby creating sharp asperities.
摘要翻译： 一种制造尖锐凹凸的方法。 提供了具有设置在其上的掩模层的基板，并且在该掩模层的上方布置一层微球。 微球用于图案化掩模层。 选择性地去除掩模层的一部分，从而形成圆形掩模。 基板被各向同性地蚀刻，从而产生尖锐的凹凸。
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10.发明授权Methods of making an etch mask and etching a substrate using said etch mask 失效使用所述蚀刻掩模制造蚀刻掩模和蚀刻衬底的方法公开(公告)号：US06423239B1
公开(公告)日：2002-07-23
申请号：US09591192
申请日：2000-06-08
申请人： David A. Cathey , Kevin Tjaden
发明人： David A. Cathey , Kevin Tjaden
IPC分类号： H01J900
CPC分类号： H01J9/025 , H01J2201/30403
摘要： A method for fabricating sharp asperities. A substrate is provided which has a mask layer disposed thereon, and a layer of micro-spheres is disposed superjacent the mask layer. The micro-spheres are for patterning the mask layer. Portions of the mask layer are selectively removed, thereby forming circular masks. The substrate is isotropically etched, thereby creating sharp asperities.
摘要翻译： 一种制造尖锐凹凸的方法。 提供了具有设置在其上的掩模层的基板，并且在该掩模层的上方布置一层微球。 微球用于图案化掩模层。 选择性地去除掩模层的一部分，从而形成圆形掩模。 基板被各向同性地蚀刻，从而产生尖锐的凹凸。
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