公开(公告)号：US08543557B2

公开(公告)日：2013-09-24

申请号：US11096845

申请日：2005-04-01

申请人： David M. Aikens ,  Youxian Wen ,  Walter Lee Smith

发明人： David M. Aikens ,  Youxian Wen ,  Walter Lee Smith

IPC分类号： G06F7/00

CPC分类号： G01N21/47 ,  G01N21/9501 ,  G01N21/956 ,  Y10S707/99936 ,  Y10S707/99943

摘要： An optical metrology includes a library, a metrology tool and a library evolution tool. The library is generated to include a series of predicted measurements. Each predicted measurement is intended to match the measurements that a metrology device would record when analyzing a corresponding physical structure. The metrology tool compares its empirical measurements to the predicted measurements in the library. If a match is found, the metrology tool extracts a description of the corresponding physical structure from the library. The library evolution tool operates to improve the efficiency of the library. To make these improvements, the library evolution tool statistically analyzes the usage pattern of the library. Based on this analysis, the library evolution tool increases the resolution of commonly used portions of the library. The library evolution tool may also optionally reduce the resolution of less used portions of the library.

公开(公告)号：US06898596B2

公开(公告)日：2005-05-24

申请号：US10145848

申请日：2002-05-14

申请人： David M. Aikens ,  Youxian Wen ,  Walter Lee Smith

发明人： David M. Aikens ,  Youxian Wen ,  Walter Lee Smith

IPC分类号： G01N21/47 ,  G01N21/95 ,  G01N21/956 ,  G06F17/30

CPC分类号： G01N21/47 ,  G01N21/9501 ,  G01N21/956 ,  Y10S707/99936 ,  Y10S707/99943

摘要： An optical metrology includes a library, a metrology tool and a library evolution tool. The library is generated to include a series of predicted measurements. Each predicted measurement is intended to match the measurements that a metrology device would record when analyzing a corresponding physical structure. The metrology tool compares its empirical measurements to the predicted measurements in the library. If a match is found, the metrology tool extracts a description of the corresponding physical structure from the library. The library evolution tool operates to improve the efficiency of the library. To make these improvements, the library evolution tool statistically analyzes the usage pattern of the library. Based on this analysis, the library evolution tool increases the resolution of commonly used portions of the library. The library evolution tool may also optionally reduce the resolution of less used portions of the library.

摘要翻译： 光学计量学包括图书馆，计量工具和图书馆进化工具。 生成库以包括一系列预测的测量。 每个预测的测量旨在与测量设备在分析相应的物理结构时记录的测量值相匹配。 计量工具将其经验测量与库中的预测测量进行比较。 如果找到匹配项，则计量工具从库中提取对应物理结构的描述。 图书馆进化工具可以提高图书馆的效率。 为了进行这些改进，图书馆进化工具统计分析图书馆的使用模式。 基于此分析，图书馆进化工具增加了图书馆常用部分的分辨率。 图书馆进化工具还可以选择性地降低图书馆较少使用部分的分辨率。

公开(公告)号：US06791310B2

公开(公告)日：2004-09-14

申请号：US10205868

申请日：2002-07-26

申请人： Walter Lee Smith

发明人： Walter Lee Smith

IPC分类号： G01R3126

CPC分类号： G01N21/21

摘要： A combination metrology tool is disclosed for analyzing samples, and in particular semiconductor samples. The device includes a first measurement module for determining electrical characteristics of the sample. In general, such a measurement module will monitor voltage or capacitance characteristics to derive information such as carrier lifetimes, diffusion lengths and surface doping. The device also includes a second measurement module for determining compositional characteristics such as layer thickness, index of refraction and extinction coefficient. The second measurement module will include a light source for generating a probe beam which interacts with the sample. A detection system is provided for monitoring either the change in magnitude or polarization state of the probe beam. The output signals from both measurement modules are combined by a processor to more accurately evaluate the sample.

摘要翻译： 公开了用于分析样品，特别是半导体样品的组合计量工具。 该装置包括用于确定样品的电特性的第一测量模块。 通常，这样的测量模块将监视电压或电容特性以导出诸如载体寿命，扩散长度和表面掺杂的信息。 该装置还包括用于确定诸如层厚度，折射率和消光系数等组成特征的第二测量模块。 第二测量模块将包括用于产生与样品相互作用的探测光束的光源。 提供了一种检测系统，用于监测探测光束的幅度或极化状态的变化。 来自两个测量模块的输出信号由处理器组合以更精确地评​​估样品。

公开(公告)号：US06982567B2

公开(公告)日：2006-01-03

申请号：US10843192

申请日：2004-05-11

申请人： Walter Lee Smith

发明人： Walter Lee Smith

IPC分类号： G01R31/26

CPC分类号： G01N21/21

摘要： A combination metrology tool is disclosed for analyzing samples, and in particular semiconductor samples. The device includes a first measurement module for determining electrical characteristics of the sample. In general, such a measurement module will monitor electrical characteristics to derive information such as carrier lifetimes, diffusion lengths and surface doping. The device also includes a second measurement module for determining compositional characteristics such as layer thickness, index of refraction and extinction coefficient. The second measurement module will include a light source for generating a probe beam which interacts with the sample. A detection system is provided for monitoring either the change in magnitude or polarization state of the probe beam. The output signals from both measurement modules are combined by a processor to more accurately evaluate the sample.

摘要翻译： 公开了用于分析样品，特别是半导体样品的组合计量工具。 该装置包括用于确定样品的电特性的第一测量模块。 通常，这样的测量模块将监测电特性以导出诸如载体寿命，扩散长度和表面掺杂的信息。 该装置还包括用于确定诸如层厚度，折射率和消光系数等组成特征的第二测量模块。 第二测量模块将包括用于产生与样品相互作用的探测光束的光源。 提供了一种检测系统，用于监测探测光束的幅度或极化状态的变化。 来自两个测量模块的输出信号由处理器组合以更精确地评​​估样品。

公开(公告)号：US06888632B2

公开(公告)日：2005-05-03

申请号：US10376750

申请日：2003-02-28

申请人： Walter Lee Smith

发明人： Walter Lee Smith

IPC分类号： G01N21/17 ,  G01N21/47 ,  G01J4/00

CPC分类号： G01N21/1717 ,  G01N21/4788 ,  G01N2021/1719

摘要： An apparatus for scatterometry measurements is disclosed. The apparatus includes a modulated pump source for exciting the sample. A separate probe beam is directed to interact with the sample and the modulated optical response is measured. The measured data is subjected to a scatterometry analysis in order to evaluate geometrical sample features that induce light scattering.

摘要翻译： 公开了一种用于散射测量的装置。 该装置包括用于激发样品的调制泵浦源。 引导单独的探针光束与样品相互作用，并测量调制的光学响应。 对测量数据进行散射分析，以评估诱导光散射的几何样本特征。

公开(公告)号：US07400402B2

公开(公告)日：2008-07-15

申请号：US11657368

申请日：2007-01-24

申请人： Walter Lee Smith

发明人： Walter Lee Smith

IPC分类号： G01J4/00 ,  G01N21/00

CPC分类号： G01N21/1717 ,  G01N21/4788 ,  G01N2021/1719

摘要： An apparatus for scatterometry measurements is disclosed. The apparatus includes a modulated pump source for exciting the sample. A separate probe beam is directed to interact with the sample and the modulated optical response is measured. The measured data is subjected to a scatterometry analysis in order to evaluate geometrical sample features that induce light scattering.

摘要翻译： 公开了一种用于散射测量的装置。 该装置包括用于激发样品的调制泵浦源。 引导单独的探针光束与样品相互作用，并测量调制的光学响应。 对测量数据进行散射分析，以评估诱导光散射的几何样本特征。

公开(公告)号：US07239390B2

公开(公告)日：2007-07-03

申请号：US11088538

申请日：2005-03-24

申请人： Walter Lee Smith

发明人： Walter Lee Smith

IPC分类号： G01J4/00

CPC分类号： G01N21/1717 ,  G01N21/4788 ,  G01N2021/1719

摘要： An apparatus for scatterometry measurements is disclosed. The apparatus includes a modulated pump source for exciting the sample. A separate probe beam is directed to interact with the sample and the modulated optical response is measured. The measured data is subjected to a scatterometry analysis in order to evaluate geometrical sample features that induce light scattering.

公开(公告)号：US06950190B2

公开(公告)日：2005-09-27

申请号：US10339147

申请日：2003-01-09

申请人： Walter Lee Smith

发明人： Walter Lee Smith

IPC分类号： G01N21/47 ,  G03F7/20

CPC分类号： G03F7/70616 ,  G01N21/4738

摘要： The use of scatterometry measurements is proposed for the evaluation of the implantation or annealing of dopants in a semiconductor. In accordance with the subject method, a probe beam of light illuminates the wafer having the dopants implanted therein. The light reflected from the sample is measured and subjected to a scatterometry analysis. The information derived is correlated to the implant region so that parameters of the implant, such as depth of a junction and lateral spreading of the implant or the dose of implanted ions can be evaluated.

摘要翻译： 提出了散射测量的使用用于评估半导体中掺杂剂的注入或退火。 根据本发明的方法，探测光束照射其中植入有掺杂剂的晶片。 测量从样品反射的光并进行散射分析。 导出的信息与植入区域相关，使得可以评估植入物的参数，例如结合物的深度和植入物的横向扩展或植入离子的剂量。