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    Temperable three layer antireflective coating, coated article including temperable three layer antireflective coating, and/or method of making the same
    1.
    发明授权
    Temperable three layer antireflective coating, coated article including temperable three layer antireflective coating, and/or method of making the same 有权
    耐温三层抗反射涂层，包括耐温三层抗反射涂层的涂层制品和/或制造该层的方法

    公开(公告)号：US08693097B2

    公开(公告)日：2014-04-08

    申请号：US12923146

    申请日：2010-09-03

    申请人： David M. Broadway ,  Yiwei Lu ,  Willem den Boer ,  Darrell Golden ,  Paul Patriacca ,  Gregory Scott

    发明人： David M. Broadway ,  Yiwei Lu ,  Willem den Boer ,  Darrell Golden ,  Paul Patriacca ,  Gregory Scott

    IPC分类号： G02B1/11 ,  G02B1/12

    CPC分类号： G02B1/115 ,  C03C17/3435 ,  C03C2217/734

    摘要： A coated article includes a temperable antireflection (AR) coating that utilizes medium and low index (index of refraction “n”) layers having compressive residual stress in the AR coating. In certain example embodiments, the coating may include the following layers from the glass substrate outwardly: silicon oxynitride (SiOxNy) medium index layer/high index layer/low index layer. In certain example embodiments, depending on the chemical and optical properties of the high index layer and the substrate, the medium and low index layers of the AR coating are selected to cause a net compressive residual stress and thus optimize the overall performance of the antireflection coating when the coated article is tempered and/or heat-treated.

    摘要翻译： 涂覆制品包括使用在AR涂层中具有压缩残余应力的中等和低折射率（折射率“n”）层的可回火抗反射（AR）涂层。 在某些示例性实施例中，涂层可以包括从玻璃基板向外的以下层：氮氧化硅（SiO x N y）介质折射率层/高折射率层/低折射率层。 在某些示例性实施方案中，根据高折射率层和基底的化学和光学性质，选择AR涂层的介质和低折射率层以产生净压缩残余应力，从而优化抗反射涂层的整体性能 当涂层制品回火和/或热处理时。

    Method of enhancing the conductive and optical properties of deposited indium tin oxide (ITO) thin films
    2.
    发明授权
    Method of enhancing the conductive and optical properties of deposited indium tin oxide (ITO) thin films 失效
    提高沉积氧化铟锡（ITO）薄膜导电性能和光学性能的方法

    公开(公告)号：US08445373B2

    公开(公告)日：2013-05-21

    申请号：US12457006

    申请日：2009-05-28

    申请人： David M. Broadway ,  Yiwei Lu

    发明人： David M. Broadway ,  Yiwei Lu

    IPC分类号： H01L21/44

    CPC分类号： H01L31/1884 ,  B32B17/10036 ,  B32B17/10761 ,  B32B17/10788 ,  H01L31/022466 ,  H01L31/022475 ,  Y02E10/50

    摘要： Certain example embodiments of this invention relate to a method of activating an indium tin oxide (ITO) thin film deposited, directly or indirectly, on a substrate. The ITO thin film is baked in a low oxygen environment at a temperature of at least 450 degrees C. for at least 10 minutes so as to provide for (1) a post-baked resistivity of the ITO thin film that is below a resistivity of a corresponding air-baked ITO thin film, (2) a post-baked visible spectrum absorption and transmission of the ITO thin film that respectively are below and above the absorption and transmission of the corresponding air-baked ITO thin film, and (3) a post-baked infrared reflectivity of the ITO thin film that is above the reflectivity of the corresponding air-baked ITO thin film. The substrate with the activated ITO thin film may be used in a photovoltaic device, for example.

    摘要翻译： 本发明的某些示例性实施例涉及一种激活在衬底上直接或间接沉积的氧化铟锡（ITO）薄膜的方法。 ITO薄膜在低氧环境中在至少450℃的温度下烘烤至少10分钟，从而提供（1）ITO薄膜的后烘烤电阻率低于 相应的空气焙烧ITO薄膜，（2）ITO薄膜的后烘烤可见光谱吸收和透射分别在相应的空气焙烧ITO薄膜的吸收和透射之下和之上，和（3） ITO薄膜的后烘焙红外反射率高于相应的空气焙烧ITO薄膜的反射率。 具有活化的ITO薄膜的基板例如可以用在光电器件中。

    Temperable three layer antirefrlective coating, coated article including temperable three layer antirefrlective coating, and/or method of making the same
    3.
    发明申请
    Temperable three layer antirefrlective coating, coated article including temperable three layer antirefrlective coating, and/or method of making the same 有权
    耐火三层抗反射涂层，包括耐火三层抗反射涂层的涂层制品，和/或其制备方法

    公开(公告)号：US20120057236A1

    公开(公告)日：2012-03-08

    申请号：US12923838

    申请日：2010-10-08

    申请人： David M. Broadway ,  Yiwei Lu

    发明人： David M. Broadway ,  Yiwei Lu

    IPC分类号： G02B1/11

    CPC分类号： C03C17/3435 ,  C03C2217/73 ,  C03C2218/365 ,  G02B1/115

    摘要： A coated article includes a temperable antireflection (AR) coating that utilizes medium and low index (index of refraction “n”) layers having compressive residual stress in the AR coating. In certain example embodiments, the coating may include the following layers from the glass substrate outwardly: silicon oxynitride (SiOxNy) medium index layer/high index layer/low index layer. In certain example embodiments, depending on the chemical and optical properties of the high index layer and the substrate, the medium and low index layers of the AR coating are selected to cause a net compressive residual stress and thus optimize the overall performance of the antireflection coating when the coated article is tempered and/or heat-treated.

    摘要翻译： 涂覆制品包括使用在AR涂层中具有压缩残余应力的中等和低折射率（折射率“n”）层的可回火抗反射（AR）涂层。 在某些示例性实施例中，涂层可以包括从玻璃基板向外的以下层：氮氧化硅（SiO x N y）介质折射率层/高折射率层/低折射率层。 在某些示例性实施方案中，根据高折射率层和基底的化学和光学性质，选择AR涂层的介质和低折射率层以产生净压缩残余应力，从而优化抗反射涂层的整体性能 当涂层制品回火和/或热处理时。

    Method of enhancing the conductive and optical properties of deposited indium tin oxide (ITO) thin films
    4.
    发明申请
    Method of enhancing the conductive and optical properties of deposited indium tin oxide (ITO) thin films 失效
    提高沉积氧化铟锡（ITO）薄膜导电性能和光学性能的方法

    公开(公告)号：US20100304523A1

    公开(公告)日：2010-12-02

    申请号：US12457006

    申请日：2009-05-28

    申请人： David M. Broadway ,  Yiwei Lu

    发明人： David M. Broadway ,  Yiwei Lu

    IPC分类号： H01L21/283 ,  F27B5/00

    CPC分类号： H01L31/1884 ,  B32B17/10036 ,  B32B17/10761 ,  B32B17/10788 ,  H01L31/022466 ,  H01L31/022475 ,  Y02E10/50

    摘要： Certain example embodiments of this invention relate to a method of activating an indium tin oxide (ITO) thin film deposited, directly or indirectly, on a substrate. The ITO thin film is baked in a low oxygen environment at a temperature of at least 450 degrees C. for at least 10 minutes so as to provide for (1) a post-baked resistivity of the ITO thin film that is below a resistivity of a corresponding air-baked ITO thin film, (2) a post-baked visible spectrum absorption and transmission of the ITO thin film that respectively are below and above the absorption and transmission of the corresponding air-baked ITO thin film, and (3) a post-baked infrared reflectivity of the ITO thin film that is above the reflectivity of the corresponding air-baked ITO thin film. The substrate with the activated ITO thin film may be used in a photovoltaic device, for example.

    摘要翻译： 本发明的某些示例性实施例涉及一种激活在衬底上直接或间接沉积的氧化铟锡（ITO）薄膜的方法。 ITO薄膜在低氧环境中在至少450℃的温度下烘烤至少10分钟，从而提供（1）ITO薄膜的后烘烤电阻率低于 相应的空气焙烧ITO薄膜，（2）ITO薄膜的后烘烤可见光谱吸收和透射分别在相应的空气焙烧ITO薄膜的吸收和透射之下和之上，和（3） ITO薄膜的后烘焙红外反射率高于相应的空气焙烧ITO薄膜的反射率。 具有活化的ITO薄膜的基板例如可以用在光电器件中。

    Temperable three layer antireflective coating, coated article including temperable three layer antireflective coating, and/or method of making the same
    6.
    发明申请
    Temperable three layer antireflective coating, coated article including temperable three layer antireflective coating, and/or method of making the same 有权
    耐温三层抗反射涂层，包括耐温三层抗反射涂层的涂层制品和/或制造该层的方法

    公开(公告)号：US20110157703A1

    公开(公告)日：2011-06-30

    申请号：US12923146

    申请日：2010-09-03

    申请人： David M. Broadway ,  Yiwei Lu ,  Willem den Boer ,  Darrell Golden ,  Paul Patriacca ,  Gregory Scott

    发明人： David M. Broadway ,  Yiwei Lu ,  Willem den Boer ,  Darrell Golden ,  Paul Patriacca ,  Gregory Scott

    IPC分类号： G02B1/11 ,  B05D5/06

    CPC分类号： G02B1/115 ,  C03C17/3435 ,  C03C2217/734

    摘要： A coated article includes a temperable antireflection (AR) coating that utilizes medium and low index (index of refraction “n”) layers having compressive residual stress in the AR coating. In certain example embodiments, the coating may include the following layers from the glass substrate outwardly: silicon oxynitride (SiOxNy) medium index layer/high index layer/low index layer. In certain example embodiments, depending on the chemical and optical properties of the high index layer and the substrate, the medium and low index layers of the AR coating are selected to cause a net compressive residual stress and thus optimize the overall performance of the antireflection coating when the coated article is tempered and/or heat-treated.

    摘要翻译： 涂覆制品包括使用在AR涂层中具有压缩残余应力的中等和低折射率（折射率“n”）层的可回火抗反射（AR）涂层。 在某些示例性实施例中，涂层可以包括从玻璃基板向外的以下层：氮氧化硅（SiO x N y）介质折射率层/高折射率层/低折射率层。 在某些示例性实施方案中，根据高折射率层和基底的化学和光学性质，选择AR涂层的介质和低折射率层以产生净压缩残余应力，从而优化抗反射涂层的整体性能 当涂层制品回火和/或热处理时。

    Silicon titanium oxide coating, coated article including silicon titanium oxide coating, and method of making the same
    9.
    发明授权
    Silicon titanium oxide coating, coated article including silicon titanium oxide coating, and method of making the same 有权
    硅氧化钛涂层，包括硅氧化钛涂层的涂层制品及其制造方法

    公开(公告)号：US08679302B2

    公开(公告)日：2014-03-25

    申请号：US12923837

    申请日：2010-10-08

    申请人： Yiwei Lu

    发明人： Yiwei Lu

    IPC分类号： C23C14/34

    CPC分类号： G02B1/115 ,  C03C17/3417 ,  C03C17/3423 ,  C03C17/3435 ,  C03C2217/212 ,  C03C2217/213 ,  C03C2217/23 ,  C03C2217/73 ,  C03C2217/734 ,  C03C2217/94 ,  C03C2218/154 ,  C03C2218/155 ,  C03C2218/156 ,  C23C14/08 ,  C23C14/3414 ,  Y10T428/24975

    摘要： Certain example embodiments relate to a layer of or including Ti1-xSixOy and/or a method of making the same. In certain example embodiments, the Ti1-xSixOy-based layer may be substoichiometric with respect to oxygen. In certain example embodiments of this invention, the layer may include Ti1-xSixOy where x is from about 0.05 to 0.95 (more preferably from about 0.1 to 0.9, and even more preferably from about 0.2 to 0.8, and possibly from about 0.5 to 0.8) and y is from about 0.2 to 2 (more preferably from about 1 to 2, and even more preferably from about 1.5 to 2, and possibly from about 1.9 to 2). The layer may have an index of refraction of from about 1.6 to 1.9. The layer may also be used with a transparent conductive oxide in a transparent conductive coating.

    摘要翻译： 某些示例实施例涉及或包括Ti1-xSixOy层和/或其制造方法。 在某些示例性实施方案中，Ti 1-x Si x O y基层可以相对于氧为亚化学计量。 在本发明的某些示例性实施方案中，该层可以包括Ti1-xSixOy，其中x为约0.05至0.95（更优选为约0.1至0.9，甚至更优选约0.2至0.8，并且可能为约0.5至0.8） y为约0.2至2（更优选约1至2，甚至更优选约1.5至2，可能为约1.9至2）。 该层可以具有约1.6至1.9的折射率。 该层还可以与透明导电涂层中的透明导电氧化物一起使用。