Method for making a photonic structure
    10.
    发明授权
    Method for making a photonic structure 有权
    制造光子结构的方法

    公开(公告)号:US07507441B2

    公开(公告)日:2009-03-24

    申请号:US10885051

    申请日:2004-07-06

    IPC分类号: C23C16/00 B05D5/06

    摘要: A method for making a photonic structure, including creating a first vapor stream of a first vapor material, the first vapor stream having a first non-uniform flux in at least one direction; and moving a substrate in at least a portion of the vapor stream. In addition, the method includes depositing the first vapor material on a first major surface of said substrate, and forming a first layer and a density gradient in the first layer during deposition. The first layer is disposed on and the density gradient is in a direction perpendicular to the first major surface.

    摘要翻译: 一种制造光子结构的方法,包括产生第一蒸汽材料的第一蒸气流,所述第一蒸气流在至少一个方向上具有第一非均匀流量; 以及在所述蒸气流的至少一部分中移动衬底。 此外,该方法包括将第一蒸气材料沉积在所述衬底的第一主表面上,以及在沉积期间在第一层中形成第一层和密度梯度。 第一层设置在其上,密度梯度在与第一主表面垂直的方向上。