摘要:
An etching paste having a doping function for etching a thin film on a silicon wafer and a method of forming a selective emitter of a solar cell, the etching paste including an n-type or p-type dopant; a binder; and a solvent.
摘要:
Disclosed herein is a composition for electrodes that enables a firing process in air at a temperature of 600° C. or less and does not cause an increase in absolute resistance and a substantial variation of the resistance even when the composition is repeatedly subjected to the firing process. The composition for electrodes comprises: about 5 to about 95% by weight of aluminum powder, the aluminum powder having a particle size distribution of about 2.0 or less as expressed by the following Equation (1) and having D50 in the range of about 0.1 μm≦D50≦about 20 μm; about 3 to about 60% by weight of an organic binder; and the balance of a solvent: Particle size distribution=(D90−D10)/D50 (1) wherein D10, D50, and D90 represent particle diameters at 10%, 50% and 90% points on an accumulation curve of a particle size distribution when the total weight is 100%.An electrode and a PDP fabricated using the composition are also disclosed.
摘要:
A composition for fabricating an electrode includes an organic binder and a conductive filler. About 3 to about 60 wt. % of the composition is the organic binder, about 5 to about 95 wt. % of the composition is the conductive filler, the conductive filler includes predominantly aluminum, the conductive filler has a flake shape, and the conductive filler has an average thickness of about 0.05 μm to about 0.75 μm.
摘要:
Disclosed herein is a composition for electrodes that enables a firing process in air at a temperature of 600° C. or less and does not cause an increase in absolute resistance and a substantial variation of the resistance even when the composition is repeatedly subjected to the firing process. The composition for electrodes comprises: about 5 to about 95% by weight of aluminum powder, the aluminum powder having a particle size distribution of about 2.0 or less as expressed by the following Equation (1) and having D50 in the range of about 0.1 μm≦D50≦about 20 μm; about 3 to about 60% by weight of an organic binder; and the balance of a solvent: Particle size distribution=(D90−D10)/D50 (1) wherein D10, D50, and D90 represent particle diameters at 10%, 50% and 90% points on an accumulation curve of a particle size distribution when the total weight is 100%. An electrode and a PDP fabricated using the composition are also disclosed.
摘要:
Disclosed herein is a plasma display panel and a method of fabricating the same. The plasma display panel comprises a front glass substrate and a rear glass substrate. An electrode structure disposed between the front and rear glass substrates is prepared in such a way that a non-photosensitive black dielectric layer and a non-photosensitive or photosensitive electrode layer, formed on the front glass substrate, are subjected to heat treatment. The black dielectric layer is blackened at a lower surface by the heat treatment. Current flows between an upper electrode and a transparent electrode and it is possible to assure sufficiently low visibility even though costly metal particles are not used as conductive material on the front substrate of the plasma display panel. It is possible to use various types of black pigments thanks to non-photosensitivity, thus it is possible to fabricate a low-priced plasma display panel due to a reduced material cost.
摘要:
A thick film paste composition used to apply a conductive pattern, comprising(a) spherical, non-coagulating fine particles of metallic silver having a surface area/weight ratio of at least 1.1 m.sup.2 /g and having a particle size of 1.0 .mu.m or less, and(b) fine particles of a glass frit having a softening point of 350.degree. to 620.degree. C. and contained in an amount of 2.1 weight parts or less per 100 weight parts of metallic silver,wherein (a) and (b) are dispersed in (c) an organic medium.
摘要:
A rear panel for a plasma display panel (PDP) includes a substrate, and an address electrode on the substrate, the address electrode including an aluminum containing layer and a silver containing layer stacked on each other.
摘要:
A rear panel for a plasma display panel (PDP) includes a substrate, and an address electrode on the substrate, the address electrode including an aluminum containing layer and a silver containing layer stacked on each other.
摘要:
Disclosed herein is a plasma display panel and a method of fabricating the same. The plasma display panel comprises a front glass substrate and a rear glass substrate. An electrode structure disposed between the front and rear glass substrates is prepared in such a way that a non-photosensitive black dielectric layer and a non-photosensitive or photosensitive electrode layer, formed on the front glass substrate, are subjected to heat treatment. The black dielectric layer is blackened at a surface in contact with the front glass substrate by the heat treatment. Current flows between an upper electrode and a transparent electrode and it is possible to assure sufficiently low visibility even though costly metal particles are not used as conductive material on the front substrate of the plasma display panel. It is possible to use various types of black pigments thanks to non-photosensitivity, thus it is possible to fabricate a low-priced plasma display panel due to a reduced material cost.
摘要:
A composition for fabricating an electrode includes an organic binder and a conductive filler. About 3 to about 60 wt. % of the composition is the organic binder, about 5 to about 95 wt. % of the composition is the conductive filler, the conductive filler includes predominantly aluminum, the conductive filler has a flake shape, and the conductive filler has an average thickness of about 0.05 μm to about 0.75 μm.