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108 条记录 (耗时 0.024 秒)

    Hot filament CVD of thick, adherent and coherent polycrystalline diamond films
    1.
    发明授权
    Hot filament CVD of thick, adherent and coherent polycrystalline diamond films 失效
    厚丝，粘附和相干多晶金刚石薄膜的热丝CVD

    公开(公告)号：US5147687A

    公开(公告)日：1992-09-15

    申请号：US707984

    申请日：1991-05-22

    申请人： Diwakar Garg ,  Sui-Yuan Lynn ,  Robert L. Iampietro ,  Ernest L. Wrecsics ,  Paul N. Dyer

    发明人： Diwakar Garg ,  Sui-Yuan Lynn ,  Robert L. Iampietro ,  Ernest L. Wrecsics ,  Paul N. Dyer

    IPC分类号： C23C16/27 ,  C23C16/54

    CPC分类号： C23C16/54 ,  C23C16/271 ,  C23C16/279 ,  Y10T428/30

    摘要： A thick, adherent and coherent polycrystalline diamond (PCD) coated substrate product is disclosed which comprises either a metallic or ceramic substrate and a plurality of separately deposited PCD layers of substantially uniform microstructure and having high electrical resistivity. The method for depositing multi-layers of PCD film onto the substrate comprises chemically depositing at least two separate polycrystalline diamond layers onto the substrate deposition conditions which are substantially different between cycles. The method enables one to deposit PCD films having a thickness of at least 12 microns for applications on flat as well as curved substrates having wide use in the electronics industry. Thick PCT films of this invention have been found to be ideal for dissipating heat from radio frequency (RF) and microwave (MW) devices.

    摘要翻译： 公开了一种厚的，粘附和一致的多晶金刚石（PCD）涂覆的基底产品，其包括金属或陶瓷基底和多个基本上均匀的微结构并且具有高电阻率的单独沉积的PCD层。 将多层PCD膜沉积到衬底上的方法包括将至少两个单独的多晶金刚石层化学沉积到在循环之间基本不同的衬底沉积条件上。 该方法使得能够沉积具有至少12微米厚度的PCD膜用于在电子工业中广泛使用的平面以及弯曲基板上的应用。 已经发现本发明的PCT薄膜对于从射频（RF）和微波（MW）装置中散热是理想的。

    Interrupted method for producing multilayered polycrystalline diamond films
    2.
    发明授权
    Interrupted method for producing multilayered polycrystalline diamond films 失效
    用于制造多层多晶金刚石膜的中断方法

    公开(公告)号：US5124179A

    公开(公告)日：1992-06-23

    申请号：US582515

    申请日：1990-09-13

    申请人： Diwakar Garg ,  Sui-Yuan Lynn ,  Robert L. Iampietro ,  Ernest L. Wrecsics ,  Paul N. Dyer

    发明人： Diwakar Garg ,  Sui-Yuan Lynn ,  Robert L. Iampietro ,  Ernest L. Wrecsics ,  Paul N. Dyer

    IPC分类号： C23C16/27 ,  C23C16/46

    CPC分类号： C23C16/46 ,  C23C16/271 ,  C23C16/279

    摘要： The method for depositing multilayers of PCD film onto the substrate comprises chemically depositing a polycrystalline diamond layers onto the substrate at deposition temperatures in the range of 650.degree. to 825.degree. C., interrupting the deposition process with a cool-down step and then depositing at least one other layer under the same deposition conditions. The method enables one to deposit PCD films having a thickness of at least 12 microns for applications on flat as well as curved substrates having wide use in the electronics industry. Thick PCD films of this invention have been found to be ideal for dissipating heat from radio frequency (RF) and microwave (MW) devices.

    摘要翻译： 将PCD膜的多层膜沉积到衬底上的方法包括在650℃至825℃的沉积温度下将多晶金刚石层化学沉积到衬底上，用冷却步骤中断沉积过程，然后沉积在 在相同的沉积条件下至少另外一层。 该方法使得能够沉积具有至少12微米厚度的PCD膜用于在电子工业中广泛使用的平面以及弯曲基板上的应用。 已经发现本发明的厚PCD膜对于从射频（RF）和微波（MW）装置散热是理想的。

    Low temperature chemical vapor deposition method for forming tungsten and tungsten carbide
    3.
    发明授权
    Low temperature chemical vapor deposition method for forming tungsten and tungsten carbide 失效
    用于形成钨和碳化钨的低温化学气相沉积方法

    公开(公告)号：US5006371A

    公开(公告)日：1991-04-09

    申请号：US490184

    申请日：1990-03-08

    申请人： Diwakar Garg ,  Ernest L. Wrecsics ,  Leslie E. Schaffer ,  Carl F. Mueller ,  Paul N. Dyer ,  Keith R. Fabregas

    发明人： Diwakar Garg ,  Ernest L. Wrecsics ,  Leslie E. Schaffer ,  Carl F. Mueller ,  Paul N. Dyer ,  Keith R. Fabregas

    IPC分类号： C23C16/14 ,  C23C16/30 ,  C23C28/00

    CPC分类号： C23C28/00 ,  C23C16/14 ,  C23C16/30

    摘要： An improved highly erosive and abrasive wear resistant multi-layered coating system on a substrate which provides protection against impact of large particles is disclosed comprising a plurality of composite layers. In each of the composite layers, the first layer closest to the substrate comprises tungsten of sufficient thickness to confer substantial erosion and abrasion wear resistance characteristics to the coating system and a second layer deposited on the first layer comprises a mixture of tungsten and tungsten carbide and the tungsten carbide comprises W.sub.2 C, W.sub.3 C, or a mixture of both. Because the resulting coating system has enhanced high cycle fatigue strength over the substrate, the coating system is especially useful on such structures as turbine blades and similar articles of manufacture where such chemical vapor depositing the first and second layers at a temperature in the range of about 300.degree. to about 550.degree. C. and then repeating the chemical vapor deposition steps to achieve the multi-layered coating system such that the overall thickness of the system is at least about 20 .mu.m.

    摘要翻译： 公开了一种改进的高侵蚀性和磨蚀性耐磨多层涂层系统，其在基板上提供防止大颗粒冲击的保护，其包括多个复合层。 在每个复合层中，最靠近基底的第一层包括足够厚度的钨，以赋予涂层体系显着的侵蚀和磨损耐磨特性，而沉积在第一层上的第二层包括钨和碳化钨的混合物，以及 碳化钨包括W2C，W3C或两者的混合物。 由于所得到的涂层体系在衬底上具有增强的高循环疲劳强度，因此涂层系统特别适用于诸如涡轮机叶片和类似制品的结构，其中这种化学气相沉积第一和第二层的温度范围为约 然后重复化学气相沉积步骤以实现多层涂层体系，使得系统的总体厚度至少为20微米。

    Method for depositing highly erosive and abrasive wear resistant composite coating system on a substrate
    4.
    发明授权
    Method for depositing highly erosive and abrasive wear resistant composite coating system on a substrate 失效
    在基材上沉积高侵蚀性和磨蚀性耐磨复合涂层体系的方法

    公开(公告)号：US5024901A

    公开(公告)日：1991-06-18

    申请号：US346774

    申请日：1989-05-03

    申请人： Diwakar Garg ,  Paul N. Dyer ,  Leslie E. Schaffer ,  Ernest L. Wrecsics ,  Duane Dimos ,  Carl F. Mueller

    发明人： Diwakar Garg ,  Paul N. Dyer ,  Leslie E. Schaffer ,  Ernest L. Wrecsics ,  Duane Dimos ,  Carl F. Mueller

    IPC分类号： C23C16/14 ,  C23C16/30 ,  C23C28/00

    CPC分类号： C23C16/30 ,  C23C16/14 ,  C23C28/00 ,  Y10T428/12576 ,  Y10T428/12583 ,  Y10T428/1284 ,  Y10T428/12944

    摘要： The method for producing the disclosed material comprises chemical vapor depositing on the substrate a substantially columnar, intermediate layer of tungsten and chemical vapor depositing on the intermediate layer a non-columnar, substantially lamellar outer layer of a mixture of tungsten and tungsten carbide. The tungsten carbide comprises W.sub.2 C, W.sub.3 C, or a mixture of both wherein the ratio of the thickness of the tungsten intermediate layer to the thickness of the outer layer is at least: (a) 0.35 in the case of tungsten plus W.sub.2 C in the outer layer, (b) 0.6 in the case of a mixture of tungsten and W.sub.3 C in the outer layer and (c) 0.35 in the case of mixtures of tungsten and W.sub.2 C and W.sub.3 C in the outer layer. The chemical vapor deposition steps are carried out at pressures within the range of 1 Torr to 1,000 Torr and temperatures within the range of about 300.degree. to about 650.degree. C.

    摘要翻译： 用于生产所公开的材料的方法包括在基底上化学气相沉积基本上柱状的钨中间层和在中间层上沉积钨和碳化钨混合物的非圆柱形，基本上层状的外层的化学气相。 碳化钨包括W2C，W3C或两者的混合物，其中钨中间层的厚度与外层的厚度的比至少为：（a）在外加层中钨加W2C的情况下为0.35 ，（b）在外层为钨和W3C的混合物的情况下为0.6，（c）在外层为钨和W2C和W3C的混合物的情况下为0.35。 化学气相沉积步骤在1乇至1000乇范围内的压力和约300至约650℃范围内的温度下进行。

    High erosion/wear resistant multi-layered coating system
    5.
    发明授权
    High erosion/wear resistant multi-layered coating system 失效
    高侵蚀/耐磨多层涂层系统

    公开(公告)号：US4927713A

    公开(公告)日：1990-05-22

    申请号：US389206

    申请日：1989-08-02

    申请人： Diwakar Garg ,  Ernest L. Wrecsics ,  Leslie E. Schaffer ,  Carl F. Mueller ,  Paul N. Dyer ,  Keith R. Fabregas

    发明人： Diwakar Garg ,  Ernest L. Wrecsics ,  Leslie E. Schaffer ,  Carl F. Mueller ,  Paul N. Dyer ,  Keith R. Fabregas

    IPC分类号： C23C16/00 ,  C23C16/14 ,  C23C16/30 ,  C23C16/32 ,  C23C28/00

    CPC分类号： C23C28/00 ,  C23C16/14 ,  C23C16/30 ,  Y10T428/12576 ,  Y10T428/12583 ,  Y10T428/12632 ,  Y10T428/1284

    摘要： An improved highly erosive and abrasive wear resistant multi-layered coating system on a substrate which provides protection against impact of large particles is disclosed comprising a plurality of composite layers. In each of the composite layers, the first layer closest to the substrate comprises tungsten of sufficient thickness to confer substantial erosion and abrasion wear resistance characteristics to the coating system and a second layer deposited on the first layer comprises a mixture of tungsten and tungsten carbide and the tungsten carbide comprises W.sub.2 C, W.sub.3 C, or a mixture of both. Because the resulting coating system has enhanced high cycle fatigue strength over the substrate, the coating system is especially useful on such structures as turbine blades and similar articles of manufacture where such high stress cycles occur during normal operation. Also dislcosed is the method for preparing such improved composite coating systems.

    摘要翻译： 公开了一种改进的高侵蚀性和磨蚀性耐磨多层涂层系统，其在基板上提供防止大颗粒冲击的保护，其包括多个复合层。 在每个复合层中，最靠近基底的第一层包括足够厚度的钨，以赋予涂层体系显着的侵蚀和磨损耐磨特性，而沉积在第一层上的第二层包括钨和碳化钨的混合物，以及 碳化钨包括W2C，W3C或两者的混合物。 由于所得到的涂层体系在衬底上具有增强的高循环疲劳强度，所以涂覆系统在诸如涡轮机叶片和类似的制品之类的结构中是特别有用的，其中在正常操作期间发生如此高的应力循环。 制备这种改进的复合涂层体系的方法也是一个缺点。

    HFCVD method for producing thick, adherent and coherent polycrystalline diamonds films
    9.
    发明授权
    HFCVD method for producing thick, adherent and coherent polycrystalline diamonds films 失效
    用于生产厚的，粘附的和一致的多晶金刚石膜的HFCVD方法

    公开(公告)号：US5186973A

    公开(公告)日：1993-02-16

    申请号：US582439

    申请日：1990-09-13

    申请人： Diwakar Garg ,  Wilman Tsai ,  Fred M. Kimock ,  Robert L. Iampietro ,  Paul N. Dyer

    发明人： Diwakar Garg ,  Wilman Tsai ,  Fred M. Kimock ,  Robert L. Iampietro ,  Paul N. Dyer

    IPC分类号： C23C16/27

    CPC分类号： C23C16/279 ,  C23C16/271 ,  Y10T428/30

    摘要： A method for depositing a thick, adherent and coherent polycrystalline diamond (PCD) film onto a metallic substrate using a deposition rate of no greater than 0.4 .mu.m per hour. The resulting PCD Film has a smooth surface finish, enhanced crystal orientation in comparision to industrial grade diamond powder particularly in the (220) and (400) directions, and excellent electrical and thermal properties. The method enables one to deposit PCD films having a thickness of at least 12 microns for applications on flat as well as curved substrates having wide use in the electronics industry. Thick PCD films of this invention have been found to be ideal for dissipating heat from radio frequency (RF) and microwave (MW) devices.

    摘要翻译： 使用不大于0.4微米/小时的沉积速率将厚的粘附和粘附多晶金刚石（PCD）膜沉积到金属基底上的方法。 所得到的PCD膜具有光滑的表面光洁度，与工业级金刚石粉末相比具有更好的晶体取向，特别是（220）和（400）方向，以及优异的电气和热性能。 该方法使得能够沉积具有至少12微米厚度的PCD膜用于在电子工业中广泛使用的平面以及弯曲基板上的应用。 已经发现本发明的厚PCD膜对于从射频（RF）和微波（MW）装置散热是理想的。

    Hot filament chemical vapor deposition reactor
    10.
    发明授权
    Hot filament chemical vapor deposition reactor 失效
    热丝化学气相沉积反应器

    公开(公告)号：US5160544A

    公开(公告)日：1992-11-03

    申请号：US578734

    申请日：1990-09-06

    申请人： Diwakar Garg ,  Wilman Tsai ,  Robert L. Iampietro ,  Fred M. Kimock ,  C. Michael Kelly

    发明人： Diwakar Garg ,  Wilman Tsai ,  Robert L. Iampietro ,  Fred M. Kimock ,  C. Michael Kelly

    IPC分类号： C23C16/27 ,  C23C16/44 ,  C23C16/455 ,  C23C16/458

    CPC分类号： C23C16/45565 ,  C23C16/271 ,  C23C16/455 ,  C23C16/45568 ,  C23C16/458

    摘要： An improved hot filament chemical vapor deposition (HFCVD) reactor is disclosed comprising a gas dispersion system, a filament network and an apertured support plate for the substrate. The apertures in the support plate provide for counteracting the natural pressure and temperature gradients which arise within the reactor so that a uniform deposit or material can be coated over the entire surface of multiple small pieces simultaneously. Specifically, the apertured support plate substantially reduces the extent of radial (stagnation point) gas flow adjacent to the substrate which significantly improves coating uniformity.

    摘要翻译： 公开了一种改进的热丝化学气相沉积（HFCVD）反应器，其包括气体分散系统，细丝网络和用于衬底的有孔支撑板。 支撑板中的孔提供抵消在反应器内产生的自然压力和温度梯度，使得均匀的沉积物或材料可以同时涂覆在多个小块的整个表面上。 具体地说，多孔支撑板基本上减小了与衬底相邻的径向（停滞点）气流的范围，这显着地改善了涂层的均匀性。