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    METAL TREATMENT COATING COMPOSITIONS, METHODS OF TREATING METALS THEREWITH AND COATED METALS PREPARED USING THE SAME
    5.
    发明申请
    METAL TREATMENT COATING COMPOSITIONS, METHODS OF TREATING METALS THEREWITH AND COATED METALS PREPARED USING THE SAME 有权
    金属处理涂料组合物，处理金属的方法和使用其制备的涂覆金属

    公开(公告)号：US20090232996A1

    公开(公告)日：2009-09-17

    申请号：US12405546

    申请日：2009-03-17

    申请人： Bruce H. Goodreau ,  Jianping Liu ,  Edis Kapic ,  Michael Febrraro

    发明人： Bruce H. Goodreau ,  Jianping Liu ,  Edis Kapic ,  Michael Febrraro

    IPC分类号： B05D1/36 ,  C09D5/08

    摘要： Methods comprising: (a) providing a coating composition comprising a fluoroacid compound of the general formula (I): XpMqFrOs  (I) wherein each of q and r independently represents an integer of 1 to 10; each of p and s independently represents an integer from 0 to 10; X represents at least one cation selected from the group consisting of hydrogen, ammonium, alkaline earth metals and alkali metals; and M represents at least one element selected from the group consisting of Ti, Zr, Hf, Si, Sn, Al, Ge, and B; (b) contacting a metal substrate with the coating composition; and (c) adding to the coating composition a component selected from the group consisting of fluorine-free compounds of an element M, Group 2 metal compounds, Group 12 metal compounds, Group 13 compounds, Group 14 compounds, and combination thereof.

    摘要翻译： 方法包括：（a）提供包含通式（I）的氟酸化合物的涂料组合物：<？在线配方说明=“在线配方”中的“末端=”铅“→XpMqFrOs（I） in-line-formula description =“In-line Formula”end =“tail”？>其中q和r各自独立地表示1到10的整数; p和s各自独立地表示0至10的整数; X表示选自氢，铵，碱土金属和碱金属中的至少一种阳离子; M表示选自Ti，Zr，Hf，Si，Sn，Al，Ge和B中的至少一种元素; （b）使金属基材与涂料组合物接触; 和（c）向涂料组合物中加入选自元素M的无氟化合物，第2族金属化合物，第12族金属化合物，第13族化合物，第14族化合物及其组合的组分。

    Pretreatment process for aluminum and high etch cleaner used therein
    6.
    发明授权
    Pretreatment process for aluminum and high etch cleaner used therein 有权
    铝及其中使用的高蚀刻清洁剂的预处理工艺

    公开(公告)号：US09163315B2

    公开(公告)日：2015-10-20

    申请号：US13531701

    申请日：2012-06-25

    申请人： Edis Kapic ,  Michael L. Sienkowski ,  Bruce H. Goodreau ,  Sophie Cornen

    发明人： Edis Kapic ,  Michael L. Sienkowski ,  Bruce H. Goodreau ,  Sophie Cornen

    IPC分类号： C23G1/22 ,  C11D7/06 ,  C11D7/26 ,  C11D7/32 ,  C11D11/00 ,  C23C22/78 ,  C23F1/36

    CPC分类号： C23G1/22 ,  C11D7/06 ,  C11D7/265 ,  C11D7/3245 ,  C11D11/0029 ,  C23C22/78 ,  C23F1/36

    摘要： A high etch cleaner for aluminum and aluminum alloy substrates that leads to enhanced corrosion protective performance of a variety of anti-corrosion pretreatments. The cleaner comprises low levels of silicate of from 0 to 250 ppm, 50 to 500 ppm of at least one chelator, and has a pH of from 11.0 to 13.5. The cleaner may be used to etch from 0.5 to 4.0 grams per meter squared from substrates. Substrates treated with the cleaner and then coated with a variety of anti-corrosion pretreatments and outer coatings show enhanced corrosion resistance compared to substrates cleaned with standard cleaners that have low etch rates, high silicate levels and no chelating agents followed by anti-corrosion pretreatments and outer coatings.

    摘要翻译： 用于铝和铝合金基材的高蚀刻清洁剂，可提高各种防腐预处理的​​防腐蚀性能。 清洁剂包含0-250ppm的低含量的硅酸盐，至少一种螯合剂的50-500ppm，pH为11.0-13.5。 该清洁剂可用于从底物刻蚀0.5至4.0克/平方米。 用清洁剂处理，然后涂覆各种防腐预处理和外涂层的基材与使用具有低蚀刻速率，高硅酸盐水平和无螯合剂，然后进行防腐预处理的​​标准清洁剂清洁的基材相比，显示出增强的耐腐蚀性 外涂层。